| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_doc_number] => 06860964
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[patent_kind] => B2
[patent_issue_date] => 2005-03-01
[patent_title] => 'Etch/strip apparatus integrated with cleaning equipment'
[patent_app_type] => utility
[patent_app_number] => 09/740830
[patent_app_country] => US
[patent_app_date] => 2000-12-21
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[firstpage_image] =>[orig_patent_app_number] => 09740830
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Array
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[patent_doc_number] => 20010054484
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-12-27
[patent_title] => 'Plasma processor, cluster tool, and method of controlling plasma'
[patent_app_type] => new
[patent_app_number] => 09/739623
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[patent_app_date] => 2000-12-20
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[firstpage_image] =>[orig_patent_app_number] => 09739623
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/739623 | Plasma processor, cluster tool, and method of controlling plasma | Dec 19, 2000 | Abandoned |
Array
(
[id] => 6997840
[patent_doc_number] => 20010052319
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-12-20
[patent_title] => 'Plasma processing apparatus and plasma processing method'
[patent_app_type] => new
[patent_app_number] => 09/737484
[patent_app_country] => US
[patent_app_date] => 2000-12-18
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[firstpage_image] =>[orig_patent_app_number] => 09737484
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/737484 | Plasma processing apparatus and plasma processing method | Dec 17, 2000 | Abandoned |
Array
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[patent_doc_number] => 20020069966
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-13
[patent_title] => 'Scanning plasma reactor'
[patent_app_type] => new
[patent_app_number] => 09/736073
[patent_app_country] => US
[patent_app_date] => 2000-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[firstpage_image] =>[orig_patent_app_number] => 09736073
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Array
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[id] => 6892978
[patent_doc_number] => 20010015344
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[patent_kind] => A1
[patent_issue_date] => 2001-08-23
[patent_title] => 'Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD'
[patent_app_type] => new
[patent_app_number] => 09/733122
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[pdf_file] => publications/A1/0015/20010015344.pdf
[firstpage_image] =>[orig_patent_app_number] => 09733122
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/733122 | Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD | Dec 7, 2000 | Issued |
Array
(
[id] => 1079458
[patent_doc_number] => 06834613
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-12-28
[patent_title] => 'Plasma-resistant member and plasma treatment apparatus using the same'
[patent_app_type] => B1
[patent_app_number] => 09/719010
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[firstpage_image] =>[orig_patent_app_number] => 09719010
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/719010 | Plasma-resistant member and plasma treatment apparatus using the same | Dec 6, 2000 | Issued |
Array
(
[id] => 7640782
[patent_doc_number] => 06395129
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-28
[patent_title] => 'Process to decapsulate a FBGA package'
[patent_app_type] => B1
[patent_app_number] => 09/722232
[patent_app_country] => US
[patent_app_date] => 2000-11-27
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/395/06395129.pdf
[firstpage_image] =>[orig_patent_app_number] => 09722232
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/722232 | Process to decapsulate a FBGA package | Nov 26, 2000 | Issued |
Array
(
[id] => 1390151
[patent_doc_number] => 06531031
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-11
[patent_title] => 'Plasma etching installation'
[patent_app_type] => B1
[patent_app_number] => 09/623734
[patent_app_country] => US
[patent_app_date] => 2000-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/531/06531031.pdf
[firstpage_image] =>[orig_patent_app_number] => 09623734
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/623734 | Plasma etching installation | Nov 21, 2000 | Issued |
Array
(
[id] => 1515804
[patent_doc_number] => 06500265
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-31
[patent_title] => 'Apparatus for electrostatically maintaining subtrate flatness'
[patent_app_type] => B1
[patent_app_number] => 09/714023
[patent_app_country] => US
[patent_app_date] => 2000-11-15
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[firstpage_image] =>[orig_patent_app_number] => 09714023
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/714023 | Apparatus for electrostatically maintaining subtrate flatness | Nov 14, 2000 | Issued |
Array
(
[id] => 1294186
[patent_doc_number] => 06626998
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-30
[patent_title] => 'Plasma generator assembly for use in CVD and PECVD processes'
[patent_app_type] => B1
[patent_app_number] => 09/709228
[patent_app_country] => US
[patent_app_date] => 2000-11-08
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09709228
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/709228 | Plasma generator assembly for use in CVD and PECVD processes | Nov 7, 2000 | Issued |
| 09/704887 | Etching of high aspect ratio features in a substrate | Oct 31, 2000 | Abandoned |
| 09/705254 | Etching of high aspect ratio features in a substrate | Oct 31, 2000 | Abandoned |
| 09/697083 | Plasma etching apparatus | Oct 26, 2000 | Abandoned |
| 09/684425 | Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating | Oct 9, 2000 | Abandoned |
Array
(
[id] => 1407506
[patent_doc_number] => 06521079
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-18
[patent_title] => 'Linear CMP tool design with closed loop slurry distribution'
[patent_app_type] => B1
[patent_app_number] => 09/679525
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[firstpage_image] =>[orig_patent_app_number] => 09679525
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/679525 | Linear CMP tool design with closed loop slurry distribution | Oct 5, 2000 | Issued |
Array
(
[id] => 1530702
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[patent_kind] => B1
[patent_issue_date] => 2002-06-25
[patent_title] => 'Automatic decapsulation system utilizing an acid resistant, high heat endurance and flexible sheet coupled to a rubber gasket and a method of use'
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Array
(
[id] => 1085309
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Array
(
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[patent_issue_date] => 2002-07-16
[patent_title] => 'Endpoint detection by chemical reaction'
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[patent_app_number] => 09/678633
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Array
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[patent_title] => 'Plasma reactor with a tri-magnet plasma confinement apparatus'
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Array
(
[id] => 1012268
[patent_doc_number] => 06896737
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[patent_issue_date] => 2005-05-24
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