| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 14505349
[patent_doc_number] => 20190196329
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-06-27
[patent_title] => RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/225332
[patent_app_country] => US
[patent_app_date] => 2018-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 35578
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -3
[patent_words_short_claim] => 123
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16225332
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/225332 | Resist composition and method of forming resist pattern | Dec 18, 2018 | Issued |
Array
(
[id] => 14538237
[patent_doc_number] => 20190204740
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-04
[patent_title] => PHOTOSENSITIVE COMPOSITE MATERIAL AND METHOD FOR FORMING COMPOSITE FILM USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/226147
[patent_app_country] => US
[patent_app_date] => 2018-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4014
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 145
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16226147
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/226147 | Photosensitive composite material and method for forming composite film using the same | Dec 18, 2018 | Issued |
Array
(
[id] => 16894584
[patent_doc_number] => 11036132
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-06-15
[patent_title] => Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
[patent_app_type] => utility
[patent_app_number] => 16/225873
[patent_app_country] => US
[patent_app_date] => 2018-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 31594
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 237
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16225873
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/225873 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | Dec 18, 2018 | Issued |
Array
(
[id] => 16844302
[patent_doc_number] => 11016385
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-05-25
[patent_title] => Photosensitive adhesive composition, photosensitive conductive adhesive composition, and electronic device containing photosensitive conductive adhesive composition
[patent_app_type] => utility
[patent_app_number] => 16/224812
[patent_app_country] => US
[patent_app_date] => 2018-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 5702
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16224812
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/224812 | Photosensitive adhesive composition, photosensitive conductive adhesive composition, and electronic device containing photosensitive conductive adhesive composition | Dec 18, 2018 | Issued |
Array
(
[id] => 14538235
[patent_doc_number] => 20190204739
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-04
[patent_title] => RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
[patent_app_type] => utility
[patent_app_number] => 16/225290
[patent_app_country] => US
[patent_app_date] => 2018-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 31562
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -8
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16225290
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/225290 | Resist composition, method of forming resist pattern, and compound | Dec 18, 2018 | Issued |
Array
(
[id] => 14538241
[patent_doc_number] => 20190204742
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-04
[patent_title] => PATTERN FORMATION METHODS
[patent_app_type] => utility
[patent_app_number] => 16/225551
[patent_app_country] => US
[patent_app_date] => 2018-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10873
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 175
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16225551
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/225551 | Pattern formation methods | Dec 18, 2018 | Issued |
Array
(
[id] => 14538233
[patent_doc_number] => 20190204738
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-07-04
[patent_title] => RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/222758
[patent_app_country] => US
[patent_app_date] => 2018-12-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 32326
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -5
[patent_words_short_claim] => 154
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16222758
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/222758 | Resist composition and method of forming resist pattern | Dec 16, 2018 | Issued |
Array
(
[id] => 16392767
[patent_doc_number] => 20200333708
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-10-22
[patent_title] => NEGATIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME
[patent_app_type] => utility
[patent_app_number] => 16/767250
[patent_app_country] => US
[patent_app_date] => 2018-11-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7182
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 337
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16767250
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/767250 | Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same | Nov 25, 2018 | Issued |
Array
(
[id] => 18044790
[patent_doc_number] => 11518731
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-12-06
[patent_title] => Fluorine-containing compound, substrate for patterning, photodegradable coupling agent, patterning method, and compound
[patent_app_type] => utility
[patent_app_number] => 16/193526
[patent_app_country] => US
[patent_app_date] => 2018-11-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 9127
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 185
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16193526
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/193526 | Fluorine-containing compound, substrate for patterning, photodegradable coupling agent, patterning method, and compound | Nov 15, 2018 | Issued |
Array
(
[id] => 15966181
[patent_doc_number] => 20200166842
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-28
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM
[patent_app_type] => utility
[patent_app_number] => 16/631985
[patent_app_country] => US
[patent_app_date] => 2018-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7965
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 165
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16631985
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/631985 | Photosensitive resin composition and cured film | Nov 8, 2018 | Issued |
