Sergio Jose Curbelo Iii
Examiner (ID: 3826, Phone: (571)270-7172 , Office: P/2193 )
Most Active Art Unit | 2193 |
Art Unit(s) | 2193, 2166 |
Total Applications | 91 |
Issued Applications | 50 |
Pending Applications | 0 |
Abandoned Applications | 41 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 7249494
[patent_doc_number] => 20040238759
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-02
[patent_title] => 'Stencil mask for ion implantation'
[patent_app_type] => new
[patent_app_number] => 10/854710
[patent_app_country] => US
[patent_app_date] => 2004-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0238/20040238759.pdf
[firstpage_image] =>[orig_patent_app_number] => 10854710
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/854710 | Stencil mask for ion implantation | May 26, 2004 | Issued |
Array
(
[id] => 7295695
[patent_doc_number] => 20040214096
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-10-28
[patent_title] => 'Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns'
[patent_app_type] => new
[patent_app_number] => 10/847337
[patent_app_country] => US
[patent_app_date] => 2004-05-18
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0214/20040214096.pdf
[firstpage_image] =>[orig_patent_app_number] => 10847337
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/847337 | Microlithographic structures and method of fabrication | May 17, 2004 | Issued |
Array
(
[id] => 1002263
[patent_doc_number] => 06908716
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-06-21
[patent_title] => 'Disposable hard mask for photomask plasma etching'
[patent_app_type] => utility
[patent_app_number] => 10/839025
[patent_app_country] => US
[patent_app_date] => 2004-05-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/06/908/06908716.pdf
[firstpage_image] =>[orig_patent_app_number] => 10839025
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/839025 | Disposable hard mask for photomask plasma etching | May 3, 2004 | Issued |
Array
(
[id] => 7385429
[patent_doc_number] => 20040180273
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-16
[patent_title] => 'Methods of forming aligned structures with radiation-sensitive material'
[patent_app_type] => new
[patent_app_number] => 10/808703
[patent_app_country] => US
[patent_app_date] => 2004-03-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[patent_no_of_words] => 6881
[patent_no_of_claims] => 71
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[firstpage_image] =>[orig_patent_app_number] => 10808703
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/808703 | Methods of forming aligned structures with radiation-sensitive material | Mar 23, 2004 | Issued |
Array
(
[id] => 988058
[patent_doc_number] => 06921613
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-07-26
[patent_title] => 'Electrostatic pellicle system for a mask'
[patent_app_type] => utility
[patent_app_number] => 10/806726
[patent_app_country] => US
[patent_app_date] => 2004-03-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/921/06921613.pdf
[firstpage_image] =>[orig_patent_app_number] => 10806726
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/806726 | Electrostatic pellicle system for a mask | Mar 21, 2004 | Issued |
Array
(
[id] => 7143677
[patent_doc_number] => 20040169008
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-02
[patent_title] => 'Structures useful in electron beam lithography'
[patent_app_type] => new
[patent_app_number] => 10/792011
[patent_app_country] => US
[patent_app_date] => 2004-03-03
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[patent_drawing_sheets_cnt] => 18
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[pdf_file] => publications/A1/0169/20040169008.pdf
[firstpage_image] =>[orig_patent_app_number] => 10792011
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/792011 | Structures useful in electron beam lithography | Mar 2, 2004 | Issued |
Array
(
[id] => 1098876
[patent_doc_number] => 06818362
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-11-16
[patent_title] => 'Photolithography reticle design'
[patent_app_type] => B1
[patent_app_number] => 10/782566
[patent_app_country] => US
[patent_app_date] => 2004-02-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/06/818/06818362.pdf
[firstpage_image] =>[orig_patent_app_number] => 10782566
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/782566 | Photolithography reticle design | Feb 18, 2004 | Issued |
Array
(
[id] => 7334334
[patent_doc_number] => 20040131954
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-08
[patent_title] => 'Non absorbing reticle and method of making same'
[patent_app_type] => new
[patent_app_number] => 10/735658
[patent_app_country] => US
[patent_app_date] => 2003-12-16
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[patent_drawing_sheets_cnt] => 3
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[pdf_file] => publications/A1/0131/20040131954.pdf
[firstpage_image] =>[orig_patent_app_number] => 10735658
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/735658 | Non absorbing reticle and method of making same | Dec 15, 2003 | Issued |
Array
(
[id] => 996420
[patent_doc_number] => 06913859
