| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 11179235
[patent_doc_number] => 09411226
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2016-08-09
[patent_title] => 'Chemically amplified resist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 14/820839
[patent_app_country] => US
[patent_app_date] => 2015-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13360
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 22
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14820839
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/820839 | Chemically amplified resist composition and patterning process | Aug 6, 2015 | Issued |
Array
(
[id] => 10813814
[patent_doc_number] => 20160159974
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2016-06-09
[patent_title] => 'PHOTORESIST POLYMERS AND METHODS OF FORMING PATTERNS'
[patent_app_type] => utility
[patent_app_number] => 14/804775
[patent_app_country] => US
[patent_app_date] => 2015-07-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 20
[patent_no_of_words] => 12960
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14804775
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/804775 | Photoresist polymers and methods of forming patterns | Jul 20, 2015 | Issued |
Array
(
[id] => 10431835
[patent_doc_number] => 20150316847
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-11-05
[patent_title] => 'HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST'
[patent_app_type] => utility
[patent_app_number] => 14/798990
[patent_app_country] => US
[patent_app_date] => 2015-07-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 14451
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14798990
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/798990 | HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST | Jul 13, 2015 | Abandoned |
Array
(
[id] => 10665363
[patent_doc_number] => 20160011507
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2016-01-14
[patent_title] => 'Negative Tone Developer Compatible Photoresist Composition and Methods of Use'
[patent_app_type] => utility
[patent_app_number] => 14/751728
[patent_app_country] => US
[patent_app_date] => 2015-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6865
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14751728
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/751728 | Negative Tone Developer Compatible Photoresist Composition and Methods of Use | Jun 25, 2015 | Abandoned |
Array
(
[id] => 11272157
[patent_doc_number] => 20160334704
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2016-11-17
[patent_title] => 'DIAZO-RESIN, PHOTORESIST COMPOSITION AND METHOD OF PREPARING SAME'
[patent_app_type] => utility
[patent_app_number] => 14/905453
[patent_app_country] => US
[patent_app_date] => 2015-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 6590
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14905453
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/905453 | Diazo-resin, photoresist composition and method of preparing same | Jun 15, 2015 | Issued |
Array
(
[id] => 10392218
[patent_doc_number] => 20150277225
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-10-01
[patent_title] => 'ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE'
[patent_app_type] => utility
[patent_app_number] => 14/738953
[patent_app_country] => US
[patent_app_date] => 2015-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 39614
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14738953
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/738953 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | Jun 14, 2015 | Abandoned |
Array
(
[id] => 11213343
[patent_doc_number] => 09442377
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2016-09-13
[patent_title] => 'Wet-strippable silicon-containing antireflectant'
[patent_app_type] => utility
[patent_app_number] => 14/739402
[patent_app_country] => US
[patent_app_date] => 2015-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11623
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14739402
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/739402 | Wet-strippable silicon-containing antireflectant | Jun 14, 2015 | Issued |
Array
(
[id] => 11591152
[patent_doc_number] => 20170115563
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-04-27
[patent_title] => 'ENERGY-SENSITIVE RESIN COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 15/317015
[patent_app_country] => US
[patent_app_date] => 2015-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20262
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15317015
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/317015 | ENERGY-SENSITIVE RESIN COMPOSITION | Jun 10, 2015 | Abandoned |
Array
(
[id] => 10470530
[patent_doc_number] => 20150355546
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-12-10
[patent_title] => 'COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND'
[patent_app_type] => utility
[patent_app_number] => 14/728363
[patent_app_country] => US
[patent_app_date] => 2015-06-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15229
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14728363
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/728363 | COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND | Jun 1, 2015 | Abandoned |
Array
(
[id] => 11251648
[patent_doc_number] => 09477148
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2016-10-25
[patent_title] => 'Polymer, method for preparing the same, and a photosensitive resin composition thereof'
[patent_app_type] => utility
[patent_app_number] => 14/721487
[patent_app_country] => US
[patent_app_date] => 2015-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7575
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 10
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14721487
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/721487 | Polymer, method for preparing the same, and a photosensitive resin composition thereof | May 25, 2015 | Issued |
Array
(
[id] => 11543745
[patent_doc_number] => 20170097570
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-04-06
