Alexander S Thomas
Examiner (ID: 6457, Phone: (571)272-1502 , Office: P/1783 )
Most Active Art Unit | 1783 |
Art Unit(s) | 1772, 1783, 1315, 1721, 1504, 2899, 1508, 1794, 1773, 1506 |
Total Applications | 4004 |
Issued Applications | 3000 |
Pending Applications | 169 |
Abandoned Applications | 835 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 4802775
[patent_doc_number] => 20080014363
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-17
[patent_title] => 'Electro-Static Chucking Mechanism and Surface Processing Apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/779169
[patent_app_country] => US
[patent_app_date] => 2007-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4775
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0014/20080014363.pdf
[firstpage_image] =>[orig_patent_app_number] => 11779169
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/779169 | Electro-Static Chucking Mechanism and Surface Processing Apparatus | Jul 16, 2007 | Abandoned |
Array
(
[id] => 4654284
[patent_doc_number] => 20080023144
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-01-31
[patent_title] => 'DIELECTRIC ETCH TOOL CONFIGURED FOR HIGH DENSITY AND LOW BOMBARDMENT ENERGY PLASMA PROVIDING HIGH ETCH RATES'
[patent_app_type] => utility
[patent_app_number] => 11/778058
[patent_app_country] => US
[patent_app_date] => 2007-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 17550
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20080023144.pdf
[firstpage_image] =>[orig_patent_app_number] => 11778058
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/778058 | DIELECTRIC ETCH TOOL CONFIGURED FOR HIGH DENSITY AND LOW BOMBARDMENT ENERGY PLASMA PROVIDING HIGH ETCH RATES | Jul 14, 2007 | Abandoned |
Array
(
[id] => 5349512
[patent_doc_number] => 20090004873
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-01-01
[patent_title] => 'HYBRID ETCH CHAMBER WITH DECOUPLED PLASMA CONTROLS'
[patent_app_type] => utility
[patent_app_number] => 11/749069
[patent_app_country] => US
[patent_app_date] => 2007-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4340
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 2
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0004/20090004873.pdf
[firstpage_image] =>[orig_patent_app_number] => 11749069
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/749069 | HYBRID ETCH CHAMBER WITH DECOUPLED PLASMA CONTROLS | Jun 25, 2007 | Abandoned |
Array
(
[id] => 5244591
[patent_doc_number] => 20070240825
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-10-18
[patent_title] => 'Wafer processing apparatus capable of controlling wafer temperature'
[patent_app_type] => utility
[patent_app_number] => 11/812289
[patent_app_country] => US
[patent_app_date] => 2007-06-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 7905
[patent_no_of_claims] => 3
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[pdf_file] => publications/A1/0240/20070240825.pdf
[firstpage_image] =>[orig_patent_app_number] => 11812289
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/812289 | Wafer processing apparatus capable of controlling wafer temperature | Jun 17, 2007 | Abandoned |
Array
(
[id] => 5059622
[patent_doc_number] => 20070221258
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-27
[patent_title] => 'ETCHING METHOD AND APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 11/755385
[patent_app_country] => US
[patent_app_date] => 2007-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0221/20070221258.pdf
[firstpage_image] =>[orig_patent_app_number] => 11755385
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/755385 | ETCHING METHOD AND APPARATUS | May 29, 2007 | Abandoned |
Array
(
[id] => 8212924
[patent_doc_number] => 08192576
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-06-05
[patent_title] => 'Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing'
[patent_app_type] => utility
[patent_app_number] => 11/805607
[patent_app_country] => US
[patent_app_date] => 2007-05-23
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[patent_drawing_sheets_cnt] => 17
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/192/08192576.pdf
[firstpage_image] =>[orig_patent_app_number] => 11805607
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/805607 | Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing | May 22, 2007 | Issued |
Array
(
[id] => 4472720
[patent_doc_number] => 07867356
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-01-11
[patent_title] => 'Apparatus for reducing polymer deposition on a substrate and substrate support'
[patent_app_type] => utility
[patent_app_number] => 11/802212
[patent_app_country] => US
[patent_app_date] => 2007-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3211
[patent_no_of_claims] => 18
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/867/07867356.pdf
[firstpage_image] =>[orig_patent_app_number] => 11802212
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/802212 | Apparatus for reducing polymer deposition on a substrate and substrate support | May 20, 2007 | Issued |
Array
(
[id] => 5043285
[patent_doc_number] => 20070261956
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-15
[patent_title] => 'COATING INSTALLATION WITH CARRIER FOR SUBSTRATE COATING'
[patent_app_type] => utility
[patent_app_number] => 11/746749
[patent_app_country] => US
[patent_app_date] => 2007-05-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2228
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[pdf_file] => publications/A1/0261/20070261956.pdf
[firstpage_image] =>[orig_patent_app_number] => 11746749
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/746749 | COATING INSTALLATION WITH CARRIER FOR SUBSTRATE COATING | May 9, 2007 | Abandoned |
