Method and apparatus for forming silicon oxycarbonitride film, silicon oxycarbide film and silicon oxynitride film | Patent Publication Number 20150118865

US 20150118865 A1
Patent NumberUS 09425038 B2
Application Number14525250
Filled DateOct 28, 2014
Priority DateOct 28, 2014
Publication DateApr 30, 2015
Original AssigneeTokyo Electron Limited
Current AssigneeTokyo Electron Limited
Inventor/ApplicantsAkira SHIMIZU
Akira Shimizu
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