Reduced defect deposition processes | Patent Publication Number 20210130949

US 20210130949 A1
Patent NumberUS 11821082 B2
Application Number17081488
Filled DateOct 27, 2020
Priority DateNov 1, 2019
Publication DateMay 6, 2021
Original AssigneeApplied Materials Inc.
Current AssigneeApplied Materials Israel
Inventor/ApplicantsKwangduk Lee
Hyung Je Woo
Byung Ik Song
Prashant Kumar Kulshreshtha
Venkata Sharat Chandra Parimi
Xiaoquan Min
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