Search

Aurel Prifti

Examiner (ID: 10223, Phone: (571)270-1743 , Office: P/2115 )

Most Active Art Unit
2186
Art Unit(s)
2175, 2186, 2116, 2115
Total Applications
683
Issued Applications
550
Pending Applications
51
Abandoned Applications
105

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 12185334 [patent_doc_number] => 20180044270 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-02-15 [patent_title] => 'COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN' [patent_app_type] => utility [patent_app_number] => 15/556121 [patent_app_country] => US [patent_app_date] => 2016-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20646 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15556121 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/556121
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN Mar 1, 2016 Abandoned
Array ( [id] => 13466129 [patent_doc_number] => 20180284607 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-10-04 [patent_title] => RADIATION-SENSITIVE COMPOSITION [patent_app_type] => utility [patent_app_number] => 15/562389 [patent_app_country] => US [patent_app_date] => 2016-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16923 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -10 [patent_words_short_claim] => 210 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15562389 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/562389
RADIATION-SENSITIVE COMPOSITION Mar 1, 2016 Abandoned
Array ( [id] => 12241539 [patent_doc_number] => 20180074402 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-03-15 [patent_title] => 'RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN' [patent_app_type] => utility [patent_app_number] => 15/560458 [patent_app_country] => US [patent_app_date] => 2016-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 29744 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15560458 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/560458
Resist composition, method for forming resist pattern, and polyphenol compound used therein Mar 1, 2016 Issued
Array ( [id] => 16144711 [patent_doc_number] => 10705425 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2020-07-07 [patent_title] => Photosensitive resin composition, photosensitive, sheet, semiconductor device and method for manufacturing semiconductor device [patent_app_type] => utility [patent_app_number] => 15/559632 [patent_app_country] => US [patent_app_date] => 2016-02-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10009 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15559632 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/559632
Photosensitive resin composition, photosensitive, sheet, semiconductor device and method for manufacturing semiconductor device Feb 28, 2016 Issued
Array ( [id] => 18780531 [patent_doc_number] => 11822251 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-11-21 [patent_title] => Photoresist with polar-acid-labile-group [patent_app_type] => utility [patent_app_number] => 15/019836 [patent_app_country] => US [patent_app_date] => 2016-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 4231 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 198 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15019836 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/019836
Photoresist with polar-acid-labile-group Feb 8, 2016 Issued
Array ( [id] => 14641633 [patent_doc_number] => 10365559 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2019-07-30 [patent_title] => Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device [patent_app_type] => utility [patent_app_number] => 15/551078 [patent_app_country] => US [patent_app_date] => 2016-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 13187 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15551078 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/551078
Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device Feb 8, 2016 Issued
Array ( [id] => 10806483 [patent_doc_number] => 20160152642 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-06-02 [patent_title] => 'FLOURINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERNING, PHOTODEGRADABLE COUPLING AGENT, PATTERNING METHOD, AND COMPOUND' [patent_app_type] => utility [patent_app_number] => 15/013193 [patent_app_country] => US [patent_app_date] => 2016-02-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 10491 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15013193 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/013193
FLOURINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERNING, PHOTODEGRADABLE COUPLING AGENT, PATTERNING METHOD, AND COMPOUND Feb 1, 2016 Abandoned
Array ( [id] => 14981435 [patent_doc_number] => 10444627 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2019-10-15 [patent_title] => Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device [patent_app_type] => utility [patent_app_number] => 15/011813 [patent_app_country] => US [patent_app_date] => 2016-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 34630 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 329 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15011813 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/011813
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device Jan 31, 2016 Issued
Array ( [id] => 16446379 [patent_doc_number] => 10838303 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2020-11-17 [patent_title] => Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton [patent_app_type] => utility [patent_app_number] => 15/542605 [patent_app_country] => US [patent_app_date] => 2016-01-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15935 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 244 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15542605 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/542605
Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton Jan 24, 2016 Issued
Array ( [id] => 17605493 [patent_doc_number] => 11333976 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2022-05-17 [patent_title] => Resin, photosensitive resin composition, electronic component and display device using the same [patent_app_type] => utility [patent_app_number] => 15/545912 [patent_app_country] => US [patent_app_date] => 2016-01-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 7 [patent_no_of_words] => 31203 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 520 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15545912 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/545912
