
Bratislav Stankovic
Examiner (ID: 10396, Phone: (571)270-0305 , Office: P/1663 )
| Most Active Art Unit | 1663 |
| Art Unit(s) | 1663, 4171, 1662, 4151 |
| Total Applications | 640 |
| Issued Applications | 401 |
| Pending Applications | 70 |
| Abandoned Applications | 197 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 9157963
[patent_doc_number] => 20130306240
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-11-21
[patent_title] => 'System and Method for Controlling Plasma With an Adjustable Coupling to Ground Circuit'
[patent_app_type] => utility
[patent_app_number] => 13/952055
[patent_app_country] => US
[patent_app_date] => 2013-07-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3830
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13952055
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/952055 | System and method for controlling plasma with an adjustable coupling to ground circuit | Jul 25, 2013 | Issued |
Array
(
[id] => 9799153
[patent_doc_number] => 20150011096
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-01-08
[patent_title] => 'DEPOSITION APPARATUS INCLUDING AN ISOTHERMAL PROCESSING ZONE'
[patent_app_type] => utility
[patent_app_number] => 13/934624
[patent_app_country] => US
[patent_app_date] => 2013-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 6158
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13934624
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/934624 | Deposition apparatus including an isothermal processing zone | Jul 2, 2013 | Issued |
Array
(
[id] => 9177630
[patent_doc_number] => 20130319615
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-12-05
[patent_title] => 'APPARATUS AND METHOD FOR TREATING SUBSTRATES'
[patent_app_type] => utility
[patent_app_number] => 13/906438
[patent_app_country] => US
[patent_app_date] => 2013-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 7610
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13906438
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/906438 | APPARATUS AND METHOD FOR TREATING SUBSTRATES | May 30, 2013 | Abandoned |
Array
(
[id] => 9157824
[patent_doc_number] => 20130306101
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-11-21
[patent_title] => 'Contamination Removal Apparatus and Method'
[patent_app_type] => utility
[patent_app_number] => 13/897552
[patent_app_country] => US
[patent_app_date] => 2013-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 15
[patent_no_of_words] => 13325
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13897552
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/897552 | Contamination removal apparatus and method | May 19, 2013 | Issued |
Array
(
[id] => 9037508
[patent_doc_number] => 20130240146
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-09-19
[patent_title] => 'PLASMA APPARATUS AND METHOD FOR PRODUCING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/889478
[patent_app_country] => US
[patent_app_date] => 2013-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 8752
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13889478
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/889478 | Plasma apparatus and method for producing the same | May 7, 2013 | Issued |
Array
(
[id] => 9030853
[patent_doc_number] => 20130233491
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-09-12
[patent_title] => 'DRY ETCHING APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 13/874288
[patent_app_country] => US
[patent_app_date] => 2013-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4696
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13874288
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/874288 | DRY ETCHING APPARATUS | Apr 29, 2013 | Abandoned |
Array
(
[id] => 9634491
[patent_doc_number] => 20140212599
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-07-31
[patent_title] => 'DEPOSITION SOURCE WITH ADJUSTABLE ELECTRODE'
[patent_app_type] => utility
[patent_app_number] => 13/871874
[patent_app_country] => US
[patent_app_date] => 2013-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 18791
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13871874
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/871874 | DEPOSITION SOURCE WITH ADJUSTABLE ELECTRODE | Apr 25, 2013 | Abandoned |
Array
(
[id] => 10912374
[patent_doc_number] => 20140315392
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-10-23
[patent_title] => 'COLD SPRAY BARRIER COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF'
[patent_app_type] => utility
[patent_app_number] => 13/867522
[patent_app_country] => US
[patent_app_date] => 2013-04-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 6203
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13867522
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/867522 | COLD SPRAY BARRIER COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF | Apr 21, 2013 | Abandoned |
Array
(
[id] => 12395940
[patent_doc_number] => 09966233
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-05-08
[patent_title] => Plasma processing apparatus
[patent_app_type] => utility
[patent_app_number] => 14/382898
[patent_app_country] => US
[patent_app_date] => 2013-04-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 15
[patent_no_of_words] => 6912
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 235
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14382898
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/382898 | Plasma processing apparatus | Apr 3, 2013 | Issued |
Array
(
[id] => 8999425
[patent_doc_number] => 20130220549
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-08-29
[patent_title] => 'USING POSITIVE DC OFFSET OF BIAS RF TO NEUTRALIZE CHARGE BUILD-UP OF ETCH FEATURES'
[patent_app_type] => utility
[patent_app_number] => 13/855340
[patent_app_country] => US
[patent_app_date] => 2013-04-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4802
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13855340
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/855340 | USING POSITIVE DC OFFSET OF BIAS RF TO NEUTRALIZE CHARGE BUILD-UP OF ETCH FEATURES | Apr 1, 2013 | Abandoned |
