| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 14060941
[patent_doc_number] => 10234762
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-03-19
[patent_title] => Pattern-forming method
[patent_app_type] => utility
[patent_app_number] => 15/267840
[patent_app_country] => US
[patent_app_date] => 2016-09-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7379
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 209
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15267840
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/267840 | Pattern-forming method | Sep 15, 2016 | Issued |
Array
(
[id] => 12917665
[patent_doc_number] => 20180197731
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-07-12
[patent_title] => RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH) ACRYLOXY GROUP-CONTAINING POLYSILOXANE
[patent_app_type] => utility
[patent_app_number] => 15/759313
[patent_app_country] => US
[patent_app_date] => 2016-09-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12792
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -11
[patent_words_short_claim] => 42
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759313
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/759313 | RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH) ACRYLOXY GROUP-CONTAINING POLYSILOXANE | Sep 8, 2016 | Abandoned |
Array
(
[id] => 17394456
[patent_doc_number] => 11243467
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-02-08
[patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
[patent_app_type] => utility
[patent_app_number] => 15/759076
[patent_app_country] => US
[patent_app_date] => 2016-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38512
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/759076 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Sep 7, 2016 | Issued |
Array
(
[id] => 17394456
[patent_doc_number] => 11243467
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-02-08
[patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
[patent_app_type] => utility
[patent_app_number] => 15/759076
[patent_app_country] => US
[patent_app_date] => 2016-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38512
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/759076 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Sep 7, 2016 | Issued |
Array
(
[id] => 17394456
[patent_doc_number] => 11243467
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-02-08
[patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
[patent_app_type] => utility
[patent_app_number] => 15/759076
[patent_app_country] => US
[patent_app_date] => 2016-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38512
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/759076 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Sep 7, 2016 | Issued |
Array
(
[id] => 13211831
[patent_doc_number] => 10120282
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-11-06
[patent_title] => Chemically amplified resist material and resist pattern-forming method
[patent_app_type] => utility
[patent_app_number] => 15/259200
[patent_app_country] => US
[patent_app_date] => 2016-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 26404
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 254
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15259200
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/259200 | Chemically amplified resist material and resist pattern-forming method | Sep 7, 2016 | Issued |
Array
(
[id] => 17394456
[patent_doc_number] => 11243467
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-02-08
[patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
[patent_app_type] => utility
[patent_app_number] => 15/759076
[patent_app_country] => US
[patent_app_date] => 2016-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38512
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 114
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/759076 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Sep 7, 2016 | Issued |
Array
(
[id] => 11501033
[patent_doc_number] => 20170075218
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-03-16
[patent_title] => 'RESIST COMPOSITION AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 15/254170
[patent_app_country] => US
[patent_app_date] => 2016-09-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11383
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15254170
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/254170 | RESIST COMPOSITION AND PATTERNING PROCESS | Aug 31, 2016 | Abandoned |
Array
(
[id] => 12221184
[patent_doc_number] => 20180059545
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-03-01
[patent_title] => 'MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS'
[patent_app_type] => utility
[patent_app_number] => 15/253845
[patent_app_country] => US
[patent_app_date] => 2016-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9745
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15253845
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/253845 | Monomers, polymers and photoresist compositions | Aug 30, 2016 | Issued |
Array
(
[id] => 12221182
[patent_doc_number] => 20180059542
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-03-01
[patent_title] => 'PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE'
[patent_app_type] => utility
[patent_app_number] => 15/252522
[patent_app_country] => US
[patent_app_date] => 2016-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6374
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15252522
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/252522 | Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image | Aug 30, 2016 | Issued |
Array
(
[id] => 13225751
[patent_doc_number] => 10126647
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-11-13
[patent_title] => Resist composition and patterning process
[patent_app_type] => utility
[patent_app_number] => 15/251445
[patent_app_country] => US
[patent_app_date] => 2016-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10236
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 258
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15251445
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/251445 | Resist composition and patterning process | Aug 29, 2016 | Issued |
Array
(
[id] => 13054397
[patent_doc_number] => 10048584
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-08-14
[patent_title] => Thinner composition
[patent_app_type] => utility
[patent_app_number] => 15/251003
[patent_app_country] => US
[patent_app_date] => 2016-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 5659
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 58
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15251003
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/251003 | Thinner composition | Aug 29, 2016 | Issued |
Array
(
[id] => 13389733
[patent_doc_number] => 20180246409
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-08-30
[patent_title] => MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD THEREOF, AND RESIST PATTERN FORMING METHOD
[patent_app_type] => utility
[patent_app_number] => 15/756463
[patent_app_country] => US
[patent_app_date] => 2016-08-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17626
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -12
[patent_words_short_claim] => 223
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15756463
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/756463 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | Aug 24, 2016 | Issued |
Array
(
[id] => 13905091
[patent_doc_number] => 20190041750
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-02-07
[patent_title] => MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD THEREOF, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD
[patent_app_type] => utility
[patent_app_number] => 15/755972
[patent_app_country] => US
[patent_app_date] => 2016-08-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 24450
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 218
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15755972
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/755972 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | Aug 24, 2016 | Issued |
Array
(
[id] => 14021713
[patent_doc_number] => 20190072850
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-03-07
[patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE
[patent_app_type] => utility
[patent_app_number] => 15/741603
[patent_app_country] => US
[patent_app_date] => 2016-08-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11756
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -22
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15741603
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/741603 | Photosensitive resin composition, polyimide production method, and semiconductor device | Aug 17, 2016 | Issued |
Array
(
[id] => 12185348
[patent_doc_number] => 20180044284
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-02-15
[patent_title] => 'NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS'
[patent_app_type] => utility
[patent_app_number] => 15/235342
[patent_app_country] => US
[patent_app_date] => 2016-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
[patent_figures_cnt] => 27
[patent_no_of_words] => 19625
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15235342
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/235342 | Non-ionic low diffusing photo-acid generators | Aug 11, 2016 | Issued |
Array
(
[id] => 12346983
[patent_doc_number] => 09951164
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-04-24
[patent_title] => Non-ionic aryl ketone based polymeric photo-acid generators
[patent_app_type] => utility
[patent_app_number] => 15/235673
[patent_app_country] => US
[patent_app_date] => 2016-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 8
[patent_no_of_words] => 20555
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15235673
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/235673 | Non-ionic aryl ketone based polymeric photo-acid generators | Aug 11, 2016 | Issued |
Array
(
[id] => 12187142
[patent_doc_number] => 20180046077
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-02-15
[patent_title] => 'FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS'
[patent_app_type] => utility
[patent_app_number] => 15/235410
[patent_app_country] => US
[patent_app_date] => 2016-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 16732
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15235410
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/235410 | Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators | Aug 11, 2016 | Issued |
Array
(
[id] => 13016611
[patent_doc_number] => 10031420
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-07-24
[patent_title] => Wet-strippable silicon-containing antireflectant
[patent_app_type] => utility
[patent_app_number] => 15/234124
[patent_app_country] => US
[patent_app_date] => 2016-08-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10562
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15234124
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/234124 | Wet-strippable silicon-containing antireflectant | Aug 10, 2016 | Issued |
Array
(
[id] => 11313503
[patent_doc_number] => 20160349613
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2016-12-01
[patent_title] => 'ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE'
[patent_app_type] => utility
[patent_app_number] => 15/231918
[patent_app_country] => US
[patent_app_date] => 2016-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 33783
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15231918
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/231918 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | Aug 8, 2016 | Abandoned |