
Anca Eoff
Examiner (ID: 671, Phone: (571)272-9810 , Office: P/1722 )
| Most Active Art Unit | 1722 |
| Art Unit(s) | 1796, 1753, 1795, 1722 |
| Total Applications | 1392 |
| Issued Applications | 1015 |
| Pending Applications | 120 |
| Abandoned Applications | 284 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5625212
[patent_doc_number] => 20060263717
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-11-23
[patent_title] => 'Photoresist coating composition and method for forming fine pattern using the same'
[patent_app_type] => utility
[patent_app_number] => 11/298385
[patent_app_country] => US
[patent_app_date] => 2005-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 2842
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0263/20060263717.pdf
[firstpage_image] =>[orig_patent_app_number] => 11298385
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/298385 | Photoresist coating composition and method for forming fine pattern using the same | Dec 7, 2005 | Issued |
Array
(
[id] => 4432290
[patent_doc_number] => 07897325
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-03-01
[patent_title] => 'Lithographic rinse solution and method for forming patterned resist layer using the same'
[patent_app_type] => utility
[patent_app_number] => 11/296343
[patent_app_country] => US
[patent_app_date] => 2005-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 4164
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/897/07897325.pdf
[firstpage_image] =>[orig_patent_app_number] => 11296343
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/296343 | Lithographic rinse solution and method for forming patterned resist layer using the same | Dec 7, 2005 | Issued |
Array
(
[id] => 5079525
[patent_doc_number] => 20070122749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-31
[patent_title] => 'Method of nanopatterning, a resist film for use therein, and an article including the resist film'
[patent_app_type] => utility
[patent_app_number] => 11/290866
[patent_app_country] => US
[patent_app_date] => 2005-11-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 4008
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0122/20070122749.pdf
[firstpage_image] =>[orig_patent_app_number] => 11290866
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/290866 | Method of nanopatterning, a resist film for use therein, and an article including the resist film | Nov 29, 2005 | Abandoned |
Array
(
[id] => 5699952
[patent_doc_number] => 20060216636
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-09-28
[patent_title] => 'Catalytic resist including metal precursor compound and method of patterning catalyst particles using the same'
[patent_app_type] => utility
[patent_app_number] => 11/280412
[patent_app_country] => US
[patent_app_date] => 2005-11-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 2399
[patent_no_of_claims] => 20
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[pdf_file] => publications/A1/0216/20060216636.pdf
[firstpage_image] =>[orig_patent_app_number] => 11280412
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/280412 | Catalytic resist including metal precursor compound and method of patterning catalyst particles using the same | Nov 16, 2005 | Abandoned |
Array
(
[id] => 5079510
[patent_doc_number] => 20070122734
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-31
[patent_title] => 'Molecular photoresist'
[patent_app_type] => utility
[patent_app_number] => 11/273667
[patent_app_country] => US
[patent_app_date] => 2005-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3223
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[pdf_file] => publications/A1/0122/20070122734.pdf
[firstpage_image] =>[orig_patent_app_number] => 11273667
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/273667 | Molecular photoresist | Nov 13, 2005 | Abandoned |
Array
(
[id] => 4440977
[patent_doc_number] => 07927779
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-04-19
[patent_title] => 'Water mark defect prevention for immersion lithography'
[patent_app_type] => utility
[patent_app_number] => 11/271639
[patent_app_country] => US
[patent_app_date] => 2005-11-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 3438
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[pdf_file] => patents/07/927/07927779.pdf
[firstpage_image] =>[orig_patent_app_number] => 11271639
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/271639 | Water mark defect prevention for immersion lithography | Nov 9, 2005 | Issued |
Array
(
[id] => 5215959
[patent_doc_number] => 20070105040
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-10
[patent_title] => 'Developable undercoating composition for thick photoresist layers'
[patent_app_type] => utility
[patent_app_number] => 11/271775
[patent_app_country] => US
[patent_app_date] => 2005-11-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 9781
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
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[pdf_file] => publications/A1/0105/20070105040.pdf
[firstpage_image] =>[orig_patent_app_number] => 11271775
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/271775 | Developable undercoating composition for thick photoresist layers | Nov 9, 2005 | Abandoned |
Array
(
[id] => 4527520
[patent_doc_number] => 07923193
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-04-12
[patent_title] => 'Photopolymerizable composition'
[patent_app_type] => utility
[patent_app_number] => 11/718635
[patent_app_country] => US
