
Aurel Prifti
Examiner (ID: 10223, Phone: (571)270-1743 , Office: P/2115 )
| Most Active Art Unit | 2186 |
| Art Unit(s) | 2175, 2186, 2116, 2115 |
| Total Applications | 683 |
| Issued Applications | 550 |
| Pending Applications | 51 |
| Abandoned Applications | 105 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8197957
[patent_doc_number] => 20120122032
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-05-17
[patent_title] => 'SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/295943
[patent_app_country] => US
[patent_app_date] => 2011-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17265
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0122/20120122032.pdf
[firstpage_image] =>[orig_patent_app_number] => 13295943
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/295943 | Salt and photoresist composition comprising the same | Nov 13, 2011 | Issued |
Array
(
[id] => 8932369
[patent_doc_number] => 08492067
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-07-23
[patent_title] => 'Positive lift-off resist composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 13/294379
[patent_app_country] => US
[patent_app_date] => 2011-11-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 4378
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 66
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13294379
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/294379 | Positive lift-off resist composition and patterning process | Nov 10, 2011 | Issued |
Array
(
[id] => 7807477
[patent_doc_number] => 20120058431
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-08
[patent_title] => 'POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/293290
[patent_app_country] => US
[patent_app_date] => 2011-11-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 28693
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20120058431.pdf
[firstpage_image] =>[orig_patent_app_number] => 13293290
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/293290 | Positive photosensitive composition and method of forming pattern using the same | Nov 9, 2011 | Issued |
Array
(
[id] => 9607940
[patent_doc_number] => 08785105
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-07-22
[patent_title] => 'Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method'
[patent_app_type] => utility
[patent_app_number] => 13/292127
[patent_app_country] => US
[patent_app_date] => 2011-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 13785
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 14
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13292127
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/292127 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Nov 8, 2011 | Issued |
Array
(
[id] => 9183658
[patent_doc_number] => 08623590
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-01-07
[patent_title] => 'Pattern forming process'
[patent_app_type] => utility
[patent_app_number] => 13/279614
[patent_app_country] => US
[patent_app_date] => 2011-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 18
[patent_no_of_words] => 12790
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 347
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13279614
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/279614 | Pattern forming process | Oct 23, 2011 | Issued |
Array
(
[id] => 8976508
[patent_doc_number] => 20130209938
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-08-15
[patent_title] => 'Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same'
[patent_app_type] => utility
[patent_app_number] => 13/879989
[patent_app_country] => US
[patent_app_date] => 2011-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22931
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13879989
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/879989 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | Oct 13, 2011 | Issued |
Array
(
[id] => 8127291
[patent_doc_number] => 20120088190
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-04-12
[patent_title] => 'SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/251334
[patent_app_country] => US
[patent_app_date] => 2011-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17212
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0088/20120088190.pdf
[firstpage_image] =>[orig_patent_app_number] => 13251334
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/251334 | Salt and photoresist composition comprising the same | Oct 2, 2011 | Issued |
Array
(
[id] => 9020148
[patent_doc_number] => 08530133
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-09-10
[patent_title] => 'Preparation of norbornane-based PAC ballasts'
[patent_app_type] => utility
[patent_app_number] => 13/248015
[patent_app_country] => US
[patent_app_date] => 2011-09-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 21256
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13248015
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/248015 | Preparation of norbornane-based PAC ballasts | Sep 27, 2011 | Issued |
Array
(
[id] => 8955603
[patent_doc_number] => 08501375
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-08-06
[patent_title] => 'Positive photosensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 13/241612
[patent_app_country] => US
[patent_app_date] => 2011-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8535
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13241612
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/241612 | Positive photosensitive resin composition | Sep 22, 2011 | Issued |
Array
(
[id] => 7767204
[patent_doc_number] => 20120034735
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-02-09
[patent_title] => 'Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns'
[patent_app_type] => utility
[patent_app_number] => 13/200362
[patent_app_country] => US
[patent_app_date] => 2011-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6317
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0034/20120034735.pdf
[firstpage_image] =>[orig_patent_app_number] => 13200362
