Search

Anca Eoff

Examiner (ID: 671, Phone: (571)272-9810 , Office: P/1722 )

Most Active Art Unit
1722
Art Unit(s)
1796, 1753, 1795, 1722
Total Applications
1392
Issued Applications
1015
Pending Applications
120
Abandoned Applications
284

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 9626275 [patent_doc_number] => 08795951 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-08-05 [patent_title] => 'Material for forming resist sensitization film and production method of semiconductor device' [patent_app_type] => utility [patent_app_number] => 12/967615 [patent_app_country] => US [patent_app_date] => 2010-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 25 [patent_no_of_words] => 13876 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 178 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12967615 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/967615
Material for forming resist sensitization film and production method of semiconductor device Dec 13, 2010 Issued
Array ( [id] => 6142789 [patent_doc_number] => 20110129777 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-02 [patent_title] => 'CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/957785 [patent_app_country] => US [patent_app_date] => 2010-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10323 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0129/20110129777.pdf [firstpage_image] =>[orig_patent_app_number] => 12957785 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/957785
Chemically amplified resist composition and patterning process Nov 30, 2010 Issued
Array ( [id] => 6142798 [patent_doc_number] => 20110129781 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-02 [patent_title] => 'Methods of forming a pattern using photoresist compositions' [patent_app_type] => utility [patent_app_number] => 12/952513 [patent_app_country] => US [patent_app_date] => 2010-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 14155 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0129/20110129781.pdf [firstpage_image] =>[orig_patent_app_number] => 12952513 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/952513
Methods of forming a pattern using photoresist compositions Nov 22, 2010 Abandoned
Array ( [id] => 5970228 [patent_doc_number] => 20110151378 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-23 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/949790 [patent_app_country] => US [patent_app_date] => 2010-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 18081 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0151/20110151378.pdf [firstpage_image] =>[orig_patent_app_number] => 12949790 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/949790
RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD Nov 18, 2010 Abandoned
Array ( [id] => 5943991 [patent_doc_number] => 20110104611 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-05-05 [patent_title] => 'NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/949795 [patent_app_country] => US [patent_app_date] => 2010-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14967 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20110104611.pdf [firstpage_image] =>[orig_patent_app_number] => 12949795 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/949795
Compound, polymer, and radiation-sensitive composition Nov 18, 2010 Issued
Array ( [id] => 6202256 [patent_doc_number] => 20110065042 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-17 [patent_title] => 'PHOTOPOLYMERIZABLE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/944812 [patent_app_country] => US [patent_app_date] => 2010-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15455 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20110065042.pdf [firstpage_image] =>[orig_patent_app_number] => 12944812 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/944812
PHOTOPOLYMERIZABLE COMPOSITION Nov 11, 2010 Abandoned
Array ( [id] => 6007367 [patent_doc_number] => 20110059398 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-10 [patent_title] => 'PHOTOPOLYMERIZABLE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/944815 [patent_app_country] => US [patent_app_date] => 2010-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15454 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0059/20110059398.pdf [firstpage_image] =>[orig_patent_app_number] => 12944815 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/944815
PHOTOPOLYMERIZABLE COMPOSITION Nov 11, 2010 Abandoned
Array ( [id] => 6054982 [patent_doc_number] => 20110111342 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-05-12 [patent_title] => 'PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/941408 [patent_app_country] => US [patent_app_date] => 2010-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13299 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0111/20110111342.pdf [firstpage_image] =>[orig_patent_app_number] => 12941408 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/941408
PHOTORESIST COMPOSITION Nov 7, 2010 Abandoned
Array ( [id] => 5943990 [patent_doc_number] => 20110104610 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-05-05 [patent_title] => 'POSITIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/915710 [patent_app_country] => US [patent_app_date] => 2010-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 17345 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20110104610.pdf [firstpage_image] =>[orig_patent_app_number] => 12915710 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/915710
Positive photosensitive composition and pattern forming method using the same Oct 28, 2010 Issued
Array ( [id] => 6081073 [patent_doc_number] => 20110143266 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-16 [patent_title] => 'NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/911338 [patent_app_country] => US [patent_app_date] => 2010-10-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14763 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0143/20110143266.pdf [firstpage_image] =>[orig_patent_app_number] => 12911338 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/911338
