Generating High Density Plasma Known References

Type	Patent Country	Patent Number
Patent	US	3104345
Patent	US	3516920
Patent	US	3619605
Patent	US	4060708
Patent	US	4148612
Patent	US	4458180
Patent	US	4546253
Patent	US	4588490
Patent	US	4703222
Patent	US	4716340
Patent	US	4792725
Patent	US	4802183
Patent	US	4919690
Patent	US	4931169
Patent	US	4953174
Patent	US	4965248
Patent	US	4977352
Patent	US	5002631
Patent	US	5015493
Patent	US	5041760
Patent	US	5083061
Patent	US	5192894
Patent	US	5212425
Patent	US	5247531
Patent	US	5247535
Patent	US	5286360
Patent	US	5303139
Patent	US	5330800
Patent	US	5382457
Patent	US	5427669
Patent	US	5433258
Patent	US	5476693
Patent	US	5506405
Patent	US	5537005
Patent	US	5565247
Patent	US	5576939
Patent	US	5616224
Patent	US	5696428
Patent	US	5718813
Patent	US	5728278
Patent	US	5733418
Patent	US	5795452
Patent	US	5810982
Patent	US	5821548
Patent	US	5828176
Patent	US	5844195
Patent	US	5846608
Patent	US	5863392
Patent	US	5875207
Patent	US	5916455
Patent	US	5917286
Patent	US	5942089
Patent	US	5976327
Patent	US	5993761
Patent	US	6001224
Patent	US	6007879
Patent	US	6019876
Patent	US	6024844
Patent	US	6057244
Patent	US	6083361
Patent	US	6086730
Patent	US	6094012
Patent	US	6124675
Patent	US	6137231
Patent	US	6197165
Patent	US	6207951
Patent	US	6217717
Patent	US	6222321
Patent	US	6238537
Patent	US	6251242
Patent	US	6254745
Patent	US	6290821
Patent	US	6296742
Patent	US	6311638
Patent	US	6327163
Patent	US	6340416
Patent	US	6342132
Patent	US	6344419
Patent	US	6348238
Patent	US	6355992
Patent	US	6359424
Patent	US	6413382
Patent	US	6361667
Patent	US	6368477
Patent	US	6395641
Patent	US	6398929
Patent	US	6413382
Patent	US	6413383
Patent	US	6416634
Patent	US	6432260
Patent	US	6436248
Patent	US	6436251
Patent	US	6440280
Patent	US	6451703
Patent	US	6456642
Patent	US	6462482
Patent	US	6471833
Patent	US	6488825
Patent	US	6521099
Patent	US	6621674
Patent	US	6605312
Patent	US	6633017
Patent	US	6661178
Patent	US	6673724
Patent	US	6735099
Patent	US	6805779
Patent	US	6806651
Patent	US	6806652
Patent	US	6808607
Patent	US	6853142
Patent	US	6896773
Patent	US	6896775
Patent	US	6903511
Patent	US	7095179
Patent	US	7147759
Patent	US	7345429
Patent	US	7446479
Patent	US	7604716
Patent	US	20020008480
Patent	US	20020019139
Patent	US	20020033480
Patent	US	20020047539
Patent	US	20020063053
Patent	US	20020114897
Patent	US	20020153103
Patent	US	20030006008
Patent	US	20040020760
Patent	US	20040060813
Patent	US	20040086434
Patent	US	20040094411
Patent	US	20040112735
Patent	US	20040124077
Patent	US	20040219789
Patent	US	20050092596
Patent	US	20050103620
Patent	US	20050109607
Patent	US	20050173239
Patent	US	20050184669
Patent	US	20050211543
Patent	US	20050247554
Patent	US	20050252763
Patent	US	20060066248
Patent	US	20070119701
Patent	US	20090032191
Patent	US	20090263966
Patent	DE	3210351
Patent	DE	3700633
Patent	EP	0480688
Patent	EP	0596496
Patent	EP	0650183
Patent	EP	0731190
Patent	EP	0788139
Patent	EP	0831679
Patent	EP	0999291
Patent	EP	1046726
Patent	EP	1260603
Patent	EP	1293586
Patent	GB	1339910
Patent	GB	2401116
Patent	JP	57194254
Patent	JP	62216637
Patent	JP	08067981
Patent	JP	08293470
Patent	JP	2004010979
Patent	JP	10204633
Patent	RU	2029411
Patent	RU	2058429
Patent	WO	199504368
Patent	WO	199528508
Patent	WO	199833201
Patent	WO	199840532
Patent	WO	199928520
Patent	WO	200198553

Published Known References

Type	Title of NPL
Other	Biberman et al. Chapter Eight: Transient Nonequilibrium Plasmas Kinetics of Nonequilibrium Low Temperature Plasmas 1987 pp. 321 360-372 Plenum Publishing Corporation New York USA.