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-07-05
[patent_title] => 'Mask for differential curing and process for making same'
[patent_app_type] => utility
[patent_app_number] => 10/736275
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[pdf_file] => patents/06/913/06913859.pdf
[firstpage_image] =>[orig_patent_app_number] => 10736275
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/736275 | Mask for differential curing and process for making same | Dec 14, 2003 | Issued |
Array
(
[id] => 953789
[patent_doc_number] => 06958201
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-10-25
[patent_title] => 'Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/657288
[patent_app_country] => US
[patent_app_date] => 2003-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => patents/06/958/06958201.pdf
[firstpage_image] =>[orig_patent_app_number] => 10657288
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/657288 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus | Sep 7, 2003 | Issued |
Array
(
[id] => 1053030
[patent_doc_number] => 06858357
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-22
[patent_title] => 'Attenuated embedded phase shift photomask blanks'
[patent_app_type] => utility
[patent_app_number] => 10/657665
[patent_app_country] => US
[patent_app_date] => 2003-09-08
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/858/06858357.pdf
[firstpage_image] =>[orig_patent_app_number] => 10657665
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/657665 | Attenuated embedded phase shift photomask blanks | Sep 7, 2003 | Issued |
Array
(
[id] => 1071741
[patent_doc_number] => 06841323
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-01-11
[patent_title] => 'Mask producing method'
[patent_app_type] => utility
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[pdf_file] => patents/06/841/06841323.pdf
[firstpage_image] =>[orig_patent_app_number] => 10648518
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/648518 | Mask producing method | Aug 26, 2003 | Issued |
Array
(
[id] => 777048
[patent_doc_number] => 06998203
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-14
[patent_title] => 'Proximity correcting lithography mask blanks'
[patent_app_type] => utility
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[patent_app_country] => US
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[pdf_file] => patents/06/998/06998203.pdf
[firstpage_image] =>[orig_patent_app_number] => 10633211
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/633211 | Proximity correcting lithography mask blanks | Jul 31, 2003 | Issued |
Array
(
[id] => 719337
[patent_doc_number] => 07049033
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-05-23
[patent_title] => 'EUV lithography reticles fabricated without the use of a patterned absorber'
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[pdf_file] => patents/07/049/07049033.pdf
[firstpage_image] =>[orig_patent_app_number] => 10631359
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/631359 | EUV lithography reticles fabricated without the use of a patterned absorber | Jul 30, 2003 | Issued |
Array
(
[id] => 790454
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[patent_title] => 'Reticle barrier system for extreme ultra-violet lithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/628326 | Reticle barrier system for extreme ultra-violet lithography | Jul 28, 2003 | Issued |
Array
(
[id] => 1230902
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[patent_issue_date] => 2004-02-17
[patent_title] => 'Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/441870 | Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools | May 18, 2003 | Issued |
Array
(
[id] => 773024
[patent_doc_number] => 07001695
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[patent_issue_date] => 2006-02-21
[patent_title] => 'Multiple alternating phase shift technology for amplifying resolution'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/435442 | Multiple alternating phase shift technology for amplifying resolution | May 8, 2003 | Issued |
Array
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[patent_title] => 'EUV mask which facilitates electro-static chucking'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/428270 | EUV mask which facilitates electro-static chucking | May 1, 2003 | Issued |
Array
(
[id] => 6729948
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[patent_title] => 'Photomask and method for forming micro patterns of semiconductor device using the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/423871 | Photomask and method for forming micro patterns of semiconductor device using the same | Apr 27, 2003 | Issued |
Array
(
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[patent_title] => 'Mask blank and method of fabricating phase shift mask from the same'
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[pdf_file] => publications/A1/0194/20030194620.pdf
[firstpage_image] =>[orig_patent_app_number] => 10422956
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/422956 | Mask blank and method of fabricating phase shift mask from the same | Apr 24, 2003 | Abandoned |