Negative resist composition and patterning process Oct 24, 2010 Issued
Array ( [id] => 6142745 [patent_doc_number] => 20110129765 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-02 [patent_title] => 'NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/902868 [patent_app_country] => US [patent_app_date] => 2010-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16477 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0129/20110129765.pdf [firstpage_image] =>[orig_patent_app_number] => 12902868 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/902868
Negative resist composition and patterning process Oct 11, 2010 Issued
Array ( [id] => 8749261 [patent_doc_number] => 08415092 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-04-09 [patent_title] => 'Substrate developing method, substrate processing method and developing solution supply nozzle' [patent_app_type] => utility [patent_app_number] => 12/923703 [patent_app_country] => US [patent_app_date] => 2010-10-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 19 [patent_no_of_words] => 9617 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12923703 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/923703
Substrate developing method, substrate processing method and developing solution supply nozzle Oct 4, 2010 Issued
Array ( [id] => 9831659 [patent_doc_number] => 08940471 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-01-27 [patent_title] => 'Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition' [patent_app_type] => utility [patent_app_number] => 12/895300 [patent_app_country] => US [patent_app_date] => 2010-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 30178 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12895300 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/895300
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition Sep 29, 2010 Issued
Array ( [id] => 6090169 [patent_doc_number] => 20110000874 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-01-06 [patent_title] => 'METHOD FOR STRIPPING PHOTORESIST' [patent_app_type] => utility [patent_app_number] => 12/883592 [patent_app_country] => US [patent_app_date] => 2010-09-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6435 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0000/20110000874.pdf [firstpage_image] =>[orig_patent_app_number] => 12883592 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/883592
Method for stripping photoresist Sep 15, 2010 Issued
Array ( [id] => 7790881 [patent_doc_number] => 20120052437 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-03-01 [patent_title] => 'HIGH RESOLUTION, SOLVENT RESISTANT, THIN ELASTOMERIC PRINTING PLATES' [patent_app_type] => utility [patent_app_number] => 12/873567 [patent_app_country] => US [patent_app_date] => 2010-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5827 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0052/20120052437.pdf [firstpage_image] =>[orig_patent_app_number] => 12873567 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/873567
High resolution, solvent resistant, thin elastomeric printing plates Aug 31, 2010 Issued
Array ( [id] => 6607180 [patent_doc_number] => 20100323305 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-23 [patent_title] => 'PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/871969 [patent_app_country] => US [patent_app_date] => 2010-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 39785 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0323/20100323305.pdf [firstpage_image] =>[orig_patent_app_number] => 12871969 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/871969
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method Aug 30, 2010 Issued
Array ( [id] => 6607180 [patent_doc_number] => 20100323305 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-23 [patent_title] => 'PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/871969 [patent_app_country] => US [patent_app_date] => 2010-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 39785 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0323/20100323305.pdf [firstpage_image] =>[orig_patent_app_number] => 12871969 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/871969
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method Aug 30, 2010 Issued
Array ( [id] => 6607180 [patent_doc_number] => 20100323305 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-23 [patent_title] => 'PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/871969 [patent_app_country] => US [patent_app_date] => 2010-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 39785 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0323/20100323305.pdf [firstpage_image] =>[orig_patent_app_number] => 12871969 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/871969
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method Aug 30, 2010 Issued
Array ( [id] => 6607180 [patent_doc_number] => 20100323305 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-23 [patent_title] => 'PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/871969 [patent_app_country] => US [patent_app_date] => 2010-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 39785 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0323/20100323305.pdf [firstpage_image] =>[orig_patent_app_number] => 12871969 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/871969
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method Aug 30, 2010 Issued
Array ( [id] => 8240217 [patent_doc_number] => 20120148954 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-06-14 [patent_title] => 'N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 13/392129 [patent_app_country] => US [patent_app_date] => 2010-08-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 16330 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13392129 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/392129
N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition Aug 26, 2010 Issued
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