[patent_title] => 'RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, AND RESIST MATERIAL'
[patent_app_type] => utility
[patent_app_number] => 15/312470
[patent_app_country] => US
[patent_app_date] => 2015-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 23008
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15312470
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/312470 | RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, AND RESIST MATERIAL | May 20, 2015 | Abandoned |
Array
(
[id] => 11530311
[patent_doc_number] => 20170090288
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-03-30
[patent_title] => 'TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME'
[patent_app_type] => utility
[patent_app_number] => 15/312442
[patent_app_country] => US
[patent_app_date] => 2015-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7134
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15312442
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/312442 | Top-layer membrane formation composition and method for forming resist pattern using same | May 18, 2015 | Issued |
Array
(
[id] => 11501034
[patent_doc_number] => 20170075219
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-03-16
[patent_title] => 'ONIUM SALT, PHOTOACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING DEVICE'
[patent_app_type] => utility
[patent_app_number] => 15/310733
[patent_app_country] => US
[patent_app_date] => 2015-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 10544
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15310733
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/310733 | ONIUM SALT, PHOTOACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING DEVICE | May 12, 2015 | Abandoned |
Array
(
[id] => 11957703
[patent_doc_number] => 20170261854
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-09-14
[patent_title] => 'CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION THEREFOR, AND PRODUCTION METHOD FOR PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 15/309973
[patent_app_country] => US
[patent_app_date] => 2015-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 16127
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15309973
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/309973 | Conductive composition, antistatic film, laminate and production therefor, and production method for photomask | May 12, 2015 | Issued |
Array
(
[id] => 12645843
[patent_doc_number] => 20180107112
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-04-19
[patent_title] => TRANSFER-TYPE PHOTOSENSITIVE REFRACTIVE INDEX ADJUSTMENT FILM, METHOD FOR FORMING REFRACTIVE INDEX ADJUSTMENT PATTERN, AND ELECTRONIC COMPONENT
[patent_app_type] => utility
[patent_app_number] => 15/573150
[patent_app_country] => US
[patent_app_date] => 2015-05-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14226
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 58
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15573150
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/573150 | TRANSFER-TYPE PHOTOSENSITIVE REFRACTIVE INDEX ADJUSTMENT FILM, METHOD FOR FORMING REFRACTIVE INDEX ADJUSTMENT PATTERN, AND ELECTRONIC COMPONENT | May 10, 2015 | Abandoned |
Array
(
[id] => 14951769
[patent_doc_number] => 10437148
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-10-08
[patent_title] => Resist material, resist composition and method for forming resist pattern
[patent_app_type] => utility
[patent_app_number] => 15/309780
[patent_app_country] => US
[patent_app_date] => 2015-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22692
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15309780
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/309780 | Resist material, resist composition and method for forming resist pattern | May 7, 2015 | Issued |
Array
(
[id] => 11649053
[patent_doc_number] => 20170144954
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-05-25
[patent_title] => 'MATERIAL FOR FORMING FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD'
[patent_app_type] => utility
[patent_app_number] => 15/309758
[patent_app_country] => US
[patent_app_date] => 2015-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20973
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15309758
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/309758 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | May 7, 2015 | Issued |
Array
(
[id] => 12965761
[patent_doc_number] => 09874813
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-01-23
[patent_title] => Photosensitive resin material and resin film
[patent_app_type] => utility
[patent_app_number] => 14/698904
[patent_app_country] => US
[patent_app_date] => 2015-04-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6908
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14698904
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/698904 | Photosensitive resin material and resin film | Apr 28, 2015 | Issued |
Array
(
[id] => 12248701
[patent_doc_number] => 09921474
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-03-20
[patent_title] => 'Pattern-forming method and composition'
[patent_app_type] => utility
[patent_app_number] => 14/641677
[patent_app_country] => US
[patent_app_date] => 2015-03-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 19886
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 202
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14641677
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/641677 | Pattern-forming method and composition | Mar 8, 2015 | Issued |
Array
(
[id] => 11343547
[patent_doc_number] => 09527943
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2016-12-27
[patent_title] => 'Polymer, photosensitive resin composition and electronic device'
[patent_app_type] => utility
[patent_app_number] => 14/640405
[patent_app_country] => US
[patent_app_date] => 2015-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6122
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 31
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14640405
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/640405 | Polymer, photosensitive resin composition and electronic device | Mar 5, 2015 | Issued |