
Anna M. Crowell
Examiner (ID: 9514, Phone: (571)272-1432 , Office: P/1716 )
| Most Active Art Unit | 1716 |
| Art Unit(s) | 1792, 1716, 1763 |
| Total Applications | 717 |
| Issued Applications | 299 |
| Pending Applications | 97 |
| Abandoned Applications | 338 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6409497
[patent_doc_number] => 20020182876
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-05
[patent_title] => 'Semiconductor device fabrication method and apparatus'
[patent_app_type] => new
[patent_app_number] => 10/131242
[patent_app_country] => US
[patent_app_date] => 2002-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6463
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0182/20020182876.pdf
[firstpage_image] =>[orig_patent_app_number] => 10131242
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/131242 | Semiconductor device fabrication method and apparatus | Apr 24, 2002 | Abandoned |
Array
(
[id] => 7131856
[patent_doc_number] => 20050178505
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-08-18
[patent_title] => 'Electrode for dry etching a wafer'
[patent_app_type] => utility
[patent_app_number] => 10/506558
[patent_app_country] => US
[patent_app_date] => 2002-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 3403
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[firstpage_image] =>[orig_patent_app_number] => 10506558
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/506558 | Electrode for dry etching a wafer | Apr 18, 2002 | Abandoned |
Array
(
[id] => 6808810
[patent_doc_number] => 20030198749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-23
[patent_title] => 'Coated silicon carbide cermet used in a plasma reactor'
[patent_app_type] => new
[patent_app_number] => 10/125135
[patent_app_country] => US
[patent_app_date] => 2002-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4451
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[pdf_file] => publications/A1/0198/20030198749.pdf
[firstpage_image] =>[orig_patent_app_number] => 10125135
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/125135 | Coated silicon carbide cermet used in a plasma reactor | Apr 16, 2002 | Abandoned |
Array
(
[id] => 1051406
[patent_doc_number] => 06857388
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-02-22
[patent_title] => 'Cold wall chemical vapor deposition apparatus with a heater control unit'
[patent_app_type] => utility
[patent_app_number] => 10/124252
[patent_app_country] => US
[patent_app_date] => 2002-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 4619
[patent_no_of_claims] => 5
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/857/06857388.pdf
[firstpage_image] =>[orig_patent_app_number] => 10124252
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/124252 | Cold wall chemical vapor deposition apparatus with a heater control unit | Apr 16, 2002 | Issued |
Array
(
[id] => 6543016
[patent_doc_number] => 20020110648
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-15
[patent_title] => 'Diamond film depositing apparatus and method thereof'
[patent_app_type] => new
[patent_app_number] => 10/122459
[patent_app_country] => US
[patent_app_date] => 2002-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 5990
[patent_no_of_claims] => 12
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[pdf_file] => publications/A1/0110/20020110648.pdf
[firstpage_image] =>[orig_patent_app_number] => 10122459
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/122459 | Diamond film depositing apparatus and method thereof | Apr 14, 2002 | Issued |
Array
(
[id] => 6685850
[patent_doc_number] => 20030029572
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-13
[patent_title] => 'Semiconductor wafer processing apparatus and method'
[patent_app_type] => new
[patent_app_number] => 10/109664
[patent_app_country] => US
[patent_app_date] => 2002-04-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[patent_no_of_words] => 5407
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[pdf_file] => publications/A1/0029/20030029572.pdf
[firstpage_image] =>[orig_patent_app_number] => 10109664
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/109664 | Semiconductor wafer processing apparatus and method | Mar 31, 2002 | Abandoned |
Array
(
[id] => 1019014
[patent_doc_number] => 06886491
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-05-03
[patent_title] => 'Plasma chemical vapor deposition apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/102108
[patent_app_country] => US
[patent_app_date] => 2002-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 18
[patent_no_of_words] => 10727
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 470
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/886/06886491.pdf
[firstpage_image] =>[orig_patent_app_number] => 10102108
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/102108 | Plasma chemical vapor deposition apparatus | Mar 18, 2002 | Issued |
| 10/098073 | Atmospheric pressure RF plasma source using ambient air and complex molecular gases | Mar 13, 2002 | Abandoned |
Array
(
[id] => 6763728
[patent_doc_number] => 20030098126
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-29
[patent_title] => 'Etching apparatus using neutral beam'
[patent_app_type] => new
[patent_app_number] => 10/086496
[patent_app_country] => US
[patent_app_date] => 2002-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 3857
[patent_no_of_claims] => 10
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0098/20030098126.pdf
[firstpage_image] =>[orig_patent_app_number] => 10086496
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/086496 | Etching apparatus using neutral beam | Feb 27, 2002 | Issued |
Array
(
[id] => 6666196
[patent_doc_number] => 20030111179
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-19
[patent_title] => 'Etcher for semiconductor manufacturing'
[patent_app_type] => new
