| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[id] => 5947525
[patent_doc_number] => 20020005171
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-17
[patent_title] => 'Vacuum-processing apparatus and method for vacuum-processing an object'
[patent_app_type] => new
[patent_app_number] => 09/772987
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[firstpage_image] =>[orig_patent_app_number] => 09772987
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/772987 | Vacuum-processing apparatus using a movable cooling plate during processing | Jan 30, 2001 | Issued |
Array
(
[id] => 6011275
[patent_doc_number] => 20020100424
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Scanning deposition head for depositing particles on a wafer'
[patent_app_type] => new
[patent_app_number] => 09/772694
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[patent_app_date] => 2001-01-30
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[firstpage_image] =>[orig_patent_app_number] => 09772694
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/772694 | Scanning deposition head for depositing particles on a wafer | Jan 29, 2001 | Issued |
Array
(
[id] => 6894811
[patent_doc_number] => 20010025601
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-04
[patent_title] => 'Apparatus and method for forming a deposited film by means of plasma CVD'
[patent_app_type] => new
[patent_app_number] => 09/771650
[patent_app_country] => US
[patent_app_date] => 2001-01-30
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[pdf_file] => publications/A1/0025/20010025601.pdf
[firstpage_image] =>[orig_patent_app_number] => 09771650
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/771650 | Apparatus and method for forming a deposited film by a means of plasma CVD | Jan 29, 2001 | Issued |
Array
(
[id] => 6011594
[patent_doc_number] => 20020100557
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'ICP window heater integrated with faraday shield or floating electrode between the source power coil and the ICP window'
[patent_app_type] => new
[patent_app_number] => 09/774192
[patent_app_country] => US
[patent_app_date] => 2001-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => publications/A1/0100/20020100557.pdf
[firstpage_image] =>[orig_patent_app_number] => 09774192
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/774192 | ICP window heater integrated with faraday shield or floating electrode between the source power coil and the ICP window | Jan 28, 2001 | Abandoned |
Array
(
[id] => 6901413
[patent_doc_number] => 20010022996
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-20
[patent_title] => 'Deposited-film formation apparatus, and deposited-film formation process'
[patent_app_type] => new
[patent_app_number] => 09/769328
[patent_app_country] => US
[patent_app_date] => 2001-01-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0022/20010022996.pdf
[firstpage_image] =>[orig_patent_app_number] => 09769328
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/769328 | Deposited-film formation apparatus, and deposited-film formation process | Jan 25, 2001 | Abandoned |
| 09/756841 | Apparatus for exhaust white powder elimination in substrate processing | Jan 8, 2001 | Abandoned |
Array
(
[id] => 5855974
[patent_doc_number] => 20020121500
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[patent_kind] => A1
[patent_issue_date] => 2002-09-05
[patent_title] => 'Method of etching with NH3 and fluorine chemistries'
[patent_app_type] => new
[patent_app_number] => 09/746900
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[patent_app_date] => 2000-12-22
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Array
(
[id] => 1049565
[patent_doc_number] => 06860964
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-03-01
[patent_title] => 'Etch/strip apparatus integrated with cleaning equipment'
[patent_app_type] => utility
[patent_app_number] => 09/740830
[patent_app_country] => US
[patent_app_date] => 2000-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[firstpage_image] =>[orig_patent_app_number] => 09740830
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/740830 | Etch/strip apparatus integrated with cleaning equipment | Dec 20, 2000 | Issued |
Array
(
[id] => 6933140
[patent_doc_number] => 20010054484
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-12-27
[patent_title] => 'Plasma processor, cluster tool, and method of controlling plasma'
[patent_app_type] => new
[patent_app_number] => 09/739623
[patent_app_country] => US
[patent_app_date] => 2000-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0054/20010054484.pdf
[firstpage_image] =>[orig_patent_app_number] => 09739623
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/739623 | Plasma processor, cluster tool, and method of controlling plasma | Dec 19, 2000 | Abandoned |
Array
(
[id] => 6997840
[patent_doc_number] => 20010052319
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-12-20
[patent_title] => 'Plasma processing apparatus and plasma processing method'
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[firstpage_image] =>[orig_patent_app_number] => 09737484
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/737484 | Plasma processing apparatus and plasma processing method | Dec 17, 2000 | Abandoned |
Array
(
[id] => 6204891
[patent_doc_number] => 20020069966
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-13
[patent_title] => 'Scanning plasma reactor'
[patent_app_type] => new
[patent_app_number] => 09/736073
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[firstpage_image] =>[orig_patent_app_number] => 09736073
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Array
(
[id] => 6892978
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[patent_kind] => A1
[patent_issue_date] => 2001-08-23
[patent_title] => 'Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD'
[patent_app_type] => new
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[pdf_file] => publications/A1/0015/20010015344.pdf
[firstpage_image] =>[orig_patent_app_number] => 09733122
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/733122 | Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD | Dec 7, 2000 | Issued |
Array
(
[id] => 1079458
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[patent_kind] => B1
[patent_issue_date] => 2004-12-28
[patent_title] => 'Plasma-resistant member and plasma treatment apparatus using the same'
[patent_app_type] => B1
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Array
(
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[patent_title] => 'Process to decapsulate a FBGA package'
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Array
(
[id] => 1390151
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[patent_issue_date] => 2003-03-11
[patent_title] => 'Plasma etching installation'
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Array
(
[id] => 1515804
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[patent_issue_date] => 2002-12-31
[patent_title] => 'Apparatus for electrostatically maintaining subtrate flatness'
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[patent_app_country] => US
[patent_app_date] => 2000-11-15
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/714023 | Apparatus for electrostatically maintaining subtrate flatness | Nov 14, 2000 | Issued |
Array
(
[id] => 1294186
[patent_doc_number] => 06626998
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-09-30
[patent_title] => 'Plasma generator assembly for use in CVD and PECVD processes'
[patent_app_type] => B1
[patent_app_number] => 09/709228
[patent_app_country] => US
[patent_app_date] => 2000-11-08
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/709228 | Plasma generator assembly for use in CVD and PECVD processes | Nov 7, 2000 | Issued |
| 09/705254 | Etching of high aspect ratio features in a substrate | Oct 31, 2000 | Abandoned |
| 09/704887 | Etching of high aspect ratio features in a substrate | Oct 31, 2000 | Abandoned |
| 09/697083 | Plasma etching apparatus | Oct 26, 2000 | Abandoned |