Biased pulse CMP groove pattern | Patent Publication Number 20180366333

US 20180366333 A1
Patent NumberUS 10777418 B2
Application Number15726027
Filled DateOct 5, 2017
Priority DateJun 14, 2017
Publication DateDec 20, 2018
Original AssigneeRohm And Haas Electronic Materials Korea
Current AssigneeRohm And Haas Electronic Materials Korea
Inventor/ApplicantsTony Quan Tran
Jeffrey Robert Stack
John Vu Nguyen
Jeffrey James Hendron
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