Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Patent Publication Number 20030049561
US 20030049561 A1Patent NumberUS 06586156 B2
Application Number9907392
Filled DateJul 17, 2001
Priority DateJul 17, 2001
Publication DateMar 13, 2003
Original AssigneeInternational Business Machines
Current AssigneeInternational Business Machines
Inventor/ApplicantsDavid R. Medeiros
David R. Medeiros
Arpan P. Mahorowala
Ranee W. Kwong
Robert N. Lang
Karen E. Petrillo
Wayne M. Moreau
Arpan P. Mahorowala
Karen E. Petrillo
Dai Junyan
Ranee W. Kwong
Wu-Song Huang
Robert N. Lang
Marie Angelopoulos
Wu-Song Huang
Marie Angelopoulos
Wayne M. Moreau
Dai Junyan
David R. Medeiros
Arpan P. Mahorowala
Ranee W. Kwong
Robert N. Lang
Karen E. Petrillo
Wayne M. Moreau
Arpan P. Mahorowala
Karen E. Petrillo
Dai Junyan
Ranee W. Kwong
Wu-Song Huang
Robert N. Lang
Marie Angelopoulos
Wu-Song Huang
Marie Angelopoulos
Wayne M. Moreau
Dai Junyan
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