Resin, photosensitive resin composition, electronic component and display device using the same Jan 24, 2016 Issued
Array ( [id] => 12241540 [patent_doc_number] => 20180074403 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-03-15 [patent_title] => 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNED CURED FILM PRODUCTION METHOD, PATTERNED CURED FILM, AND ELECTRONIC COMPONENT' [patent_app_type] => utility [patent_app_number] => 15/545751 [patent_app_country] => US [patent_app_date] => 2016-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 10100 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15545751 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/545751
Positive photosensitive resin composition, patterned cured film production method, patterned cured film, and electronic component Jan 21, 2016 Issued
Array ( [id] => 10778148 [patent_doc_number] => 20160124304 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-05-05 [patent_title] => 'PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME' [patent_app_type] => utility [patent_app_number] => 14/992692 [patent_app_country] => US [patent_app_date] => 2016-01-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5334 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14992692 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/992692
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME Jan 10, 2016 Abandoned
Array ( [id] => 11463786 [patent_doc_number] => 09580402 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-02-28 [patent_title] => 'Salt, acid generator, photoresist composition, and method for producing photoresist pattern' [patent_app_type] => utility [patent_app_number] => 14/988156 [patent_app_country] => US [patent_app_date] => 2016-01-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 29130 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14988156 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/988156
Salt, acid generator, photoresist composition, and method for producing photoresist pattern Jan 4, 2016 Issued
Array ( [id] => 10998862 [patent_doc_number] => 20160195809 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-07-07 [patent_title] => 'PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 14/987303 [patent_app_country] => US [patent_app_date] => 2016-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 25818 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14987303 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/987303
Photoresist composition and method for producing photoresist pattern Jan 3, 2016 Issued
Array ( [id] => 10824138 [patent_doc_number] => 20160170304 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-06-16 [patent_title] => 'Methods of forming patterns using photoresist polymers and methods of manufacturing semiconductor devices' [patent_app_type] => utility [patent_app_number] => 14/959601 [patent_app_country] => US [patent_app_date] => 2015-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 27 [patent_no_of_words] => 13611 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14959601 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/959601
Methods of forming patterns using photoresist polymers and methods of manufacturing semiconductor devices Dec 3, 2015 Issued
Array ( [id] => 10808145 [patent_doc_number] => 20160154304 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-06-02 [patent_title] => 'SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 14/953187 [patent_app_country] => US [patent_app_date] => 2015-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23840 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14953187 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/953187
Salt, acid generator, resist composition and method for producing resist pattern Nov 26, 2015 Issued
Array ( [id] => 13973471 [patent_doc_number] => 10216084 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2019-02-26 [patent_title] => Sulfonic acid derivative, photoacid generator using same, resist composition, and device manufacturing method [patent_app_type] => utility [patent_app_number] => 15/533340 [patent_app_country] => US [patent_app_date] => 2015-11-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8117 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15533340 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/533340
Sulfonic acid derivative, photoacid generator using same, resist composition, and device manufacturing method Nov 25, 2015 Issued
Array ( [id] => 12052875 [patent_doc_number] => 20170329220 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-11-16 [patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE' [patent_app_type] => utility [patent_app_number] => 15/529796 [patent_app_country] => US [patent_app_date] => 2015-11-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 19693 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15529796 [rel_patent_id] =>[rel_patent_doc_number] =>)
15/529796
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE Nov 24, 2015 Abandoned
Array ( [id] => 12016977 [patent_doc_number] => 09809669 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-11-07 [patent_title] => 'Salt, resin, resist composition and method for producing resist pattern' [patent_app_type] => utility [patent_app_number] => 14/952420 [patent_app_country] => US [patent_app_date] => 2015-11-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 24881 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14952420 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/952420
Salt, resin, resist composition and method for producing resist pattern Nov 24, 2015 Issued
Array ( [id] => 13109397 [patent_doc_number] => 10073343 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-09-11 [patent_title] => Non-ionic compound, resin, resist composition and method for producing resist pattern [patent_app_type] => utility [patent_app_number] => 14/950342 [patent_app_country] => US [patent_app_date] => 2015-11-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23092 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 214 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14950342 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/950342
Non-ionic compound, resin, resist composition and method for producing resist pattern Nov 23, 2015 Issued
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