
Amanda C Walke
Examiner (ID: 17917, Phone: (571)272-1337 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1752, 1737, 1722, 1795 |
| Total Applications | 2742 |
| Issued Applications | 2302 |
| Pending Applications | 149 |
| Abandoned Applications | 347 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5303336
[patent_doc_number] => 20090297988
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-12-03
[patent_title] => 'MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/466014
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/466014 | Manufacturing method of semiconductor integrated circuit device | May 13, 2009 | Issued |
Array
(
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[patent_doc_number] => 08129091
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-03-06
[patent_title] => 'Method for preparing a composite printing form using a template'
[patent_app_type] => utility
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[patent_app_date] => 2009-05-13
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Array
(
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[patent_issue_date] => 2013-04-23
[patent_title] => 'Positive-type photosensitive composition'
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Array
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[patent_issue_date] => 2009-11-19
[patent_title] => 'Patterning process'
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Array
(
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[patent_title] => 'Photoacid generator, resist composition, and patterning process'
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Array
(
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[patent_title] => 'SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METHOD USING SAME'
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Array
(
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Array
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[patent_doc_number] => 20090269705
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[patent_issue_date] => 2009-10-29
[patent_title] => 'Lighography method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/386899 | Lithography method | Apr 23, 2009 | Issued |
Array
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[patent_title] => 'Polyorganosiloxane, resin composition, and patterning process'
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Array
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[patent_title] => 'Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board'
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[patent_app_number] => 12/989934
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Array
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Array
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Array
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Array
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Array
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Array
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Array
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