
Abe L. Massad
Examiner (ID: 7535, Phone: (571)272-6292 , Office: P/3634 )
| Most Active Art Unit | 3634 |
| Art Unit(s) | 3634 |
| Total Applications | 837 |
| Issued Applications | 450 |
| Pending Applications | 70 |
| Abandoned Applications | 332 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 20117096
[patent_doc_number] => 12366797
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2025-07-22
[patent_title] => EUV photo masks and manufacturing method thereof
[patent_app_type] => utility
[patent_app_number] => 18/749170
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Array
(
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[patent_doc_number] => 20230259032
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[patent_kind] => A1
[patent_issue_date] => 2023-08-17
[patent_title] => COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
[patent_app_type] => utility
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Array
(
[id] => 18498914
[patent_doc_number] => 20230221644
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[patent_kind] => A1
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[patent_title] => METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
[patent_app_type] => utility
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Array
(
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[patent_doc_number] => 20240043592
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[patent_kind] => A1
[patent_issue_date] => 2024-02-08
[patent_title] => POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION
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Array
(
[id] => 19235401
[patent_doc_number] => 20240192595
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[patent_kind] => A1
[patent_issue_date] => 2024-06-13
[patent_title] => POLYMER COMPOSITIONS HAVING PHOTOACID GENERATORS AND PHOTORESISTS
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Array
(
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Array
(
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[patent_title] => NEGATIVE TONE PHOTORESIST FOR EUV LITHOGRAPHY
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[rel_patent_id] =>[rel_patent_doc_number] =>) 17/875322 | NEGATIVE TONE PHOTORESIST FOR EUV LITHOGRAPHY | Jul 26, 2022 | Pending |
Array
(
[id] => 18437898
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[patent_title] => METHOD OF FORMING PHOTORESIST PATTERN, AND PHOTORESIST STRUCTURE
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Array
(
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Array
(
[id] => 17898787
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Array
(
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Array
(
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Array
(
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Array
(
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Array
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Array
(
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Array
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Array
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Array
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Array
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