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/200362 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | Sep 22, 2011 | Issued |
Array
(
[id] => 9413284
[patent_doc_number] => 08697320
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-04-15
[patent_title] => 'Phenol compounds and positive photosensitive resin composition including the same'
[patent_app_type] => utility
[patent_app_number] => 13/242120
[patent_app_country] => US
[patent_app_date] => 2011-09-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10586
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13242120
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/242120 | Phenol compounds and positive photosensitive resin composition including the same | Sep 22, 2011 | Issued |
Array
(
[id] => 7790887
[patent_doc_number] => 20120052443
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-01
[patent_title] => 'RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 13/221597
[patent_app_country] => US
[patent_app_date] => 2011-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 34094
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0052/20120052443.pdf
[firstpage_image] =>[orig_patent_app_number] => 13221597
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/221597 | Resist composition and method for producing resist pattern | Aug 29, 2011 | Issued |
Array
(
[id] => 8994745
[patent_doc_number] => 08518629
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-08-27
[patent_title] => 'Resist composition for immersion exposure and method of forming resist pattern using the same'
[patent_app_type] => utility
[patent_app_number] => 13/218797
[patent_app_country] => US
[patent_app_date] => 2011-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 30658
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13218797
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/218797 | Resist composition for immersion exposure and method of forming resist pattern using the same | Aug 25, 2011 | Issued |
Array
(
[id] => 7580164
[patent_doc_number] => 20110294047
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-12-01
[patent_title] => 'PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS'
[patent_app_type] => utility
[patent_app_number] => 13/207764
[patent_app_country] => US
[patent_app_date] => 2011-08-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20319
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0294/20110294047.pdf
[firstpage_image] =>[orig_patent_app_number] => 13207764
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/207764 | Photomask blank, resist pattern forming process, and photomask preparation process | Aug 10, 2011 | Issued |
Array
(
[id] => 7817835
[patent_doc_number] => 20120064455
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-15
[patent_title] => 'PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/179106
[patent_app_country] => US
[patent_app_date] => 2011-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5205
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0064/20120064455.pdf
[firstpage_image] =>[orig_patent_app_number] => 13179106
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/179106 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | Jul 7, 2011 | Abandoned |
Array
(
[id] => 7720184
[patent_doc_number] => 20120009519
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-01-12
[patent_title] => 'COMPOUND, RESIN AND PHOTORESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 13/175072
[patent_app_country] => US
[patent_app_date] => 2011-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14985
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0009/20120009519.pdf
[firstpage_image] =>[orig_patent_app_number] => 13175072
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/175072 | Compound, resin and photoresist composition | Jun 30, 2011 | Issued |
Array
(
[id] => 9843896
[patent_doc_number] => 08945810
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-02-03
[patent_title] => 'Positive resist composition and pattern-forming method'
[patent_app_type] => utility
[patent_app_number] => 13/173210
[patent_app_country] => US
[patent_app_date] => 2011-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 19143
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13173210
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/173210 | Positive resist composition and pattern-forming method | Jun 29, 2011 | Issued |
Array
(
[id] => 9273291
[patent_doc_number] => 08637220
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-01-28
[patent_title] => 'Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition'
[patent_app_type] => utility
[patent_app_number] => 13/172025
[patent_app_country] => US
[patent_app_date] => 2011-06-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 44029
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13172025
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/172025 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | Jun 28, 2011 | Issued |
Array
(
[id] => 7669422
[patent_doc_number] => 20110318691
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-12-29
[patent_title] => 'RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/170869
[patent_app_country] => US
[patent_app_date] => 2011-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 33090
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13170869
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/170869 | RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | Jun 27, 2011 | Abandoned |
Array
(
[id] => 7508222
[patent_doc_number] => 20110255069
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-10-20
[patent_title] => 'COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 13/170007
[patent_app_country] => US
[patent_app_date] => 2011-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8530
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0255/20110255069.pdf
[firstpage_image] =>[orig_patent_app_number] => 13170007
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/170007 | Compositions and processes for immersion lithography | Jun 26, 2011 | Issued |