
Bratislav Stankovic
Examiner (ID: 10396, Phone: (571)270-0305 , Office: P/1663 )
| Most Active Art Unit | 1663 |
| Art Unit(s) | 1663, 4171, 1662, 4151 |
| Total Applications | 640 |
| Issued Applications | 401 |
| Pending Applications | 70 |
| Abandoned Applications | 197 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6771954
[patent_doc_number] => 20030015292
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-01-23
[patent_title] => 'Apparatus for fabricating a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 09/913665
[patent_app_country] => US
[patent_app_date] => 2001-08-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1941
[patent_no_of_claims] => 6
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[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0015/20030015292.pdf
[firstpage_image] =>[orig_patent_app_number] => 09913665
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/913665 | Apparatus for fabricating a semiconductor device | Aug 15, 2001 | Abandoned |
Array
(
[id] => 7341540
[patent_doc_number] => 20040045674
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-11
[patent_title] => 'Radial antenna and plasma device using it'
[patent_app_type] => new
[patent_app_number] => 10/343221
[patent_app_country] => US
[patent_app_date] => 2003-06-18
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 10343221
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/343221 | Radial antenna and plasma device using it | Aug 2, 2001 | Issued |
Array
(
[id] => 6776384
[patent_doc_number] => 20030047464
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-03-13
[patent_title] => 'Electrochemically roughened aluminum semiconductor processing apparatus surfaces'
[patent_app_type] => new
[patent_app_number] => 09/918683
[patent_app_country] => US
[patent_app_date] => 2001-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0047/20030047464.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/918683 | Electrochemically roughened aluminum semiconductor processing apparatus surfaces | Jul 26, 2001 | Abandoned |
Array
(
[id] => 6470671
[patent_doc_number] => 20020023716
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-28
[patent_title] => 'Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield'
[patent_app_type] => new
[patent_app_number] => 09/908844
[patent_app_country] => US
[patent_app_date] => 2001-07-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[firstpage_image] =>[orig_patent_app_number] => 09908844
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/908844 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Jul 19, 2001 | Issued |
Array
(
[id] => 621618
[patent_doc_number] => 07137352
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[patent_kind] => B2
[patent_issue_date] => 2006-11-21
[patent_title] => 'Plasma processing system in which wafer is retained by electrostatic chuck'
[patent_app_type] => utility
[patent_app_number] => 09/901038
[patent_app_country] => US
[patent_app_date] => 2001-07-10
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[pdf_file] => patents/07/137/07137352.pdf
[firstpage_image] =>[orig_patent_app_number] => 09901038
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/901038 | Plasma processing system in which wafer is retained by electrostatic chuck | Jul 9, 2001 | Issued |
Array
(
[id] => 5811751
[patent_doc_number] => 20020038632
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[patent_kind] => A1
[patent_issue_date] => 2002-04-04
[patent_title] => 'Plasma treatment method and plasma treatment apparatus'
[patent_app_type] => new
[patent_app_number] => 09/899188
[patent_app_country] => US
[patent_app_date] => 2001-07-06
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[firstpage_image] =>[orig_patent_app_number] => 09899188
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/899188 | Plasma treatment apparatus | Jul 5, 2001 | Issued |
Array
(
[id] => 1146385
[patent_doc_number] => 06770166
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[patent_issue_date] => 2004-08-03
[patent_title] => 'Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor'
[patent_app_type] => B1
[patent_app_number] => 09/895363
[patent_app_country] => US
[patent_app_date] => 2001-06-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => patents/06/770/06770166.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/895363 | Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor | Jun 28, 2001 | Issued |
Array
(
[id] => 1135793
[patent_doc_number] => 06780278
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-08-24
[patent_title] => 'Plasma processing apparatus with reduced parasitic capacity and loss in RF power'
[patent_app_type] => B2
[patent_app_number] => 09/892481
[patent_app_country] => US
[patent_app_date] => 2001-06-28
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09892481
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/892481 | Plasma processing apparatus with reduced parasitic capacity and loss in RF power | Jun 27, 2001 | Issued |
Array
(
[id] => 6059116
[patent_doc_number] => 20020029853
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[patent_issue_date] => 2002-03-14
[patent_title] => 'Methods for running a high density plasma etcher to achieve reduced transistor device damage'
[patent_app_type] => new
[patent_app_number] => 09/870968
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[patent_app_date] => 2001-05-30
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/870968 | Methods for running a high density plasma etcher to achieve reduced transistor device damage | May 29, 2001 | Abandoned |
Array
(
[id] => 6986917
[patent_doc_number] => 20010036749
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[patent_kind] => A1
[patent_issue_date] => 2001-11-01
[patent_title] => 'Apparatus and methods for integrated circuit planarization'
[patent_app_type] => new
[patent_app_number] => 09/860949
[patent_app_country] => US
[patent_app_date] => 2001-05-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/860949 | Apparatus and methods for integrated circuit planarization | May 17, 2001 | Abandoned |
Array
(
[id] => 935175
[patent_doc_number] => 06974523
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[patent_issue_date] => 2005-12-13
[patent_title] => 'Hollow anode plasma reactor and method'
[patent_app_type] => utility
[patent_app_number] => 09/859091
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/859091 | Hollow anode plasma reactor and method | May 15, 2001 | Issued |
Array
(
[id] => 7064703
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[patent_title] => 'Film forming apparatus and film forming method'
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Array
(
[id] => 6528483
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[patent_title] => 'Self-renewing coating for plasma enhanced processing systems'
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Array
(
[id] => 6883617
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Array
(
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Array
(
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[patent_title] => 'Method for preventing contamination in a plasma process chamber'
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Array
(
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Array
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Array
(
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Array
(
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[firstpage_image] =>[orig_patent_app_number] => 09829191
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/829191 | Microwave plasma generator | Apr 8, 2001 | Issued |