Novel polymers and photoresist compositions comprising electronegative groups | Patent Publication Number 20020058199

US 20020058199 A1
Patent Number-
Application Number9948903
Filled DateSep 8, 2001
Priority DateSep 8, 2000
Publication DateMay 16, 2002
Original AssigneeShipley Company L.l.c.
Current AssigneeShipley Company L.l.c.
Inventor/ApplicantsGary N. Taylor
Charles R. Szmanda
Sungseo Cho
Anthony Zampini
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