
Amanda C Walke
Examiner (ID: 17917, Phone: (571)272-1337 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1752, 1737, 1722, 1795 |
| Total Applications | 2742 |
| Issued Applications | 2302 |
| Pending Applications | 149 |
| Abandoned Applications | 347 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6070554
[patent_doc_number] => 20110045404
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-02-24
[patent_title] => 'COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/673926
[patent_app_country] => US
[patent_app_date] => 2008-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4947
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0045/20110045404.pdf
[firstpage_image] =>[orig_patent_app_number] => 12673926
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/673926 | Composition for forming resist underlayer film for lithography and production method of semiconductor device | Aug 25, 2008 | Issued |
Array
(
[id] => 7728958
[patent_doc_number] => 08101336
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-01-24
[patent_title] => 'Photocurable and thermosetting resin composition, cured product thereof, and printed circuit board'
[patent_app_type] => utility
[patent_app_number] => 12/195793
[patent_app_country] => US
[patent_app_date] => 2008-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 10471
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/101/08101336.pdf
[firstpage_image] =>[orig_patent_app_number] => 12195793
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/195793 | Photocurable and thermosetting resin composition, cured product thereof, and printed circuit board | Aug 20, 2008 | Issued |
Array
(
[id] => 5337162
[patent_doc_number] => 20090053626
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-26
[patent_title] => 'COLORED PHOTOSENSITIVE COMPOSITION, COLOR FILTER, AND METHOD FOR MANUFACTURING COLOR FILTER'
[patent_app_type] => utility
[patent_app_number] => 12/192711
[patent_app_country] => US
[patent_app_date] => 2008-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19744
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0053/20090053626.pdf
[firstpage_image] =>[orig_patent_app_number] => 12192711
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/192711 | Colored photosensitive composition, color filter, and method for manufacturing color filter | Aug 14, 2008 | Issued |
Array
(
[id] => 6469643
[patent_doc_number] => 20100040838
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-02-18
[patent_title] => 'Hardmask Process for Forming a Reverse Tone Image'
[patent_app_type] => utility
[patent_app_number] => 12/192621
[patent_app_country] => US
[patent_app_date] => 2008-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 8437
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0040/20100040838.pdf
[firstpage_image] =>[orig_patent_app_number] => 12192621
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/192621 | Hardmask Process for Forming a Reverse Tone Image | Aug 14, 2008 | Abandoned |
Array
(
[id] => 6476978
[patent_doc_number] => 20100041551
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-02-18
[patent_title] => 'THERMALLY GATED PHOTOCHROMIC MEDIUM'
[patent_app_type] => utility
[patent_app_number] => 12/190531
[patent_app_country] => US
[patent_app_date] => 2008-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8877
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 5
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0041/20100041551.pdf
[firstpage_image] =>[orig_patent_app_number] => 12190531
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/190531 | Thermally gated photochromic medium | Aug 11, 2008 | Issued |
Array
(
[id] => 6254116
[patent_doc_number] => 20100028813
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-02-04
[patent_title] => 'BACKSIDE CLEANING OF SUBSTRATE'
[patent_app_type] => utility
[patent_app_number] => 12/185595
[patent_app_country] => US
[patent_app_date] => 2008-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3157
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0028/20100028813.pdf
[firstpage_image] =>[orig_patent_app_number] => 12185595
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/185595 | BACKSIDE CLEANING OF SUBSTRATE | Aug 3, 2008 | Abandoned |
Array
(
[id] => 4485116
[patent_doc_number] => 07883829
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-02-08
[patent_title] => 'Lithography for pitch reduction'
[patent_app_type] => utility
[patent_app_number] => 12/184438
[patent_app_country] => US
[patent_app_date] => 2008-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 7446
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 48
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/883/07883829.pdf
[firstpage_image] =>[orig_patent_app_number] => 12184438
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/184438 | Lithography for pitch reduction | Jul 31, 2008 | Issued |
Array
(
[id] => 5446376
[patent_doc_number] => 20090047602
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-02-19
[patent_title] => 'FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPOSURE, AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/184566
[patent_app_country] => US
[patent_app_date] => 2008-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 24924
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0047/20090047602.pdf
[firstpage_image] =>[orig_patent_app_number] => 12184566
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/184566 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Jul 31, 2008 | Issued |
Array
(
[id] => 6343261
[patent_doc_number] => 20100248146