Other	Biberman et al. Low-Temperature Plasmas with Nonequilibrium Ionization Sov. Phys. Usp. Jun. 1979 pp. 411-432 vol. 22 No. 6.
Other	Booth et al. The Transition From Symmetric To Asymemtric Discharges In Pulsed 13.56 MHz Capacitively Coupled Plasmas J. Appl. Phys. Jul. 15 1997 pp. 552-560 vol. 82 No. 2 American Institute of Physics. .
Other	Bugaev S. P. et al. Investigation of a High-Current Pulsed Magnetron Discharge Initiated in the Low-Pressure Diffuse Arc Plasma XVIIth International Symposium on Discharges and Electrical Insulation in Vacuum 1996 pp. 1074-1076.
Other	Bugaev S. P. et al. Ion-Assisted Pulsed Magnetron Sputtering Deposition of Ta-C Films Thin Solid Films 2001 pp. 16-26 vol. 389 Elsevier Science B.V.
Other	Bunshah et al. Deposition Technologies For Films And Coatings pp. 178-183 Noyes Pubications park Ridge New Jersey. .
Other	Burnham et al. Efficient Electric Discharge Lasers In XeF and KrF Applied Physics Letters Jul. 1976 pp. 30-32 vol. 29 No. 1 American Instistute of Physics. .
Other	Daugherty et al. Attachment-Dominated Electron-Beam-Ionized Discharges Applied Physics Letters May 15 1976 pp. 581-583 vol. 28 No. 10 American Institute of Physics.
Other	D'Couto G. C. et al. In Situ Physical Vapor Deposition of Ionized Ti and TiN Thin Films Using Hollow Cathode Magnetron Plasma Source J. Vac. Sci. Technol. B Jan./Feb. 2001 pp. 244-249 vol. 19. No. 1 American Vacuum Society.
Other	Dekoven et al. Carbon Thin Film Deposition Using High Power Pulsed Magnetron Sputtering 46th Annual Technical Conference Proceedings 2003 pp. 158-165 Society of Vacuum Coaters.
Other	Ehiasarian A. P. et al. High Power Pulsed Magnetron Sputtered CrNx Films Dunnschicht-/Plasmatechnik 2003 pp. 1480-1487.
Other	Ehiasarian A. P. et al. Influence of High Power Densities on the Composition of Pulsed Magnetron Plasmas Vacuum 2002 pp. 147-154 vol. 65 Elsevier Science Ltd.
Other	Eletskii Excimer Lasers Sov. Phys. Usp. Jun. 1978 pp. 502-521 vol. 21 N0. 6..
Other	Encyclopedia Of Low Temperature Plasma p. 119 123 vol. 3..
Other	Fabrikant et al. Electron Impact Formation Of Metastable Atoms pp. 3 31 34-37 Amsterdam. (1988).
Other	Fahey et al. High Flux Beam Source Of Thermal Rare-Gas Metastable Atoms 1980 J. Phys. E. Sci. Instrum. vol. 13 The Institute of Physics. .
Other	Fajans et al. Bifurcations in Elliptical Asymmetric Non-Neutral Plasmas Physics of Plasmas Oct. 2000 pp. 3929-3933 vol. 7 No. 10 American Institute of Physics.
Other	Fajans et al. Second Harmonic Autoresonant Control of the I=1 Diocotron Mode in Pure-Electron Plasmas Physical Review E Sep. 2000 pp. 4131-4136 vol. 62 No. 3.
Other	Garrigues et al. Hybrid and Particle-In-Cell Models of a Stationary Plasma Thruster Plasma Sources Sci. Technol. 2000 pp. 219-226 vol. 9 IOP Publishing Ltd. UK.
