
Anna M. Crowell
Examiner (ID: 9514, Phone: (571)272-1432 , Office: P/1716 )
| Most Active Art Unit | 1716 |
| Art Unit(s) | 1792, 1716, 1763 |
| Total Applications | 717 |
| Issued Applications | 299 |
| Pending Applications | 97 |
| Abandoned Applications | 338 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6815650
[patent_doc_number] => 20030066608
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-10
[patent_title] => 'Semiconductor processing apparatus and electrode member therefor'
[patent_app_type] => new
[patent_app_number] => 10/261465
[patent_app_country] => US
[patent_app_date] => 2002-10-02
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0066/20030066608.pdf
[firstpage_image] =>[orig_patent_app_number] => 10261465
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/261465 | Semiconductor processing apparatus and electrode member therefor | Oct 1, 2002 | Abandoned |
Array
(
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[patent_doc_number] => 07137353
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[patent_kind] => B2
[patent_issue_date] => 2006-11-21
[patent_title] => 'Method and apparatus for an improved deposition shield in a plasma processing system'
[patent_app_type] => utility
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[patent_app_date] => 2002-09-30
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/259353 | Method and apparatus for an improved deposition shield in a plasma processing system | Sep 29, 2002 | Issued |
Array
(
[id] => 7278284
[patent_doc_number] => 20040060661
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[patent_kind] => A1
[patent_issue_date] => 2004-04-01
[patent_title] => 'Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system'
[patent_app_type] => new
[patent_app_number] => 10/259858
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/259858 | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system | Sep 29, 2002 | Issued |
Array
(
[id] => 6815526
[patent_doc_number] => 20030066484
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[patent_kind] => A1
[patent_issue_date] => 2003-04-10
[patent_title] => 'Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode'
[patent_app_type] => new
[patent_app_number] => 10/253431
[patent_app_country] => US
[patent_app_date] => 2002-09-25
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/253431 | Electrode cover, plasma apparatus utilizing the cover, and method of fitting the cover onto the plasma electrode | Sep 24, 2002 | Abandoned |
Array
(
[id] => 6782722
[patent_doc_number] => 20030064169
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-03
[patent_title] => 'Plasma enhanced chemical vapor deposition apparatus and method of producing carbon nanotube using the same'
[patent_app_type] => new
[patent_app_number] => 10/252531
[patent_app_country] => US
[patent_app_date] => 2002-09-24
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/252531 | Plasma enhanced chemical vapor deposition apparatus and method of producing carbon nanotube using the same | Sep 23, 2002 | Abandoned |
Array
(
[id] => 6742659
[patent_doc_number] => 20030019842
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[patent_kind] => A1
[patent_issue_date] => 2003-01-30
[patent_title] => 'Plasma reaction chamber assemblies'
[patent_app_type] => new
[patent_app_number] => 10/247971
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[firstpage_image] =>[orig_patent_app_number] => 10247971
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/247971 | Plasma reaction chamber liner comprising ruthenium | Sep 19, 2002 | Issued |
Array
(
[id] => 898877
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[patent_issue_date] => 2008-03-04
[patent_title] => 'Plasma processing device'
[patent_app_type] => utility
[patent_app_number] => 10/490027
[patent_app_country] => US
[patent_app_date] => 2002-09-19
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/490027 | Plasma processing device | Sep 18, 2002 | Issued |
Array
(
[id] => 6745336
[patent_doc_number] => 20030022519
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[patent_issue_date] => 2003-01-30
[patent_title] => 'Production apparatus of semiconductor layer employing DC bias and VHF power'
[patent_app_type] => new
[patent_app_number] => 10/238789
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[patent_app_date] => 2002-09-11
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/238789 | Production apparatus of semiconductor layer employing DC bias and VHF power | Sep 10, 2002 | Abandoned |
Array
(
[id] => 6867145
[patent_doc_number] => 20030079834
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-01
[patent_title] => 'Shielding system for plasma chamber'
[patent_app_type] => new
[patent_app_number] => 10/232956
[patent_app_country] => US
[patent_app_date] => 2002-08-28
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[firstpage_image] =>[orig_patent_app_number] => 10232956
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/232956 | Shielding system for plasma chamber | Aug 27, 2002 | Issued |
Array
(
[id] => 6644267
[patent_doc_number] => 20030104141
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-05
[patent_title] => 'Dielectric barrier discharge process for depositing silicon nitride film on substrates'
[patent_app_type] => new
[patent_app_number] => 10/229309
[patent_app_country] => US
[patent_app_date] => 2002-08-27
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Array
(
[id] => 6867294
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[patent_title] => 'Multi-zone RF electrode for field/plasma uniformity control in capacitive plasma sources'
[patent_app_type] => new
[patent_app_number] => 10/227527
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/227527 | Multi-zone RF electrode for field/plasma uniformity control in capacitive plasma sources | Aug 25, 2002 | Abandoned |
Array
(
[id] => 6713131
[patent_doc_number] => 20030024478
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[patent_issue_date] => 2003-02-06
[patent_title] => 'Surface processing apparatus'
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Array
(
[id] => 6767621
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[patent_title] => 'Atmospheric pressure plasma processing reactor'
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Array
(
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Array
(
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Array
(
[id] => 1044848
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[patent_issue_date] => 2005-03-08
[patent_title] => 'Segmented electrode apparatus for plasma processing'
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Array
(
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Array
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/140618 | Apparatus and methods for minimizing arcing in a plasma processing chamber | May 5, 2002 | Issued |