Array
(
[id] => 15835687
[patent_doc_number] => 20200133126
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-04-30
[patent_title] => COATING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY PROCESS
[patent_app_type] => utility
[patent_app_number] => 16/176245
[patent_app_country] => US
[patent_app_date] => 2018-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7766
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -10
[patent_words_short_claim] => 282
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16176245
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/176245 | Coating composition for forming resist underlayer film for EUV lithography process | Oct 30, 2018 | Issued |
Array
(
[id] => 14378289
[patent_doc_number] => 20190163057
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-05-30
[patent_title] => RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND
[patent_app_type] => utility
[patent_app_number] => 16/173326
[patent_app_country] => US
[patent_app_date] => 2018-10-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38386
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -4
[patent_words_short_claim] => 157
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16173326
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/173326 | Resist composition, method of forming resist pattern, polymeric compound, and compound | Oct 28, 2018 | Issued |
Array
(
[id] => 16918172
[patent_doc_number] => 20210191264
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-06-24
[patent_title] => NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND ORGANIC EL DISPLAY AND MANUFACTURING METHOD THEREFOR
[patent_app_type] => utility
[patent_app_number] => 16/759140
[patent_app_country] => US
[patent_app_date] => 2018-10-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 69217
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -23
[patent_words_short_claim] => 482
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16759140
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/759140 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND ORGANIC EL DISPLAY AND MANUFACTURING METHOD THEREFOR | Oct 25, 2018 | Abandoned |
Array
(
[id] => 19122184
[patent_doc_number] => 11966164
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-04-23
[patent_title] => Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group
[patent_app_type] => utility
[patent_app_number] => 16/759142
[patent_app_country] => US
[patent_app_date] => 2018-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 18024
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 473
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16759142
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/759142 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | Oct 23, 2018 | Issued |
Array
(
[id] => 17194481
[patent_doc_number] => 11163232
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-02
[patent_title] => Resist composition, patterning process, and barium salt
[patent_app_type] => utility
[patent_app_number] => 16/161459
[patent_app_country] => US
[patent_app_date] => 2018-10-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11106
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 133
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16161459
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/161459 | Resist composition, patterning process, and barium salt | Oct 15, 2018 | Issued |
Array
(
[id] => 16864141
[patent_doc_number] => 11022880
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-06-01
[patent_title] => Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
[patent_app_type] => utility
[patent_app_number] => 16/160297
[patent_app_country] => US
[patent_app_date] => 2018-10-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 31821
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 154
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16160297
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/160297 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | Oct 14, 2018 | Issued |
Array
(
[id] => 15772141
[patent_doc_number] => 20200117088
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-04-16
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
[patent_app_type] => utility
[patent_app_number] => 16/160024
[patent_app_country] => US
[patent_app_date] => 2018-10-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8635
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16160024
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/160024 | Photosensitive resin composition and cured film prepared therefrom | Oct 14, 2018 | Issued |
Array
(
[id] => 13901933
[patent_doc_number] => 20190040171
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-02-07
[patent_title] => PHOTORESIST POLYMERS, METHODS OF FORMING PATTERNS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
[patent_app_type] => utility
[patent_app_number] => 16/156264
[patent_app_country] => US
[patent_app_date] => 2018-10-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12427
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16156264
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/156264 | Photoresist polymers, methods of forming patterns and methods of manufacturing semiconductor devices | Oct 9, 2018 | Issued |
Array
(
[id] => 18780526
[patent_doc_number] => 11822246
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-11-21
[patent_title] => Relief precursor having low cupping and fluting
[patent_app_type] => utility
[patent_app_number] => 16/754572
[patent_app_country] => US
[patent_app_date] => 2018-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13522
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16754572
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/754572 | Relief precursor having low cupping and fluting | Oct 4, 2018 | Issued |
Array
(
[id] => 16285007
[patent_doc_number] => 20200278609
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-09-03
[patent_title] => PHOTOSENSITIVE CONDUCTIVE PASTE AND FILM FOR FORMING CONDUCTIVE PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/647763
[patent_app_country] => US
[patent_app_date] => 2018-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12512
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -7
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16647763
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/647763 | PHOTOSENSITIVE CONDUCTIVE PASTE AND FILM FOR FORMING CONDUCTIVE PATTERN | Oct 4, 2018 | Abandoned |