Other	Goto et al. Dual Excitation Reactive Ion Etcher for Low Energy Plasma Processing J. Vac. Sci. Technol. A. Sep./Oct. 1992 pp. 3048-3054 vol. 10 No. 5 American Vacuum Society. .
Other	Gudmundsson et al. Evolution of the Electron Energy Distribution and Plasma Parameters in a Pulsed Magnetron Discharge Applied Physics Letters May 28 2001 pp. 3427-3429 American Institute of Physics.
Other	Gudmundsson J. T. et al. Spatial and Temporal Behavior of the Plasma Parameters in a Pulsed Magnetron Discharge Surface and Coatings Technology 2002 pp. 249-256 vol. 161 Elsevier Science B.V.
Other	Gudmundsson et al. Observation of Ion-Acoustic Solitons in a Pulsed Magnetron Sputtering Discharge 56th-Gaseous Electronics Conference-2003 Oct. 24 2003 pp. 1-14.
Other	Gudmundsson et al. Observation of Solitons in a Pulsed Magnetron Sputtering Discharge [online]. [retrieved on Dec. 8 2003]. Retrieved from WWW.eps.org/aps/meet/GEC03/baps/abs/s300.html.
Other	Hart et al. Growth of Soliton-like Structures From Normal Modes and Particle Loss From a Nonneutral Plasma [online]. Non-Neutral Plasmas Archibald/Cochran 3rd Floor Tower Nov. 7 1995.
Other	Helmersson Metallization by Pulsed High-Power Sputtering [online]. [retrieved on Nov. 21 2003]. Retrieved from WWW.inf.liu.se/thinprogram/projects/p2.html.
Other	Hopwood J. Ionized Physical Vapor Deposition of Integrated Circuit Interconnects Physics of Plasmas May 1998 pp. 1624-1631 vol. 5 No. 5 American Institute of Physics.
Other	Kervalishvii N. A. et al. Low-Pressure Discharge in Crossed Fields (E.H) in a Magnetron and Penning Cell Sov. Phys. Tech. Phys. 1976 pp. 1591-1596 vol. 20 No. 12 American Institute of Physics.
Other	Korneev V.V. Electric Fields in a Nonequilibrium Inhomogeneous Weakly Ionized Plasma Sov. J. Plasma Phys. Nov.-Dec. 1978 pp. 784-785 vol. 4 No. 6 American Institute of Physics.
Other	Kouznetsov et al. A Novel Pulsed Magnetron Sputter Technique Utilizing Very High Target Power Densities Surface and Coatings Technology 1999 pp. 290-293 vol. 122 Elsevier.
Other	Kudryavtsev et al. Ionization Relaxation in a Plasma Produced by a Pulsed Inert-Gas Discharge Sov. Phys. Tech. Phys. Jan. 1983 pp. 30-35 vol. 28 No. 1 American Institute of Physcis.
Other	Lebedev S. Ya. et al. Cathode Sputtering Under the Action of Cesium Ions Soviet Physics--Technical Physics Dec. 1964 pp. 854-856 vol. 9 No. 6.
Other	Lindquist et al. High Selectivity Plasma Etching Of Silicone Dioxdie With A Dual Frequency 27/2 MHz Capacitiv RF Discharge. .
Other	Lutsenko E.I. Instability Mechanisms in a High-Current Straight Discharge at a Low Gas Pressure Sov. J. Plasma Phys. Jan.-Feb. 1984 pp. 87-95 vol. 10 No. 1.
Other	Lymberopoulos et al. Fluid Simulations Of Glow DIscharges: Effect Of Metastable Atoms In Argon J. Appl. Phys. Apr. 1993 pp. 3668-3679 vol. 73 No. 8 American Inststiute of Physics. .
Other	Macak et al. Ionized Sputter Deposition Using an Extremely High Plasma Density Pulsed Magnetron Discharge J. Vac. Sci. Technol. A. Jul./Aug. 2000 p. 1533-1537 vol. 18 No. 4 American Society. .
Other	Macak Reactive Sputter Deposition Process Of Al203 And Characterization Of A Novel High Plasm aDensity Pulsed Magnetron Discharge Linkoping Studies In Science And Technology pp. 1-2. .