[patent_app_number] => 10/081339
[patent_app_country] => US
[patent_app_date] => 2002-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 941
[patent_no_of_claims] => 10
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0111/20030111179.pdf
[firstpage_image] =>[orig_patent_app_number] => 10081339
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/081339 | Etcher for semiconductor manufacturing | Feb 21, 2002 | Abandoned |
Array
(
[id] => 6516166
[patent_doc_number] => 20020108712
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-15
[patent_title] => 'Apparatus for plasma processing'
[patent_app_type] => new
[patent_app_number] => 10/073430
[patent_app_country] => US
[patent_app_date] => 2002-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1911
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0108/20020108712.pdf
[firstpage_image] =>[orig_patent_app_number] => 10073430
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/073430 | Plasma processing apparatus | Feb 10, 2002 | Issued |
Array
(
[id] => 6361019
[patent_doc_number] => 20020117114
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-29
[patent_title] => 'Method and apparatus for modifying surface of container made of polymeric compound'
[patent_app_type] => new
[patent_app_number] => 10/062405
[patent_app_country] => US
[patent_app_date] => 2002-02-05
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0117/20020117114.pdf
[firstpage_image] =>[orig_patent_app_number] => 10062405
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/062405 | Method and apparatus for modifying surface of container made of polymeric compound | Feb 4, 2002 | Abandoned |
Array
(
[id] => 6016501
[patent_doc_number] => 20020102857
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Method and apparatus for etching a semiconductor article and method of preparing a semiconductor article by using the same'
[patent_app_type] => new
[patent_app_number] => 10/062520
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[firstpage_image] =>[orig_patent_app_number] => 10062520
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/062520 | Method and apparatus for etching a semiconductor article and method of preparing a semiconductor article by using the same | Feb 4, 2002 | Abandoned |
Array
(
[id] => 6204896
[patent_doc_number] => 20020069971
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-13
[patent_title] => 'Plasma processing apparatus and plasma processing method'
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[pdf_file] => publications/A1/0069/20020069971.pdf
[firstpage_image] =>[orig_patent_app_number] => 10052538
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/052538 | Plasma processing apparatus and plasma processing method | Jan 22, 2002 | Abandoned |
Array
(
[id] => 6011272
[patent_doc_number] => 20020100421
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Deposited film forming apparatus and deposited film forming method'
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[firstpage_image] =>[orig_patent_app_number] => 10046318
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/046318 | Deposited film forming apparatus | Jan 15, 2002 | Issued |
Array
(
[id] => 6298882
[patent_doc_number] => 20020092617
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-18
[patent_title] => 'Single wafer LPCVD apparatus'
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[pdf_file] => publications/A1/0092/20020092617.pdf
[firstpage_image] =>[orig_patent_app_number] => 10046943
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/046943 | Single wafer LPCVD apparatus | Jan 13, 2002 | Issued |
Array
(
[id] => 1244817
[patent_doc_number] => 06676803
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-01-13
[patent_title] => 'Semiconductor device fabricating equipment using radio frequency energy'
[patent_app_type] => B2
[patent_app_number] => 10/036455
[patent_app_country] => US
[patent_app_date] => 2002-01-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/676/06676803.pdf
[firstpage_image] =>[orig_patent_app_number] => 10036455
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/036455 | Semiconductor device fabricating equipment using radio frequency energy | Jan 6, 2002 | Issued |
Array
(
[id] => 6685845
[patent_doc_number] => 20030029567
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-02-13
[patent_title] => 'Dual frequency plasma processor'
[patent_app_type] => new
[patent_app_number] => 10/032279
[patent_app_country] => US
[patent_app_date] => 2001-12-31
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0029/20030029567.pdf
[firstpage_image] =>[orig_patent_app_number] => 10032279
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/032279 | Plasma processor in plasma confinement region within a vacuum chamber | Dec 30, 2001 | Issued |
Array
(
[id] => 6550901
[patent_doc_number] => 20020083897
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-04
[patent_title] => 'Full glass substrate deposition in plasma enhanced chemical vapor deposition'
[patent_app_type] => new
[patent_app_number] => 10/024985
[patent_app_country] => US
[patent_app_date] => 2001-12-18
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[pdf_file] => publications/A1/0083/20020083897.pdf
[firstpage_image] =>[orig_patent_app_number] => 10024985
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/024985 | Full glass substrate deposition in plasma enhanced chemical vapor deposition | Dec 17, 2001 | Abandoned |
Array
(
[id] => 6616943
[patent_doc_number] => 20030101935
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-05
[patent_title] => 'Dose uniformity control for plasma doping systems'
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[firstpage_image] =>[orig_patent_app_number] => 10006462
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/006462 | Dose uniformity control for plasma doping systems | Dec 3, 2001 | Abandoned |