Search

Aurel Prifti

Examiner (ID: 10223, Phone: (571)270-1743 , Office: P/2115 )

Most Active Art Unit
2186
Art Unit(s)
2175, 2186, 2116, 2115
Total Applications
683
Issued Applications
550
Pending Applications
51
Abandoned Applications
105

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 14060941 [patent_doc_number] => 10234762 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2019-03-19 [patent_title] => Pattern-forming method [patent_app_type] => utility [patent_app_number] => 15/267840 [patent_app_country] => US [patent_app_date] => 2016-09-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7379 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15267840 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/267840
Pattern-forming method Sep 15, 2016 Issued
Array ( [id] => 12917665 [patent_doc_number] => 20180197731 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-07-12 [patent_title] => RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH) ACRYLOXY GROUP-CONTAINING POLYSILOXANE [patent_app_type] => utility [patent_app_number] => 15/759313 [patent_app_country] => US [patent_app_date] => 2016-09-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12792 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -11 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759313 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/759313
RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH) ACRYLOXY GROUP-CONTAINING POLYSILOXANE Sep 8, 2016 Abandoned
Array ( [id] => 17394456 [patent_doc_number] => 11243467 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-02-08 [patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method [patent_app_type] => utility [patent_app_number] => 15/759076 [patent_app_country] => US [patent_app_date] => 2016-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38512 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/759076
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method Sep 7, 2016 Issued
Array ( [id] => 17394456 [patent_doc_number] => 11243467 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-02-08 [patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method [patent_app_type] => utility [patent_app_number] => 15/759076 [patent_app_country] => US [patent_app_date] => 2016-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38512 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/759076
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method Sep 7, 2016 Issued
Array ( [id] => 17394456 [patent_doc_number] => 11243467 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-02-08 [patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method [patent_app_type] => utility [patent_app_number] => 15/759076 [patent_app_country] => US [patent_app_date] => 2016-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38512 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/759076
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method Sep 7, 2016 Issued
Array ( [id] => 13211831 [patent_doc_number] => 10120282 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-11-06 [patent_title] => Chemically amplified resist material and resist pattern-forming method [patent_app_type] => utility [patent_app_number] => 15/259200 [patent_app_country] => US [patent_app_date] => 2016-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 26404 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 254 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15259200 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/259200
Chemically amplified resist material and resist pattern-forming method Sep 7, 2016 Issued
Array ( [id] => 17394456 [patent_doc_number] => 11243467 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-02-08 [patent_title] => Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method [patent_app_type] => utility [patent_app_number] => 15/759076 [patent_app_country] => US [patent_app_date] => 2016-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 38512 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15759076 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/759076
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method Sep 7, 2016 Issued
Array ( [id] => 11501033 [patent_doc_number] => 20170075218 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-03-16 [patent_title] => 'RESIST COMPOSITION AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 15/254170 [patent_app_country] => US [patent_app_date] => 2016-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11383 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15254170 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/254170
RESIST COMPOSITION AND PATTERNING PROCESS Aug 31, 2016 Abandoned
Array ( [id] => 12221184 [patent_doc_number] => 20180059545 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-03-01 [patent_title] => 'MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS' [patent_app_type] => utility [patent_app_number] => 15/253845 [patent_app_country] => US [patent_app_date] => 2016-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9745 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15253845 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/253845
Monomers, polymers and photoresist compositions Aug 30, 2016 Issued
Array ( [id] => 12221182 [patent_doc_number] => 20180059542 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-03-01 [patent_title] => 'PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE' [patent_app_type] => utility [patent_app_number] => 15/252522 [patent_app_country] => US [patent_app_date] => 2016-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 6374 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15252522 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/252522
Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image Aug 30, 2016 Issued
Array ( [id] => 13225751 [patent_doc_number] => 10126647 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-11-13 [patent_title] => Resist composition and patterning process [patent_app_type] => utility [patent_app_number] => 15/251445 [patent_app_country] => US [patent_app_date] => 2016-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10236 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 258 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15251445 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/251445
Resist composition and patterning process Aug 29, 2016 Issued
Array ( [id] => 13054397 [patent_doc_number] => 10048584 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-08-14 [patent_title] => Thinner composition [patent_app_type] => utility [patent_app_number] => 15/251003 [patent_app_country] => US [patent_app_date] => 2016-08-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 5659 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 58 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15251003 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/251003
Thinner composition Aug 29, 2016 Issued
Array ( [id] => 13389733 [patent_doc_number] => 20180246409 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-08-30 [patent_title] => MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD THEREOF, AND RESIST PATTERN FORMING METHOD [patent_app_type] => utility [patent_app_number] => 15/756463 [patent_app_country] => US [patent_app_date] => 2016-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17626 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -12 [patent_words_short_claim] => 223 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15756463 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/756463
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method Aug 24, 2016 Issued
Array ( [id] => 13905091 [patent_doc_number] => 20190041750 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-02-07 [patent_title] => MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD THEREOF, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD [patent_app_type] => utility [patent_app_number] => 15/755972 [patent_app_country] => US [patent_app_date] => 2016-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 24450 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 218 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15755972 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/755972
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method Aug 24, 2016 Issued
Array ( [id] => 14021713 [patent_doc_number] => 20190072850 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-03-07 [patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE [patent_app_type] => utility [patent_app_number] => 15/741603 [patent_app_country] => US [patent_app_date] => 2016-08-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11756 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -22 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15741603 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/741603
Photosensitive resin composition, polyimide production method, and semiconductor device Aug 17, 2016 Issued
Array ( [id] => 12185348 [patent_doc_number] => 20180044284 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-02-15 [patent_title] => 'NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS' [patent_app_type] => utility [patent_app_number] => 15/235342 [patent_app_country] => US [patent_app_date] => 2016-08-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 27 [patent_no_of_words] => 19625 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15235342 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/235342
Non-ionic low diffusing photo-acid generators Aug 11, 2016 Issued
Array ( [id] => 12346983 [patent_doc_number] => 09951164 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-04-24 [patent_title] => Non-ionic aryl ketone based polymeric photo-acid generators [patent_app_type] => utility [patent_app_number] => 15/235673 [patent_app_country] => US [patent_app_date] => 2016-08-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 20555 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15235673 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/235673
Non-ionic aryl ketone based polymeric photo-acid generators Aug 11, 2016 Issued
Array ( [id] => 12187142 [patent_doc_number] => 20180046077 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-02-15 [patent_title] => 'FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS' [patent_app_type] => utility [patent_app_number] => 15/235410 [patent_app_country] => US [patent_app_date] => 2016-08-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 16732 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15235410 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/235410
Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators Aug 11, 2016 Issued
Array ( [id] => 13016611 [patent_doc_number] => 10031420 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-07-24 [patent_title] => Wet-strippable silicon-containing antireflectant [patent_app_type] => utility [patent_app_number] => 15/234124 [patent_app_country] => US [patent_app_date] => 2016-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10562 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15234124 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/234124
Wet-strippable silicon-containing antireflectant Aug 10, 2016 Issued
Array ( [id] => 11313503 [patent_doc_number] => 20160349613 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-12-01 [patent_title] => 'ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE' [patent_app_type] => utility [patent_app_number] => 15/231918 [patent_app_country] => US [patent_app_date] => 2016-08-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 33783 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15231918 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/231918
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE Aug 8, 2016 Abandoned
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