Other	Matossian et al. Operating Characteristics of a 100kV 100kW Plasma Ion Implantation Facility Surface Coatings & Technology 1996 pp. 92-97 vol. 85.
Other	Mesyats G. A. et al. Pulsed Electrical Discharge In Vacuum Springer-Verlag.
Other	Mozgrin et al. High-Current Low-Pressure Quasi-Stationary Discharge in a Magnetic Field: Experimental Research Plasma Physics Reports 1995 vol. 21 No. 5 pp. 400-409 Interperiodica Publishing.
Other	Oks E. M. et al. Plasma Emission Properties of a Superdense Glow Discharge Excited in Crossed Electric and Magnetic Fields Sov. Phys. Tech. Phys. Jun. 1991 pp. 712-714 vol. 36 No. 6 American Institute of Physics.
Other	Pisarev Modification of the Surface of Perforated Polymer MF-4SK in Low-Pressure High Current Quasi-Stable Discharge Plasma in Magnetic Field [online]. [retrieved on Dec. 30 2003]. Retrieved from WWW.tech-db.ru/lstc/db/pra.nsf/we/0624.
Other	Rasmussen C. E. et al. Ionization and Current Growth in an E X B Discharge Plasma Physics 1969 pp. 183-195 vol. 11 Pergamon Press Northern Ireland.
Other	Redhead P. A. Instabilities in Crossed-Field Discharges At Low Pressures Vacuum 1988 pp. 901-906 vol. 38 No. 8-10 Pergamon Press Great Britain.
Other	Rossnagel et al. Induced Drift Currents In Circular Planar Magnetrons J. Vac. Sci. Technol. A. Jan./Feb. 1987 pp. 88-91 vol. 5 No. 1 American Vacuum Society. .
Other	Sheridan et al. Electron Velocity Distribution Functions In A Sputtering Magnetron Discharge For The E x B Direction J. Vac. Sci. Technol. Jul.Aug. 1998 pp. 2173-2176 vol. 16 No. 4 American Vacuum Society. .
Other	Stark et al. Electron Heating in Atmospheric Pressure Glow Discharges Journal of Applied Physics Apr. 2001 p. 3568 vol. 89 No. 7 American Institute of Physics.
Other	Steinbruchel A Simple Formula for Low-Energy Sputtering Yields Applied Physics A. 1985 pp. 37-42 vol. 36 Springer Verlag.
Other	Sugimoto et al; Magnetic Condensation Of A Photoexcited Plasma During Fluoropolymer Sputtering; J. Appl. Phys.; Feb. 15 1990; pp. 2093-2099; vol. 67 No. 4; American Institute of Physics; New York US.
Other	The State of the Art in Pulsed High Power [online]. [retrieved on Jul. 15 2002]. Retrieved from www.physiqueindustrie.com/.sub.--pulse.sub.--power.html.
Other	Thornton Magnetron Sputtering: Basic Physics and Application to Cylindrical Magnetrons J. Vac. Sci. Technol. Mar./Apr. 1978 pp. 171-177 vol. 15 No. 2.
Other	Turenko et al. Magnetron Discharge In The Vapor Of The Cathode Material Soviet Technical Physics Letters Jul. 1989 pp. 519-520 vol. 15 No. 7 New York US.
Other	Verheijen et al. A Discharge Excited Supersonic Source Of Metastable Rare Gas Atoms J. Phys. E. Sci. Instrum 1984 vol. 17. .
Other	Vladimirov V. Voltage-Current Characteristics of a Gas Magnetron in the Case of Intense Cathode Sputtering Sov. J. Plasma Phys. Jan.-Feb. 1981 pp. 114-118 vol. 7 No. 1.
Other	Westwood W. D. The Current-Voltage Characteristic of Magnetron Sputtering Systems J. Appl. Phys. Dec. 1983 pp. 6841-6846 vol. 54 No. 12 American Institute of Physics.
Other	Yamaya et al; Use Of A Helicon-Wave Excited Plasma For Aluminum-Doped ZnO Thin-Film Sputtering; Appl. Phys. Lett.; Jan. 12 1998; pp. 235-237; vol. 72; No. 2; American Institute of Physics: New York US.