Search

Alan Wong

Examiner (ID: 14022, Phone: (571)272-3238 , Office: P/2842 )

Most Active Art Unit
2843
Art Unit(s)
2843, 2817, 2842
Total Applications
961
Issued Applications
807
Pending Applications
56
Abandoned Applications
117

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4026850 [patent_doc_number] => 05855725 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-01-05 [patent_title] => 'Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system' [patent_app_type] => 1 [patent_app_number] => 8/655144 [patent_app_country] => US [patent_app_date] => 1996-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 6426 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/855/05855725.pdf [firstpage_image] =>[orig_patent_app_number] => 655144 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/655144
Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system May 29, 1996 Issued
Array ( [id] => 3880767 [patent_doc_number] => 05723062 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-03-03 [patent_title] => 'Selective etching of nickle/iron alloys' [patent_app_type] => 1 [patent_app_number] => 8/654507 [patent_app_country] => US [patent_app_date] => 1996-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2296 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/723/05723062.pdf [firstpage_image] =>[orig_patent_app_number] => 654507 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/654507
Selective etching of nickle/iron alloys May 27, 1996 Issued
Array ( [id] => 3871280 [patent_doc_number] => 05804087 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-09-08 [patent_title] => 'Method of adjusting natural frequency of dual-axis vibratory structure' [patent_app_type] => 1 [patent_app_number] => 8/646817 [patent_app_country] => US [patent_app_date] => 1996-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 2991 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/804/05804087.pdf [firstpage_image] =>[orig_patent_app_number] => 646817 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/646817
Method of adjusting natural frequency of dual-axis vibratory structure May 20, 1996 Issued
08/652284 PLASMA PROCESSING DEVICE May 20, 1996 Abandoned
Array ( [id] => 3786298 [patent_doc_number] => 05736463 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-04-07 [patent_title] => 'Method and apparatus for chemical/mechanical polishing' [patent_app_type] => 1 [patent_app_number] => 8/650309 [patent_app_country] => US [patent_app_date] => 1996-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 2838 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/736/05736463.pdf [firstpage_image] =>[orig_patent_app_number] => 650309 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/650309
Method and apparatus for chemical/mechanical polishing May 19, 1996 Issued
Array ( [id] => 4000312 [patent_doc_number] => 05858813 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-01-12 [patent_title] => 'Chemical mechanical polishing slurry for metal layers and films' [patent_app_type] => 1 [patent_app_number] => 8/644509 [patent_app_country] => US [patent_app_date] => 1996-05-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 5238 [patent_no_of_claims] => 55 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 58 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/858/05858813.pdf [firstpage_image] =>[orig_patent_app_number] => 644509 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/644509
Chemical mechanical polishing slurry for metal layers and films May 9, 1996 Issued
Array ( [id] => 3724469 [patent_doc_number] => 05693181 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-12-02 [patent_title] => 'Method of making transducer chips with grooves on the wafer for easy separation of the chips' [patent_app_type] => 1 [patent_app_number] => 8/642457 [patent_app_country] => US [patent_app_date] => 1996-05-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 27 [patent_no_of_words] => 4112 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/693/05693181.pdf [firstpage_image] =>[orig_patent_app_number] => 642457 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/642457
Method of making transducer chips with grooves on the wafer for easy separation of the chips May 2, 1996 Issued
Array ( [id] => 3760041 [patent_doc_number] => 05843847 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-12-01 [patent_title] => 'Method for etching dielectric layers with high selectivity and low microloading' [patent_app_type] => 1 [patent_app_number] => 8/639388 [patent_app_country] => US [patent_app_date] => 1996-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 11 [patent_no_of_words] => 6596 [patent_no_of_claims] => 51 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/843/05843847.pdf [firstpage_image] =>[orig_patent_app_number] => 639388 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/639388
Method for etching dielectric layers with high selectivity and low microloading Apr 28, 1996 Issued
Array ( [id] => 3935345 [patent_doc_number] => 05997685 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-12-07 [patent_title] => 'Corrosion-resistant apparatus' [patent_app_type] => 1 [patent_app_number] => 8/632741 [patent_app_country] => US [patent_app_date] => 1996-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4729 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/997/05997685.pdf [firstpage_image] =>[orig_patent_app_number] => 632741 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/632741
Corrosion-resistant apparatus Apr 14, 1996 Issued
Array ( [id] => 4000559 [patent_doc_number] => 05961851 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-05 [patent_title] => 'Microwave plasma discharge device' [patent_app_type] => 1 [patent_app_number] => 8/626451 [patent_app_country] => US [patent_app_date] => 1996-04-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 2308 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/961/05961851.pdf [firstpage_image] =>[orig_patent_app_number] => 626451 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/626451
