Anna M. Crowell

Array ( [id] => 6930916 [patent_doc_number] => 20050281951 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-12-22 [patent_title] => 'Dielectric barrier discharge method for depositing film on substrates' [patent_app_type] => utility [patent_app_number] => 11/210589 [patent_app_country] => US [patent_app_date] => 2005-08-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3206 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0281/20050281951.pdf [firstpage_image] =>[orig_patent_app_number] => 11210589 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 5891588 [patent_doc_number] => 20060000552 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-01-05 [patent_title] => 'Plasma processing apparatus and cleaning method thereof' [patent_app_type] => utility [patent_app_number] => 11/171186 [patent_app_country] => US [patent_app_date] => 2005-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5852 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0000/20060000552.pdf [firstpage_image] =>[orig_patent_app_number] => 11171186 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 111532 [patent_doc_number] => 07713379 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-05-11 [patent_title] => 'Plasma confinement rings including RF absorbing material for reducing polymer deposition' [patent_app_type] => utility [patent_app_number] => 11/155493 [patent_app_country] => US [patent_app_date] => 2005-06-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 5910 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/713/07713379.pdf [firstpage_image] =>[orig_patent_app_number] => 11155493 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 5639884 [patent_doc_number] => 20060278339 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-12-14 [patent_title] => 'Etch rate uniformity using the independent movement of electrode pieces' [patent_app_type] => utility [patent_app_number] => 11/152016 [patent_app_country] => US [patent_app_date] => 2005-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2159 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0278/20060278339.pdf [firstpage_image] =>[orig_patent_app_number] => 11152016 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4551653 [patent_doc_number] => 07837825 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-11-23 [patent_title] => 'Confined plasma with adjustable electrode area ratio' [patent_app_type] => utility [patent_app_number] => 11/152022 [patent_app_country] => US [patent_app_date] => 2005-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3579 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 198 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/837/07837825.pdf [firstpage_image] =>[orig_patent_app_number] => 11152022 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 111656 [patent_doc_number] => 07713431 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-05-11 [patent_title] => 'Plasma processing method' [patent_app_type] => utility [patent_app_number] => 11/147434 [patent_app_country] => US [patent_app_date] => 2005-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 5747 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 169 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/713/07713431.pdf [firstpage_image] =>[orig_patent_app_number] => 11147434 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 5645239 [patent_doc_number] => 20060130971 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-06-22 [patent_title] => 'Apparatus for generating plasma by RF power' [patent_app_type] => utility [patent_app_number] => 11/137200 [patent_app_country] => US [patent_app_date] => 2005-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6520 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0130/20060130971.pdf [firstpage_image] =>[orig_patent_app_number] => 11137200 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 5707549 [patent_doc_number] => 20060048893 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-09 [patent_title] => 'Atmospheric pressure plasma processing reactor' [patent_app_type] => utility [patent_app_number] => 11/127865 [patent_app_country] => US [patent_app_date] => 2005-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4718 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0048/20060048893.pdf [firstpage_image] =>[orig_patent_app_number] => 11127865 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 583549 [patent_doc_number] => 07438783 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-21 [patent_title] => 'Plasma processing apparatus and plasma processing method' [patent_app_type] => utility [patent_app_number] => 11/116442 [patent_app_country] => US [patent_app_date] => 2005-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 18 [patent_no_of_words] => 6505 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/438/07438783.pdf [firstpage_image] =>[orig_patent_app_number] => 11116442 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 922907 [patent_doc_number] => 07318879 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-01-15 [patent_title] => 'Apparatus to manufacture semiconductor' [patent_app_type] => utility [patent_app_number] => 11/116224 [patent_app_country] => US [patent_app_date] => 2005-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2969 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/318/07318879.pdf [firstpage_image] =>[orig_patent_app_number] => 11116224 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6909307 [patent_doc_number] => 20050173065 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-08-11 [patent_title] => 'Method of manufacturing semiconductor device, plasma processing apparatus and plasma processing method' [patent_app_type] => utility [patent_app_number] => 11/101757 [patent_app_country] => US [patent_app_date] => 2005-04-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 9638 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0173/20050173065.pdf [firstpage_image] =>[orig_patent_app_number] => 11101757 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 5098608 [patent_doc_number] => 20070181868 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-08-09 [patent_title] => 'Silicon electrode plate for plasma etching with superior durability' [patent_app_type] => utility [patent_app_number] => 10/599440 [patent_app_country] => US [patent_app_date] => 2005-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3254 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0181/20070181868.pdf [firstpage_image] =>[orig_patent_app_number] => 10599440 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4559479 [patent_doc_number] => 07846293 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-12-07 [patent_title] => 'Plasma processing apparatus and method' [patent_app_type] => utility [patent_app_number] => 11/092911 [patent_app_country] => US [patent_app_date] => 2005-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 14 [patent_no_of_words] => 7250 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 298 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/846/07846293.pdf [firstpage_image] =>[orig_patent_app_number] => 11092911 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4906345 [patent_doc_number] => 20080017111 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-01-24 [patent_title] => 'Semiconductor Manufacturing Device and Method for Manufacturing Semiconductor Devices' [patent_app_type] => utility [patent_app_number] => 10/589490 [patent_app_country] => US [patent_app_date] => 2005-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4447 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0017/20080017111.pdf [firstpage_image] =>[orig_patent_app_number] => 10589490 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 5109603 [patent_doc_number] => 20070193518 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-08-23 [patent_title] => 'Plasma generator' [patent_app_type] => utility [patent_app_number] => 10/592286 [patent_app_country] => US [patent_app_date] => 2005-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 7474 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0193/20070193518.pdf [firstpage_image] =>[orig_patent_app_number] => 10592286 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7035913 [patent_doc_number] => 20050155711 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-07-21 [patent_title] => 'Plasma processing apparatus and method with controlled biasing functions' [patent_app_type] => utility [patent_app_number] => 11/053236 [patent_app_country] => US [patent_app_date] => 2005-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6153 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0155/20050155711.pdf [firstpage_image] =>[orig_patent_app_number] => 11053236 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7139044 [patent_doc_number] => 20050115677 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-06-02 [patent_title] => 'Plasma etching apparatus' [patent_app_type] => utility [patent_app_number] => 11/028239 [patent_app_country] => US [patent_app_date] => 2005-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 9524 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0115/20050115677.pdf [firstpage_image] =>[orig_patent_app_number] => 11028239 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 7231891 [patent_doc_number] => 20050139321 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-06-30 [patent_title] => 'Plasma processing apparatus' [patent_app_type] => utility [patent_app_number] => 11/024656 [patent_app_country] => US [patent_app_date] => 2004-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6105 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0139/20050139321.pdf [firstpage_image] =>[orig_patent_app_number] => 11024656 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6980391 [patent_doc_number] => 20050150459 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-07-14 [patent_title] => 'Full glass substrate deposition in plasma enhanced chemical vapor deposition' [patent_app_type] => utility [patent_app_number] => 11/010956 [patent_app_country] => US [patent_app_date] => 2004-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4687 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0150/20050150459.pdf [firstpage_image] =>[orig_patent_app_number] => 11010956 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6905755 [patent_doc_number] => 20050101150 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-05-12 [patent_title] => 'Methods of enhancing selectivity of etching silicon dioxide relative to one or more organic substances; and plasma reaction chambers' [patent_app_type] => utility [patent_app_number] => 11/009282 [patent_app_country] => US [patent_app_date] => 2004-12-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2585 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0101/20050101150.pdf [firstpage_image] =>[orig_patent_app_number] => 11009282 [rel_patent_id] =>[rel_patent_doc_number] =>)