
Amanda C Walke
Examiner (ID: 17917, Phone: (571)272-1337 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1752, 1737, 1722, 1795 |
| Total Applications | 2742 |
| Issued Applications | 2302 |
| Pending Applications | 149 |
| Abandoned Applications | 347 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8446025
[patent_doc_number] => 08288074
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[patent_kind] => B2
[patent_issue_date] => 2012-10-16
[patent_title] => 'Photoimaging method and apparatus'
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Array
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[patent_title] => 'Inorganic resist sensitizer'
[patent_app_type] => utility
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/496920 | Electrode and method for manufacturing the same | Jul 1, 2009 | Issued |
Array
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[patent_title] => 'STRIPPER SOLUTIONS EFFECTIVE FOR BACK-END-OF-LINE OPERATIONS'
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Array
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[patent_issue_date] => 2014-03-25
[patent_title] => 'Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method'
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Array
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[patent_issue_date] => 2011-11-24
[patent_title] => 'PHOTORESIST COMPOSITION COMPRISING PHOTOINITIATORS, AND TRANSPARENT THIN FILM AND LIQUID CRYSTAL DISPLAY DEVICE USING THE COMPOSITION'
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Array
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[patent_title] => 'Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device'
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Array
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[patent_doc_number] => 08110335
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[patent_issue_date] => 2012-02-07
[patent_title] => 'Resist patterning process and manufacturing photo mask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/457544 | Resist patterning process and manufacturing photo mask | Jun 14, 2009 | Issued |
Array
(
[id] => 6038771
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[patent_title] => 'RESIST PROCESSING METHOD'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/999300 | RESIST PROCESSING METHOD | Jun 9, 2009 | Abandoned |
Array
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[patent_title] => 'Block copolymer and substrate processing method'
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Array
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Array
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Array
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Array
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Array
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Array
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