Positive resist composition and pattern forming method using the same | Patent Publication Number 20050186506

US 20050186506 A1

Patent NumberUS 07157208 B2

Application Number11060533

Filled DateFeb 18, 2005

Priority DateFeb 18, 2005

Publication DateAug 25, 2005

Original AssigneeFujifilm Holdings Corporation

Current AssigneeFujifilm

Inventor/ApplicantsTomoya Sasaki
Kazuyoshi Mizutani

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