Array
(
[id] => 8986291
[patent_doc_number] => 20130213572
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-08-22
[patent_title] => 'PLASMA PROCESSING APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 13/848360
[patent_app_country] => US
[patent_app_date] => 2013-03-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 9844
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13848360
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/848360 | PLASMA PROCESSING APPARATUS | Mar 20, 2013 | Abandoned |
Array
(
[id] => 9064514
[patent_doc_number] => 20130256270
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-10-03
[patent_title] => 'PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD'
[patent_app_type] => utility
[patent_app_number] => 13/847130
[patent_app_country] => US
[patent_app_date] => 2013-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 8463
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13847130
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/847130 | Plasma processing apparatus and plasma processing method | Mar 18, 2013 | Issued |
Array
(
[id] => 9631133
[patent_doc_number] => 20140209242
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-07-31
[patent_title] => 'SUBSTRATE PROCESSING CHAMBER COMPONENTS INCORPORATING ANISOTROPIC MATERIALS'
[patent_app_type] => utility
[patent_app_number] => 13/838510
[patent_app_country] => US
[patent_app_date] => 2013-03-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2670
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13838510
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/838510 | SUBSTRATE PROCESSING CHAMBER COMPONENTS INCORPORATING ANISOTROPIC MATERIALS | Mar 14, 2013 | Abandoned |
Array
(
[id] => 9560891
[patent_doc_number] => 20140178604
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-06-26
[patent_title] => 'Dual-Zone, Atmospheric-Pressure Plasma Reactor for Materials Processing'
[patent_app_type] => utility
[patent_app_number] => 13/830300
[patent_app_country] => US
[patent_app_date] => 2013-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 10922
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13830300
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/830300 | Dual-Zone, Atmospheric-Pressure Plasma Reactor for Materials Processing | Mar 13, 2013 | Abandoned |
Array
(
[id] => 15791453
[patent_doc_number] => 10629458
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-04-21
[patent_title] => Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter
[patent_app_type] => utility
[patent_app_number] => 13/793454
[patent_app_country] => US
[patent_app_date] => 2013-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 26
[patent_no_of_words] => 8499
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 292
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13793454
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/793454 | Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter | Mar 10, 2013 | Issued |
Array
(
[id] => 8881295
[patent_doc_number] => 20130154479
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-06-20
[patent_title] => 'APPARATUS AND METHODS FOR CAPACITIVELY COUPLED PLASMA VAPOR PROCESSING OF SEMICONDUCTOR WAFERS'
[patent_app_type] => utility
[patent_app_number] => 13/767526
[patent_app_country] => US
[patent_app_date] => 2013-02-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5936
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13767526
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/767526 | Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafers | Feb 13, 2013 | Issued |
Array
(
[id] => 8972637
[patent_doc_number] => 20130206067
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-08-15
[patent_title] => 'FILM DEPOSITION APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 13/761257
[patent_app_country] => US
[patent_app_date] => 2013-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 31
[patent_figures_cnt] => 31
[patent_no_of_words] => 15203
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13761257
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/761257 | FILM DEPOSITION APPARATUS | Feb 6, 2013 | Abandoned |
Array
(
[id] => 10073604
[patent_doc_number] => 09111969
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-08-18
[patent_title] => 'Seal member, etching apparatus, and a method of manufacturing a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 13/761359
[patent_app_country] => US
[patent_app_date] => 2013-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 10
[patent_no_of_words] => 3857
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 155
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13761359
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/761359 | Seal member, etching apparatus, and a method of manufacturing a semiconductor device | Feb 6, 2013 | Issued |
Array
(
[id] => 8839250
[patent_doc_number] => 20130134878
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-05-30
[patent_title] => 'LARGE AREA, ATMOSPHERIC PRESSURE PLASMA FOR DOWNSTREAM PROCESSING'
[patent_app_type] => utility
[patent_app_number] => 13/752001
[patent_app_country] => US
[patent_app_date] => 2013-01-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 9595
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13752001
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/752001 | Large area, atmospheric pressure plasma for downstream processing | Jan 27, 2013 | Issued |
Array
(
[id] => 8824771
[patent_doc_number] => 20130125816
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-05-23
[patent_title] => 'Fluorinating Apparatus'
[patent_app_type] => utility
[patent_app_number] => 13/746077
[patent_app_country] => US
[patent_app_date] => 2013-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 10468
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13746077
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/746077 | Fluorinating Apparatus | Jan 20, 2013 | Abandoned |