Array
(
[id] => 5109604
[patent_doc_number] => 20070193519
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-23
[patent_title] => 'Large area deposition in high vacuum with high thickness uniformity'
[patent_app_type] => utility
[patent_app_number] => 11/785141
[patent_app_country] => US
[patent_app_date] => 2007-04-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0193/20070193519.pdf
[firstpage_image] =>[orig_patent_app_number] => 11785141
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/785141 | Large area deposition in high vacuum with high thickness uniformity | Apr 15, 2007 | Abandoned |
Array
(
[id] => 4842603
[patent_doc_number] => 20080179011
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-31
[patent_title] => 'PLASMA REACTOR WITH WIDE PROCESS WINDOW EMPLOYING PLURAL VHF SOURCES'
[patent_app_type] => utility
[patent_app_number] => 11/734040
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[pdf_file] => publications/A1/0179/20080179011.pdf
[firstpage_image] =>[orig_patent_app_number] => 11734040
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/734040 | PLASMA REACTOR WITH WIDE PROCESS WINDOW EMPLOYING PLURAL VHF SOURCES | Apr 10, 2007 | Abandoned |
Array
(
[id] => 4842395
[patent_doc_number] => 20080178803
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-07-31
[patent_title] => 'PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYING PLURAL VHF SOURCES'
[patent_app_type] => utility
[patent_app_number] => 11/733913
[patent_app_country] => US
[patent_app_date] => 2007-04-11
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11733913
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/733913 | PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYING PLURAL VHF SOURCES | Apr 10, 2007 | Abandoned |
Array
(
[id] => 5088019
[patent_doc_number] => 20070227658
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-10-04
[patent_title] => 'CONTROL DEVICE FOR CONTROLLING SUBSTRATE PROCESSING APPARATUS AND METHOD THEREFOR'
[patent_app_type] => utility
[patent_app_number] => 11/692426
[patent_app_country] => US
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[pdf_file] => publications/A1/0227/20070227658.pdf
[firstpage_image] =>[orig_patent_app_number] => 11692426
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/692426 | CONTROL DEVICE FOR CONTROLLING SUBSTRATE PROCESSING APPARATUS AND METHOD THEREFOR | Mar 27, 2007 | Abandoned |
Array
(
[id] => 5088028
[patent_doc_number] => 20070227667
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-10-04
[patent_title] => 'PLASMA PROCESSING APPARATUS AND METHOD OF MEASURING AMOUNT OF RADIO-FREQUENCY CURRENT IN PLASMA'
[patent_app_type] => utility
[patent_app_number] => 11/692340
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[pdf_file] => publications/A1/0227/20070227667.pdf
[firstpage_image] =>[orig_patent_app_number] => 11692340
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/692340 | Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma | Mar 27, 2007 | Issued |
Array
(
[id] => 5063069
[patent_doc_number] => 20070224709
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-27
[patent_title] => 'PLASMA PROCESSING METHOD AND APPARATUS, CONTROL PROGRAM AND STORAGE MEDIUM'
[patent_app_type] => utility
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Array
(
[id] => 5002091
[patent_doc_number] => 20070199655
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[patent_issue_date] => 2007-08-30
[patent_title] => 'SUBSTRATE PROCESSING APPARATUS, METHOD FOR MODIFYING SUBSTRATE PROCESSING CONDITIONS AND STORAGE MEDIUM'
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Array
(
[id] => 5061360
[patent_doc_number] => 20070222999
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-09-27
[patent_title] => 'Apparatus for monitoring a density profile of impurities'
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[firstpage_image] =>[orig_patent_app_number] => 11710579
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/710579 | Apparatus for monitoring a density profile of impurities | Feb 25, 2007 | Abandoned |
Array
(
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[patent_title] => 'System for adjusting manufacturing equipment, method for adjusting manufacturing equipment, and method for manufacturing semiconductor device'
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Array
(
[id] => 5357160
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[patent_title] => 'SUSCEPTOR AND APPARATUS FOR MANUFACTURING EPITAXIAL WAFER'
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Array
(
[id] => 150818
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[patent_issue_date] => 2010-03-16
[patent_title] => 'Method and apparatus for an improved bellows shield in a plasma processing system'
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[pdf_file] => patents/07/678/07678226.pdf
[firstpage_image] =>[orig_patent_app_number] => 11671282
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/671282 | Method and apparatus for an improved bellows shield in a plasma processing system | Feb 4, 2007 | Issued |
Array
(
[id] => 5097802
[patent_doc_number] => 20070181062
[patent_country] => US
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[patent_issue_date] => 2007-08-09
[patent_title] => 'SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS INCLUDING TEMPERATURE MEASURING UNIT'
[patent_app_type] => utility
[patent_app_number] => 11/670596
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/670596 | SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS INCLUDING TEMPERATURE MEASURING UNIT | Feb 1, 2007 | Abandoned |