[patent_app_date] => 2005-11-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15454
[patent_no_of_claims] => 12
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/923/07923193.pdf
[firstpage_image] =>[orig_patent_app_number] => 11718635
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/718635 | Photopolymerizable composition | Nov 3, 2005 | Issued |
Array
(
[id] => 5807606
[patent_doc_number] => 20060093960
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-04
[patent_title] => 'Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 11/258894
[patent_app_country] => US
[patent_app_date] => 2005-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 28741
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[pdf_file] => publications/A1/0093/20060093960.pdf
[firstpage_image] =>[orig_patent_app_number] => 11258894
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/258894 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Oct 26, 2005 | Issued |
Array
(
[id] => 5016086
[patent_doc_number] => 20070259295
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-08
[patent_title] => 'Positive Photosensitive Composition'
[patent_app_type] => utility
[patent_app_number] => 11/663289
[patent_app_country] => US
[patent_app_date] => 2005-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 6373
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[pdf_file] => publications/A1/0259/20070259295.pdf
[firstpage_image] =>[orig_patent_app_number] => 11663289
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/663289 | Positive Photosensitive Composition | Oct 24, 2005 | Abandoned |
Array
(
[id] => 5040547
[patent_doc_number] => 20070092829
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-26
[patent_title] => 'Photosensitive coating for enhancing a contrast of a photolithographic exposure'
[patent_app_type] => utility
[patent_app_number] => 11/256677
[patent_app_country] => US
[patent_app_date] => 2005-10-21
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[pdf_file] => publications/A1/0092/20070092829.pdf
[firstpage_image] =>[orig_patent_app_number] => 11256677
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/256677 | Photosensitive coating for enhancing a contrast of a photolithographic exposure | Oct 20, 2005 | Abandoned |
Array
(
[id] => 5215958
[patent_doc_number] => 20070105039
[patent_country] => US
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[patent_issue_date] => 2007-05-10
[patent_title] => 'Dual band color forming composition'
[patent_app_type] => utility
[patent_app_number] => 11/254110
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[firstpage_image] =>[orig_patent_app_number] => 11254110
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/254110 | Dual band color forming composition | Oct 17, 2005 | Abandoned |
Array
(
[id] => 5873861
[patent_doc_number] => 20060166141
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[patent_issue_date] => 2006-07-27
[patent_title] => 'Inkjet-imageable lithographic printing members and methods of preparing and imaging them'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/249166 | Inkjet-imageable lithographic printing members and methods of preparing and imaging them | Oct 11, 2005 | Issued |
Array
(
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[patent_title] => 'Inkjet-imageable lithographic printing members and methods of preparing and imaging them'
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Array
(
[id] => 42299
[patent_doc_number] => 07781142
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[patent_kind] => B2
[patent_issue_date] => 2010-08-24
[patent_title] => 'Copolymer and top coating composition'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/664296 | Copolymer and top coating composition | Sep 27, 2005 | Issued |
Array
(
[id] => 5827609
[patent_doc_number] => 20060063077
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-23
[patent_title] => 'Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same'
[patent_app_type] => utility
[patent_app_number] => 11/233406
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/233406 | Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same | Sep 21, 2005 | Abandoned |
Array
(
[id] => 43161
[patent_doc_number] => 07776505
[patent_country] => US
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[patent_issue_date] => 2010-08-17
[patent_title] => 'High resolution resists for next generation lithographies'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/226912 | High resolution resists for next generation lithographies | Sep 13, 2005 | Issued |
Array
(
[id] => 4909522
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[patent_title] => 'Resist Composition and Process for Formation of Resist Patterns'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/574805 | Resist composition and process for formation of resist patterns | Sep 1, 2005 | Issued |
Array
(
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[patent_title] => 'Developing Solution Composition for Lithography and Method for Resist Pattern Formation'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/661317 | Developing Solution Composition for Lithography and Method for Resist Pattern Formation | Aug 28, 2005 | Abandoned |
Array
(
[id] => 4813245
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[patent_title] => 'Rinsing Liquid for Lithography and Method for Resist Pattern Formation'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/661426 | Rinsing Liquid for Lithography and Method for Resist Pattern Formation | Aug 28, 2005 | Abandoned |