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Patexia Contest

CONTEST

Competed
Prize
$7,000
DEADLINE
This contest is closed.
Winner
Winner

Mohit Kalra

technology
Winner

Amit Aswal

technology
Runner Up

Arpit Jain

technology
Runner Up

Active K

technology
Runner Up

Simon Sunatori

technology
Runner Up
Runner Up

Roopa V

technology
Runner Up
Runner Up
Runner Up

NEHA JAI

technology
Runner Up

Biplab Pal

technology
Runner Up

Arp Jai

technology

Problem

Patexia seeks prior art for TW Patent 508284 B with a focus on its claims 3 & 4 and TW Patent 528646 B with a focus on its claims 4, 5 & 6.

With respect to ‘284 and ‘646 patent, Patexia is looking for a polishing pad comprising a polishing layer with specific mechanical properties and surface specifications. Such a polishing pad is usually used for the Chemical-Mechanical Planarization/Polishing (CMP) of silicon (or other semiconductor materials) wafers.

Patents are in the same family as the following US patents (for further reading):

  • US6,454,634
  • US6,582,283
  • US6,736,709
  • US6,749,485
  • US6,860,802

Submitted documents describing this system must be:
●      filed or published before 05/27/2000

Have a question about this contest? Ask a Question

Questions

#QuestionValue
1Is the reference either a US patent filed, a foreign patent published, or a non-patent document published before May 27th, 2000? T/F
2Does the reference describe a polishing pad for the surface planarization of a semiconductor device (such as a wafer) comprising a hydrolytically stable polishing layer? 15
3Does the polishing layer have a tensile Modulus of 100-2,000 MPa at 40°C? 25
4Does the polishing layer have an Energy Loss Factor (KEL) of 125-850 (1/Pa at 40°C.)? 25
5Does the polishing layer have an Elastic Storage Modulus (E′, ratio) of about 1-5 at 30°C to 90°C? 10
6Does the polishing layer have a macro-texture comprising one or multiple grooves? 25

Additional Notes

Prior Art Search

Prior Art Search

This is a Prior Art Search contest aimed at determining if a patent idea was known and publicly available before a patent was filed.

+5 bonus points will be awarded for non-patent literature and for foreign language references.

This contest will close on Sunday, June 10th, 2018 at 11:59 PM PT.

Please review the Contest Rules. For more information on how to submit to this Contest type, please read the Intro to Prior Art Search page.

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