
Anca Eoff
Examiner (ID: 671, Phone: (571)272-9810 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1796, 1753, 1795, 1722 |
| Total Applications | 1392 |
| Issued Applications | 1015 |
| Pending Applications | 120 |
| Abandoned Applications | 284 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8301545
[patent_doc_number] => 20120184101
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-07-19
[patent_title] => 'CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 13/353955
[patent_app_country] => US
[patent_app_date] => 2012-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 11639
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13353955
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/353955 | Chemically amplified positive resist composition and patterning process | Jan 18, 2012 | Issued |
Array
(
[id] => 8920676
[patent_doc_number] => 08486607
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-07-16
[patent_title] => 'Method of making a relief image'
[patent_app_type] => utility
[patent_app_number] => 13/350848
[patent_app_country] => US
[patent_app_date] => 2012-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 18
[patent_no_of_words] => 7185
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 240
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13350848
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/350848 | Method of making a relief image | Jan 15, 2012 | Issued |
Array
(
[id] => 10014939
[patent_doc_number] => 09057952
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-06-16
[patent_title] => 'Positive resist composition and method of pattern formation with the same'
[patent_app_type] => utility
[patent_app_number] => 13/345978
[patent_app_country] => US
[patent_app_date] => 2012-01-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 26326
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13345978
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/345978 | Positive resist composition and method of pattern formation with the same | Jan 8, 2012 | Issued |
Array
(
[id] => 8277745
[patent_doc_number] => 20120171616
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-07-05
[patent_title] => 'POLYMERIZABLE PHOTOACID GENERATORS'
[patent_app_type] => utility
[patent_app_number] => 13/339948
[patent_app_country] => US
[patent_app_date] => 2011-12-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12277
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13339948
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/339948 | Polymerizable photoacid generators | Dec 28, 2011 | Issued |
Array
(
[id] => 8160580
[patent_doc_number] => 20120101205
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-04-26
[patent_title] => 'COPOLYMER AND TOP COATING COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 13/338569
[patent_app_country] => US
[patent_app_date] => 2011-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 11705
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0101/20120101205.pdf
[firstpage_image] =>[orig_patent_app_number] => 13338569
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/338569 | Copolymer and top coating composition | Dec 27, 2011 | Issued |
Array
(
[id] => 8955616
[patent_doc_number] => 08501388
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-08-06
[patent_title] => 'Method of making laser-ablatable elements'
[patent_app_type] => utility
[patent_app_number] => 13/334230
[patent_app_country] => US
[patent_app_date] => 2011-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 11484
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 164
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13334230
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/334230 | Method of making laser-ablatable elements | Dec 21, 2011 | Issued |
Array
(
[id] => 8265156
[patent_doc_number] => 20120164579
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-06-28
[patent_title] => 'SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 13/333521
[patent_app_country] => US
[patent_app_date] => 2011-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19705
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13333521
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/333521 | Salt, photoresist composition and process for producing photoresist pattern | Dec 20, 2011 | Issued |
Array
(
[id] => 10897815
[patent_doc_number] => 08921027
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-12-30
[patent_title] => 'Radiation-sensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 13/326328
[patent_app_country] => US
[patent_app_date] => 2011-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8828
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 21
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13326328
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/326328 | Radiation-sensitive resin composition | Dec 14, 2011 | Issued |
Array
(
[id] => 8538166
[patent_doc_number] => 08313887
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-11-20
[patent_title] => 'Ablatable elements for making flexographic printing plates'
[patent_app_type] => utility
[patent_app_number] => 13/325093
[patent_app_country] => US
[patent_app_date] => 2011-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6948
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13325093
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/325093 | Ablatable elements for making flexographic printing plates | Dec 13, 2011 | Issued |
Array
(
[id] => 9323325
[patent_doc_number] => 08658343
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-02-25
[patent_title] => 'Resist composition, and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 13/373965
[patent_app_country] => US
[patent_app_date] => 2011-12-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 36088
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13373965
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/373965 | Resist composition, and method of forming resist pattern | Dec 4, 2011 | Issued |