Microwave plasma discharge device Apr 1, 1996 Issued
08/625046 METHOD FOR STRIPPING A PHOTORESIST ON AN ALUMINUM ALLOY Mar 28, 1996 Abandoned
Array ( [id] => 4086006 [patent_doc_number] => 06017825 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-01-25 [patent_title] => 'Etch rate loading improvement' [patent_app_type] => 1 [patent_app_number] => 8/624301 [patent_app_country] => US [patent_app_date] => 1996-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 7 [patent_no_of_words] => 4649 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/017/06017825.pdf [firstpage_image] =>[orig_patent_app_number] => 624301 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/624301
Etch rate loading improvement Mar 28, 1996 Issued
Array ( [id] => 3681346 [patent_doc_number] => 05695660 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-12-09 [patent_title] => 'Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment' [patent_app_type] => 1 [patent_app_number] => 8/615417 [patent_app_country] => US [patent_app_date] => 1996-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 24 [patent_no_of_words] => 8922 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 15 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/695/05695660.pdf [firstpage_image] =>[orig_patent_app_number] => 615417 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/615417
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment Mar 13, 1996 Issued
Array ( [id] => 4000545 [patent_doc_number] => 05961850 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-05 [patent_title] => 'Plasma processing method and apparatus' [patent_app_type] => 1 [patent_app_number] => 8/615949 [patent_app_country] => US [patent_app_date] => 1996-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 4109 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/961/05961850.pdf [firstpage_image] =>[orig_patent_app_number] => 615949 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/615949
Plasma processing method and apparatus Mar 13, 1996 Issued
Array ( [id] => 3761385 [patent_doc_number] => 05849135 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-12-15 [patent_title] => 'Particulate contamination removal from wafers using plasmas and mechanical agitation' [patent_app_type] => 1 [patent_app_number] => 8/614110 [patent_app_country] => US [patent_app_date] => 1996-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3724 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/849/05849135.pdf [firstpage_image] =>[orig_patent_app_number] => 614110 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/614110
Particulate contamination removal from wafers using plasmas and mechanical agitation Mar 11, 1996 Issued
Array ( [id] => 3641355 [patent_doc_number] => 05683548 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-11-04 [patent_title] => 'Inductively coupled plasma reactor and process' [patent_app_type] => 1 [patent_app_number] => 8/605697 [patent_app_country] => US [patent_app_date] => 1996-02-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 3874 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/683/05683548.pdf [firstpage_image] =>[orig_patent_app_number] => 605697 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/605697
Inductively coupled plasma reactor and process Feb 21, 1996 Issued
Array ( [id] => 4054228 [patent_doc_number] => 05865897 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-02-02 [patent_title] => 'Method of producing film of nitrogen-doped II-VI group compound semiconductor' [patent_app_type] => 1 [patent_app_number] => 8/596384 [patent_app_country] => US [patent_app_date] => 1996-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 19 [patent_no_of_words] => 7711 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/865/05865897.pdf [firstpage_image] =>[orig_patent_app_number] => 596384 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/596384
Method of producing film of nitrogen-doped II-VI group compound semiconductor Feb 8, 1996 Issued
Array ( [id] => 3762732 [patent_doc_number] => 05733405 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-03-31 [patent_title] => 'Plasma processing apparatus' [patent_app_type] => 1 [patent_app_number] => 8/597182 [patent_app_country] => US [patent_app_date] => 1996-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 26 [patent_no_of_words] => 10376 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/733/05733405.pdf [firstpage_image] =>[orig_patent_app_number] => 597182 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/597182
Plasma processing apparatus Feb 5, 1996 Issued
Array ( [id] => 7637164 [patent_doc_number] => 06379490 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-30 [patent_title] => 'System for improving the total thickness variation of a wafer' [patent_app_type] => B1 [patent_app_number] => 08/596980 [patent_app_country] => US [patent_app_date] => 1996-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2367 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/379/06379490.pdf [firstpage_image] =>[orig_patent_app_number] => 08596980 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/596980
System for improving the total thickness variation of a wafer Feb 4, 1996 Issued
Array ( [id] => 3820220 [patent_doc_number] => 05783102 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-07-21 [patent_title] => 'Negative ion deductive source for etching high aspect ratio structures' [patent_app_type] => 1 [patent_app_number] => 8/595438 [patent_app_country] => US [patent_app_date] => 1996-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2423 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 189 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/783/05783102.pdf [firstpage_image] =>[orig_patent_app_number] => 595438 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/595438
Negative ion deductive source for etching high aspect ratio structures Feb 4, 1996 Issued
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