
Anita Karen Alanko
Examiner (ID: 6769, Phone: (571)272-1458 , Office: P/1713 )
| Most Active Art Unit | 1713 |
| Art Unit(s) | 1713, 1763, 1792, 1746, 1765, 1109 |
| Total Applications | 1488 |
| Issued Applications | 1061 |
| Pending Applications | 142 |
| Abandoned Applications | 314 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3832529
[patent_doc_number] => 05814562
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-29
[patent_title] => 'Process for semiconductor device fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/558997
[patent_app_country] => US
[patent_app_date] => 1995-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 4838
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[patent_maintenance] => 1
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[pdf_file] => patents/05/814/05814562.pdf
[firstpage_image] =>[orig_patent_app_number] => 558997
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Array
(
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[patent_doc_number] => 05759426
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-02
[patent_title] => 'Heat treatment jig for semiconductor wafers and a method for treating a surface of the same'
[patent_app_type] => 1
[patent_app_number] => 8/558540
[patent_app_country] => US
[patent_app_date] => 1995-11-16
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[pdf_file] => patents/05/759/05759426.pdf
[firstpage_image] =>[orig_patent_app_number] => 558540
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/558540 | Heat treatment jig for semiconductor wafers and a method for treating a surface of the same | Nov 15, 1995 | Issued |
Array
(
[id] => 3686305
[patent_doc_number] => 05603849
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-02-18
[patent_title] => 'Methods and compositions for cleaning silicon wafers with a dynamic two phase liquid system with hydrofluoric acid'
[patent_app_type] => 1
[patent_app_number] => 8/559723
[patent_app_country] => US
[patent_app_date] => 1995-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 3085
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/559723 | Methods and compositions for cleaning silicon wafers with a dynamic two phase liquid system with hydrofluoric acid | Nov 14, 1995 | Issued |
Array
(
[id] => 3761656
[patent_doc_number] => 05772905
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-30
[patent_title] => 'Nanoimprint lithography'
[patent_app_type] => 1
[patent_app_number] => 8/558809
[patent_app_country] => US
[patent_app_date] => 1995-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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Array
(
[id] => 3965275
[patent_doc_number] => 05885899
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-23
[patent_title] => 'Method of chemically mechanically polishing an electronic component using a non-selective ammonium hydroxide slurry'
[patent_app_type] => 1
[patent_app_number] => 8/557224
[patent_app_country] => US
[patent_app_date] => 1995-11-14
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[pdf_file] => patents/05/885/05885899.pdf
[firstpage_image] =>[orig_patent_app_number] => 557224
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Array
(
[id] => 3849638
[patent_doc_number] => 05767018
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Method of etching a polysilicon pattern'
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[patent_app_number] => 8/554412
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/554412 | Method of etching a polysilicon pattern | Nov 7, 1995 | Issued |
Array
(
[id] => 3791867
[patent_doc_number] => 05726099
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-10
[patent_title] => 'Method of chemically mechanically polishing an electronic component using a non-selective ammonium persulfate slurry'
[patent_app_type] => 1
[patent_app_number] => 8/554880
[patent_app_country] => US
[patent_app_date] => 1995-11-07
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Array
(
[id] => 3807146
[patent_doc_number] => 05788869
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-04
[patent_title] => 'Methodology for in situ etch stop detection and control of plasma etching process and device design to minimize process chamber contamination'
[patent_app_type] => 1
[patent_app_number] => 8/552322
[patent_app_country] => US
[patent_app_date] => 1995-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3103
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[pdf_file] => patents/05/788/05788869.pdf
[firstpage_image] =>[orig_patent_app_number] => 552322
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/552322 | Methodology for in situ etch stop detection and control of plasma etching process and device design to minimize process chamber contamination | Nov 1, 1995 | Issued |
Array
(
[id] => 3849646
[patent_doc_number] => 05705027
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-06
[patent_title] => 'Method of removing etching residues'
[patent_app_type] => 1
[patent_app_number] => 8/551597
[patent_app_country] => US
[patent_app_date] => 1995-11-01
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 551597
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/551597 | Method of removing etching residues | Oct 31, 1995 | Issued |
Array
(
[id] => 3729117
[patent_doc_number] => 05698112
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-16
[patent_title] => 'Corrosion protection for micromechanical metal layers'
[patent_app_type] => 1
[patent_app_number] => 8/548517
[patent_app_country] => US
[patent_app_date] => 1995-10-26
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/548517 | Corrosion protection for micromechanical metal layers | Oct 25, 1995 | Issued |
Array
(
[id] => 3871516
[patent_doc_number] => 05728259
[patent_country] => US
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[patent_issue_date] => 1998-03-17
[patent_title] => 'Process for fabricating thin-film semiconductor device without plasma induced damage'
[patent_app_type] => 1
[patent_app_number] => 8/545122
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[patent_app_date] => 1995-10-19
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[firstpage_image] =>[orig_patent_app_number] => 545122
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/545122 | Process for fabricating thin-film semiconductor device without plasma induced damage | Oct 18, 1995 | Issued |
Array
(
[id] => 3660053
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[patent_title] => 'Chemical/mechanical planarization (CMP) endpoint method using measurement of polishing pad temperature'
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Array
(
[id] => 3725373
[patent_doc_number] => 05693239
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-02
[patent_title] => 'Polishing slurries comprising two abrasive components and methods for their use'
[patent_app_type] => 1
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Array
(
[id] => 3661660
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[patent_title] => 'Formation of atomic scale vertical features for topographic instrument calibration'
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Array
(
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Array
(
[id] => 3835117
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Array
(
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Array
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Array
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Array
(
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