
Amanda C Walke
Examiner (ID: 17917, Phone: (571)272-1337 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1752, 1737, 1722, 1795 |
| Total Applications | 2742 |
| Issued Applications | 2302 |
| Pending Applications | 149 |
| Abandoned Applications | 347 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5379641
[patent_doc_number] => 20090191480
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-30
[patent_title] => 'THERMOPLASTIC MATERIAL COMPRISING POLYCHROMIC SUBSTANCES'
[patent_app_type] => utility
[patent_app_number] => 12/357671
[patent_app_country] => US
[patent_app_date] => 2009-01-22
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0191/20090191480.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/357671 | Thermoplastic material comprising polychromic substances | Jan 21, 2009 | Issued |
Array
(
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[patent_doc_number] => 20090155715
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-06-18
[patent_title] => 'PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS'
[patent_app_type] => utility
[patent_app_number] => 12/356187
[patent_app_country] => US
[patent_app_date] => 2009-01-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0155/20090155715.pdf
[firstpage_image] =>[orig_patent_app_number] => 12356187
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/356187 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Jan 19, 2009 | Issued |
Array
(
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[patent_doc_number] => 07960091
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[patent_kind] => B2
[patent_issue_date] => 2011-06-14
[patent_title] => 'Resist composition and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/356011
[patent_app_country] => US
[patent_app_date] => 2009-01-19
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/356011 | Resist composition and method of forming resist pattern | Jan 18, 2009 | Issued |
Array
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[patent_doc_number] => 20090130592
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-05-21
[patent_title] => 'Compositions and processes for immersion lithography'
[patent_app_type] => utility
[patent_app_number] => 12/319737
[patent_app_country] => US
[patent_app_date] => 2009-01-12
[patent_effective_date] => 0000-00-00
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Array
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[patent_title] => 'Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/318899 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Jan 11, 2009 | Abandoned |
Array
(
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[patent_issue_date] => 2009-07-30
[patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/351398
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/351398 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | Jan 8, 2009 | Issued |
Array
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[patent_issue_date] => 2011-12-27
[patent_title] => 'Substrate planarization with imprint materials and processes'
[patent_app_type] => utility
[patent_app_number] => 12/350250
[patent_app_country] => US
[patent_app_date] => 2009-01-08
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/350250 | Substrate planarization with imprint materials and processes | Jan 7, 2009 | Issued |
Array
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[id] => 196321
[patent_doc_number] => 07638261
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-12-29
[patent_title] => 'Radiation-sensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 12/348171
[patent_app_country] => US
[patent_app_date] => 2009-01-02
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[firstpage_image] =>[orig_patent_app_number] => 12348171
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/348171 | Radiation-sensitive resin composition | Jan 1, 2009 | Issued |
Array
(
[id] => 122367
[patent_doc_number] => 07704674
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[patent_kind] => B1
[patent_issue_date] => 2010-04-27
[patent_title] => 'Method for patterning a photo-resist in an immersion lithography process'
[patent_app_type] => utility
[patent_app_number] => 12/347786
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/347786 | Method for patterning a photo-resist in an immersion lithography process | Dec 30, 2008 | Issued |
Array
(
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[patent_doc_number] => 07887992
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[patent_kind] => B2
[patent_issue_date] => 2011-02-15
[patent_title] => 'Photosensitive paste and process for production of pattern using the same'
[patent_app_type] => utility
[patent_app_number] => 12/342163
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/342163 | Photosensitive paste and process for production of pattern using the same | Dec 22, 2008 | Issued |
Array
(
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[patent_title] => 'Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor'
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Array
(
[id] => 6438173
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Array
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Array
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Array
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Array
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