Radiation sensitive material and method for forming pattern | Patent Publication Number 20040202961

US 20040202961 A1
Patent NumberUS 07179580 B2
Application Number10833114
Filled DateApr 28, 2004
Priority DateDec 28, 1994
Publication DateOct 14, 2004
Original AssigneeFujitsu Limited
Current AssigneeFujitsu Semiconductor America
Inventor/ApplicantsYuko Kaimoto
Yuko Kaimoto
Satoshi Takechi
Makoto Takahashi
Makoto Takahashi
Satoshi Takechi
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