Array
(
[id] => 8054779
[patent_doc_number] => 20120077125
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-29
[patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 13/310625
[patent_app_country] => US
[patent_app_date] => 2011-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 40554
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0077/20120077125.pdf
[firstpage_image] =>[orig_patent_app_number] => 13310625
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/310625 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Dec 1, 2011 | Issued |
Array
(
[id] => 8054779
[patent_doc_number] => 20120077125
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-29
[patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 13/310625
[patent_app_country] => US
[patent_app_date] => 2011-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 40554
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0077/20120077125.pdf
[firstpage_image] =>[orig_patent_app_number] => 13310625
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/310625 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Dec 1, 2011 | Issued |
Array
(
[id] => 8054779
[patent_doc_number] => 20120077125
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-29
[patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 13/310625
[patent_app_country] => US
[patent_app_date] => 2011-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 40554
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0077/20120077125.pdf
[firstpage_image] =>[orig_patent_app_number] => 13310625
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/310625 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Dec 1, 2011 | Issued |
Array
(
[id] => 8054779
[patent_doc_number] => 20120077125
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-29
[patent_title] => 'RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 13/310625
[patent_app_country] => US
[patent_app_date] => 2011-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 40554
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0077/20120077125.pdf
[firstpage_image] =>[orig_patent_app_number] => 13310625
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/310625 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Dec 1, 2011 | Issued |
Array
(
[id] => 8509519
[patent_doc_number] => 20120308927
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-12-06
[patent_title] => 'POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAHIC PATTERNS'
[patent_app_type] => utility
[patent_app_number] => 13/309843
[patent_app_country] => US
[patent_app_date] => 2011-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 9845
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13309843
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/309843 | Polymers, photoresist compositions and methods of forming photolithographic patterns | Dec 1, 2011 | Issued |
Array
(
[id] => 7784163
[patent_doc_number] => 20120045719
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-02-23
[patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 13/288963
[patent_app_country] => US
[patent_app_date] => 2011-11-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 15432
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0045/20120045719.pdf
[firstpage_image] =>[orig_patent_app_number] => 13288963
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/288963 | Radiation-sensitive resin composition and compound | Nov 3, 2011 | Issued |
Array
(
[id] => 7807482
[patent_doc_number] => 20120058436
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-08
[patent_title] => 'PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD'
[patent_app_type] => utility
[patent_app_number] => 13/285782
[patent_app_country] => US
[patent_app_date] => 2011-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 35821
[patent_no_of_claims] => 45
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20120058436.pdf
[firstpage_image] =>[orig_patent_app_number] => 13285782
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/285782 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | Oct 30, 2011 | Abandoned |
Array
(
[id] => 8172738
[patent_doc_number] => 20120108071
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-05-03
[patent_title] => 'RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/269290
[patent_app_country] => US
[patent_app_date] => 2011-10-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 12536
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0108/20120108071.pdf
[firstpage_image] =>[orig_patent_app_number] => 13269290
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/269290 | Resist underlayer film composition and patterning process using the same | Oct 6, 2011 | Issued |
Array
(
[id] => 9989358
[patent_doc_number] => 09034558
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-05-19
[patent_title] => 'Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern'
[patent_app_type] => utility
[patent_app_number] => 13/808489
[patent_app_country] => US
[patent_app_date] => 2011-09-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 36757
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 95
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13808489
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/808489 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | Sep 27, 2011 | Issued |
Array
(
[id] => 8140675
[patent_doc_number] => 20120094888
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-04-19
[patent_title] => 'METHOD FOR REMOVING AN UNCURED PHOTOSENSITIVE COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 13/243090
[patent_app_country] => US
[patent_app_date] => 2011-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7515
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0094/20120094888.pdf
[firstpage_image] =>[orig_patent_app_number] => 13243090
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/243090 | Method for removing an uncured photosensitive composition | Sep 22, 2011 | Issued |