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Byron S. Everhart

Examiner (ID: 12669)

Most Active Art Unit
1104
Art Unit(s)
1104, 1109
Total Applications
352
Issued Applications
236
Pending Applications
3
Abandoned Applications
113

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2733872 [patent_doc_number] => 04997784 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Fabrication method for a CCD frame transfer photosensitive matrix with vertical anti-blooming system' [patent_app_type] => 1 [patent_app_number] => 7/471418 [patent_app_country] => US [patent_app_date] => 1990-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3424 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 206 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997784.pdf [firstpage_image] =>[orig_patent_app_number] => 471418 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/471418
Fabrication method for a CCD frame transfer photosensitive matrix with vertical anti-blooming system Jan 28, 1990 Issued
07/467636 PROFILE TAILORED TRENCH IN SEMICONDUCTOR DEVICE Jan 18, 1990 Abandoned
Array ( [id] => 2851110 [patent_doc_number] => 05089426 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-02-18 [patent_title] => 'Method for manufacturing a semiconductor device free from electrical shortage due to pin-hole formation' [patent_app_type] => 1 [patent_app_number] => 7/464567 [patent_app_country] => US [patent_app_date] => 1990-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 16 [patent_no_of_words] => 4796 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 174 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/089/05089426.pdf [firstpage_image] =>[orig_patent_app_number] => 464567 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/464567
Method for manufacturing a semiconductor device free from electrical shortage due to pin-hole formation Jan 15, 1990 Issued
07/465692 PROCESS FOR TEXTURIZING MONOCRYSTALLINE SILICON USING A POLYSILICON STARTER LAYER Jan 15, 1990 Abandoned
Array ( [id] => 2766292 [patent_doc_number] => 05063170 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-11-05 [patent_title] => 'Semiconductor integrated circuit device and a method of producing the same' [patent_app_type] => 1 [patent_app_number] => 7/460011 [patent_app_country] => US [patent_app_date] => 1990-01-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 12 [patent_no_of_words] => 5007 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 210 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/063/05063170.pdf [firstpage_image] =>[orig_patent_app_number] => 460011 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/460011
Semiconductor integrated circuit device and a method of producing the same Jan 1, 1990 Issued
Array ( [id] => 2816730 [patent_doc_number] => 05081069 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-01-14 [patent_title] => 'Method for depositing a Tio.sub.2 layer using a periodic and simultaneous tilting and rotating platform motion' [patent_app_type] => 1 [patent_app_number] => 7/457113 [patent_app_country] => US [patent_app_date] => 1989-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 3616 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 133 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/081/05081069.pdf [firstpage_image] =>[orig_patent_app_number] => 457113 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/457113
Method for depositing a Tio.sub.2 layer using a periodic and simultaneous tilting and rotating platform motion Dec 25, 1989 Issued
Array ( [id] => 2784312 [patent_doc_number] => 05130265 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-07-14 [patent_title] => 'Process for obtaining a multifunctional, ion-selective-membrane sensor using a siloxanic prepolymer' [patent_app_type] => 1 [patent_app_number] => 7/454512 [patent_app_country] => US [patent_app_date] => 1989-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 27 [patent_no_of_words] => 3364 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 582 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/130/05130265.pdf [firstpage_image] =>[orig_patent_app_number] => 454512 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/454512
Process for obtaining a multifunctional, ion-selective-membrane sensor using a siloxanic prepolymer Dec 20, 1989 Issued
07/449165 DEPOSITION METHOD FOR HIGH ASPECT RATIO FEATURES Dec 12, 1989 Abandoned
Array ( [id] => 2745198 [patent_doc_number] => 04987102 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-22 [patent_title] => 'Process for forming high purity thin films' [patent_app_type] => 1 [patent_app_number] => 7/445220 [patent_app_country] => US [patent_app_date] => 1989-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 3298 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/987/04987102.pdf [firstpage_image] =>[orig_patent_app_number] => 445220 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/445220
Process for forming high purity thin films Dec 3, 1989 Issued
Array ( [id] => 2754378 [patent_doc_number] => 05043299 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-08-27 [patent_title] => 'Process for selective deposition of tungsten on semiconductor wafer' [patent_app_type] => 1 [patent_app_number] => 7/444485 [patent_app_country] => US [patent_app_date] => 1989-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3373 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 281 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/043/05043299.pdf [firstpage_image] =>[orig_patent_app_number] => 444485 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/444485
Process for selective deposition of tungsten on semiconductor wafer Nov 30, 1989 Issued
Array ( [id] => 2742428 [patent_doc_number] => 05023191 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-06-11 [patent_title] => 'Method of producing a semiconductor device using a single mask method for providing multiple masking patterns' [patent_app_type] => 1 [patent_app_number] => 7/444567 [patent_app_country] => US [patent_app_date] => 1989-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 9 [patent_no_of_words] => 2478 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 224 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/023/05023191.pdf [firstpage_image] =>[orig_patent_app_number] => 444567 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/444567
Method of producing a semiconductor device using a single mask method for providing multiple masking patterns Nov 30, 1989 Issued
Array ( [id] => 2706096 [patent_doc_number] => 04981816 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-01 [patent_title] => 'MO/TI Contact to silicon' [patent_app_type] => 1 [patent_app_number] => 7/445130 [patent_app_country] => US [patent_app_date] => 1989-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 2400 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 179 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/981/04981816.pdf [firstpage_image] =>[orig_patent_app_number] => 445130 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/445130
MO/TI Contact to silicon Nov 29, 1989 Issued
Array ( [id] => 2708291 [patent_doc_number] => 05017514 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-05-21 [patent_title] => 'Method of manufacturing a semiconductor device using a main vernier pattern formed at a right angle to a subsidiary vernier pattern' [patent_app_type] => 1 [patent_app_number] => 7/441522 [patent_app_country] => US [patent_app_date] => 1989-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 21 [patent_no_of_words] => 4600 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/017/05017514.pdf [firstpage_image] =>[orig_patent_app_number] => 441522 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/441522
Method of manufacturing a semiconductor device using a main vernier pattern formed at a right angle to a subsidiary vernier pattern Nov 26, 1989 Issued
07/439608 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Nov 20, 1989 Abandoned
07/431108 PROCESS FOR FORMING RESIST MASK PATTERN Nov 2, 1989 Abandoned
07/430925 SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREOF Nov 1, 1989 Abandoned
07/428446 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES Oct 29, 1989 Abandoned
07/427906 SEMICONDUCTOR ARTICLE AND PREPARATION THEREOF Oct 23, 1989 Abandoned
Array ( [id] => 2845247 [patent_doc_number] => 05106786 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-04-21 [patent_title] => 'Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide' [patent_app_type] => 1 [patent_app_number] => 7/425134 [patent_app_country] => US [patent_app_date] => 1989-10-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 2773 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/106/05106786.pdf [firstpage_image] =>[orig_patent_app_number] => 425134 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/425134
Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide Oct 22, 1989 Issued
Array ( [id] => 2587906 [patent_doc_number] => 04927786 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-05-22 [patent_title] => 'Process for the formation of a silicon-containing semiconductor thin film by chemically reacting active hydrogen atoms with liquefied film-forming raw material gas on the surface of a substrate' [patent_app_type] => 1 [patent_app_number] => 7/425350 [patent_app_country] => US [patent_app_date] => 1989-10-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 5521 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/927/04927786.pdf [firstpage_image] =>[orig_patent_app_number] => 425350 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/425350
Process for the formation of a silicon-containing semiconductor thin film by chemically reacting active hydrogen atoms with liquefied film-forming raw material gas on the surface of a substrate Oct 19, 1989 Issued
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