Negative-working photoresist composition | Patent Publication Number 20040202966

US 20040202966 A1
Patent NumberUS 06897012 B2
Application Number10837629
Filled DateMay 4, 2004
Priority DateNov 9, 1999
Publication DateOct 14, 2004
Original AssigneeTokyo Ohka Kogyo Co. Ltd.
Current AssigneeTokyo Ohka Kogyo Co. Ltd.
Inventor/ApplicantsHideo Hada
Takeshi Iwai
Hideo Hada
Takeshi Iwai
Satoshi Fujimura
Satoshi Fujimura
Patent Prosecution report image

Empower your practice with Patexia Publication Prosecution IP Module.

Get access to our exclusive rankings and unlock powerful data.
Check our Latest ReportPurchase IP Module

Looking for a Publication Attorney?

Get in touch with our team or create your account to start exploring a network of over 120K attorneys.