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-30
[patent_title] => 'POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/672329
[patent_app_country] => US
[patent_app_date] => 2008-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14793
[patent_no_of_claims] => 6
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0248/20100248146.pdf
[firstpage_image] =>[orig_patent_app_number] => 12672329
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/672329 | Positive resist composition and pattern forming method using the same | Jul 31, 2008 | Issued |
Array
(
[id] => 6001501
[patent_doc_number] => 20110117489
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-05-19
[patent_title] => 'COMPOUND AND RADIATION-SENSITIVE COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/673167
[patent_app_country] => US
[patent_app_date] => 2008-07-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 11782
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0117/20110117489.pdf
[firstpage_image] =>[orig_patent_app_number] => 12673167
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/673167 | Compound and radiation-sensitive composition | Jul 29, 2008 | Issued |
Array
(
[id] => 4960005
[patent_doc_number] => 20080274430
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-11-06
[patent_title] => 'UV RADIATION BLOCKING PROTECTIVE LAYERS COMPATIBLE WITH THICK FILM PASTES'
[patent_app_type] => utility
[patent_app_number] => 12/175633
[patent_app_country] => US
[patent_app_date] => 2008-07-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0274/20080274430.pdf
[firstpage_image] =>[orig_patent_app_number] => 12175633
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/175633 | UV radiation blocking protective layers compatible with thick film pastes | Jul 17, 2008 | Issued |
Array
(
[id] => 4491923
[patent_doc_number] => 07955780
[patent_country] => US
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[patent_issue_date] => 2011-06-07
[patent_title] => 'Positive resist composition and pattern forming method using the same'
[patent_app_type] => utility
[patent_app_number] => 12/668674
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[pdf_file] => patents/07/955/07955780.pdf
[firstpage_image] =>[orig_patent_app_number] => 12668674
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/668674 | Positive resist composition and pattern forming method using the same | Jul 9, 2008 | Issued |
Array
(
[id] => 9245047
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[patent_issue_date] => 2013-12-17
[patent_title] => 'Forming sub-lithographic patterns using double exposure'
[patent_app_type] => utility
[patent_app_number] => 12/170722
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/170722 | Forming sub-lithographic patterns using double exposure | Jul 9, 2008 | Issued |
Array
(
[id] => 5296441
[patent_doc_number] => 20090011367
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-01-08
[patent_title] => 'INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/167648
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[patent_app_date] => 2008-07-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0011/20090011367.pdf
[firstpage_image] =>[orig_patent_app_number] => 12167648
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/167648 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | Jul 2, 2008 | Abandoned |
Array
(
[id] => 5464906
[patent_doc_number] => 20090325106
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-12-31
[patent_title] => 'Method for Implant Imaging with Spin-on Hard Masks'
[patent_app_type] => utility
[patent_app_number] => 12/147889
[patent_app_country] => US
[patent_app_date] => 2008-06-27
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[pdf_file] => publications/A1/0325/20090325106.pdf
[firstpage_image] =>[orig_patent_app_number] => 12147889
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/147889 | Method for Implant Imaging with Spin-on Hard Masks | Jun 26, 2008 | Abandoned |
Array
(
[id] => 8457795
[patent_doc_number] => 08293461
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-10-23
[patent_title] => 'Direct emulsion process for making printed circuits'
[patent_app_type] => utility
[patent_app_number] => 12/141662
[patent_app_country] => US
[patent_app_date] => 2008-06-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/141662 | Direct emulsion process for making printed circuits | Jun 17, 2008 | Issued |
Array
(
[id] => 5287585
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[patent_issue_date] => 2009-01-22
[patent_title] => 'AUTOMATED DIRECT EMULSION PROCESS FOR MAKING PRINTED CIRCUITS AND MULTILAYER PRINTED CIRCUITS'
[patent_app_type] => utility
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Array
(
[id] => 6229519
[patent_doc_number] => 20100183985
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[patent_issue_date] => 2010-07-22
[patent_title] => 'PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/602156 | Process for producing semiconductor device | Jun 16, 2008 | Issued |
Array
(
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[patent_issue_date] => 2010-07-22
[patent_title] => 'SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/664570 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT | Jun 12, 2008 | Abandoned |
Array
(
[id] => 4444254
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[patent_title] => 'Chemical trim of photoresist lines by means of a tuned overcoat material'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/137743 | Chemical trim of photoresist lines by means of a tuned overcoat material | Jun 11, 2008 | Issued |