Polymers and photoresist compositions for short wavelength imaging | Patent Publication Number 20020055060

US 20020055060 A1
Patent NumberUS 06749986 B2
Application Number9948459
Filled DateSep 8, 2001
Priority DateSep 8, 2000
Publication DateMay 9, 2002
Original AssigneeShipley Company L.l.c.
Current AssigneeShipley Company L.l.c.
Inventor/ApplicantsCharles R. Szmanda
Charles R. Szmanda
Gary N. Taylor
Gary N. Taylor
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