Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma | Patent Publication Number 20220145459
US 20220145459 A1Publication DateMay 12, 2022
Original AssigneeLam Research
Current AssigneeLam Research
Inventor/ApplicantsBo Gong
Huatan QIU
Huatan Qiu
Rachel E. Batzer
Bhadri N. VARADARAJAN
Geoffrey HOHN
Bo GONG
Bart J. VAN SCHRAVENDIJK
Bart J. Van Schravendijk
Bhadri N. Varadarajan
Geoffrey Hohn
Rachel E. BATZER
Huatan QIU
Huatan Qiu
Rachel E. Batzer
Bhadri N. VARADARAJAN
Geoffrey HOHN
Bo GONG
Bart J. VAN SCHRAVENDIJK
Bart J. Van Schravendijk
Bhadri N. Varadarajan
Geoffrey Hohn
Rachel E. BATZER
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