Lithographic method using variable-area electron-beam lithography machine | Patent Publication Number 20030107008

US 20030107008 A1
Patent NumberUS 06753540 B2
Application Number10281381
Filled DateOct 25, 2002
Priority DateOct 25, 2002
Publication DateJun 12, 2003
Original AssigneeJoel & Joel Llp
Current AssigneeJoel & Joel Llp
Inventor/ApplicantsOsamu Wakimoto
Osamu Wakimoto
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