
Caleen O. Sullivan
Examiner (ID: 789, Phone: (571)272-6569 , Office: P/2896 )
| Most Active Art Unit | 2899 |
| Art Unit(s) | 2896, 1795, 1722, 2899, 1756 |
| Total Applications | 1358 |
| Issued Applications | 1151 |
| Pending Applications | 77 |
| Abandoned Applications | 165 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 151436
[patent_doc_number] => 07678516
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-03-16
[patent_title] => 'Test structures and methods for monitoring or controlling a semiconductor fabrication process'
[patent_app_type] => utility
[patent_app_number] => 11/187609
[patent_app_country] => US
[patent_app_date] => 2005-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/678/07678516.pdf
[firstpage_image] =>[orig_patent_app_number] => 11187609
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/187609 | Test structures and methods for monitoring or controlling a semiconductor fabrication process | Jul 21, 2005 | Issued |
Array
(
[id] => 5764492
[patent_doc_number] => 20060017904
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-26
[patent_title] => 'Method and apparatus for photolithographic exposure using a redirected light path for secondary shot regions'
[patent_app_type] => utility
[patent_app_number] => 11/185632
[patent_app_country] => US
[patent_app_date] => 2005-07-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0017/20060017904.pdf
[firstpage_image] =>[orig_patent_app_number] => 11185632
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/185632 | Method and apparatus for photolithographic exposure using a redirected light path for secondary shot regions | Jul 19, 2005 | Abandoned |
Array
(
[id] => 5075113
[patent_doc_number] => 20070015088
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-01-18
[patent_title] => 'METHOD FOR LITHOGRAPHICALLY PRINTING TIGHTLY NESTED AND ISOLATED HOLE FEATURES USING DOUBLE EXPOSURE'
[patent_app_type] => utility
[patent_app_number] => 11/160923
[patent_app_country] => US
[patent_app_date] => 2005-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2406
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[pdf_file] => publications/A1/0015/20070015088.pdf
[firstpage_image] =>[orig_patent_app_number] => 11160923
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/160923 | METHOD FOR LITHOGRAPHICALLY PRINTING TIGHTLY NESTED AND ISOLATED HOLE FEATURES USING DOUBLE EXPOSURE | Jul 14, 2005 | Abandoned |
Array
(
[id] => 122376
[patent_doc_number] => 07704683
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-04-27
[patent_title] => 'Process for producing patterned optical filter layers on substrates'
[patent_app_type] => utility
[patent_app_number] => 11/182444
[patent_app_country] => US
[patent_app_date] => 2005-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/07/704/07704683.pdf
[firstpage_image] =>[orig_patent_app_number] => 11182444
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/182444 | Process for producing patterned optical filter layers on substrates | Jul 14, 2005 | Issued |
Array
(
[id] => 7069372
[patent_doc_number] => 20050244757
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-03
[patent_title] => 'DYNAMIC MASK MODULE'
[patent_app_type] => utility
[patent_app_number] => 11/160880
[patent_app_country] => US
[patent_app_date] => 2005-07-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => publications/A1/0244/20050244757.pdf
[firstpage_image] =>[orig_patent_app_number] => 11160880
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/160880 | DYNAMIC MASK MODULE | Jul 13, 2005 | Abandoned |
Array
(
[id] => 5738356
[patent_doc_number] => 20060008746
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-12
[patent_title] => 'Method for manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/174720
[patent_app_country] => US
[patent_app_date] => 2005-07-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[firstpage_image] =>[orig_patent_app_number] => 11174720
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/174720 | Method for manufacturing semiconductor device | Jul 5, 2005 | Abandoned |
Array
(
[id] => 5732674
[patent_doc_number] => 20060257791
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-11-16
[patent_title] => 'Method for forming conductive line of semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/169943
[patent_app_country] => US
[patent_app_date] => 2005-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 2078
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[firstpage_image] =>[orig_patent_app_number] => 11169943
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/169943 | Method for forming conductive line of semiconductor device | Jun 29, 2005 | Abandoned |
Array
(
[id] => 5793427
[patent_doc_number] => 20060014108
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-19
[patent_title] => 'Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method'
[patent_app_type] => utility
[patent_app_number] => 11/166103
[patent_app_country] => US
[patent_app_date] => 2005-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3435
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[pdf_file] => publications/A1/0014/20060014108.pdf
[firstpage_image] =>[orig_patent_app_number] => 11166103
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/166103 | Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method | Jun 26, 2005 | Abandoned |
Array
(
[id] => 5602155
[patent_doc_number] => 20060292500
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-28
[patent_title] => 'Cure during rinse to prevent resist collapse'
[patent_app_type] => utility
[patent_app_number] => 11/165717
[patent_app_country] => US
[patent_app_date] => 2005-06-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[firstpage_image] =>[orig_patent_app_number] => 11165717
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/165717 | Cure during rinse to prevent resist collapse | Jun 23, 2005 | Abandoned |
Array
(
[id] => 5688175
[patent_doc_number] => 20060286490
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-21
[patent_title] => 'Methods of making templates for use in imprint lithography and related structures'
[patent_app_type] => utility
[patent_app_number] => 11/155167
[patent_app_country] => US
[patent_app_date] => 2005-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => publications/A1/0286/20060286490.pdf
[firstpage_image] =>[orig_patent_app_number] => 11155167
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/155167 | Methods of making templates for use in imprint lithography | Jun 16, 2005 | Issued |
Array
(
[id] => 4473951
[patent_doc_number] => 07867692
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[patent_kind] => B2
[patent_issue_date] => 2011-01-11
[patent_title] => 'Method for manufacturing a microstructure, exposure device, and electronic apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/153553
[patent_app_country] => US
[patent_app_date] => 2005-06-16
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/153553 | Method for manufacturing a microstructure, exposure device, and electronic apparatus | Jun 15, 2005 | Issued |
Array
(
[id] => 7055894
[patent_doc_number] => 20050277068
[patent_country] => US
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[patent_issue_date] => 2005-12-15
[patent_title] => 'Semiconductor manufacturing apparatus and pattern formation method'
[patent_app_type] => utility
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Array
(
[id] => 7234710
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[patent_title] => 'Measurement method and apparatus, exposure apparatus, and device fabrication method'
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Array
(
[id] => 263573
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[patent_title] => 'Conductive patterning'
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Array
(
[id] => 4903889
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[firstpage_image] =>[orig_patent_app_number] => 11597741
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/597741 | Pattern Forming Process | May 24, 2005 | Abandoned |
Array
(
[id] => 5608363
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[patent_issue_date] => 2006-11-30
[patent_title] => 'Method and apparatus for a post exposure bake of a resist'
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Array
(
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[patent_title] => 'Apparatus and method of making a grayscale photo mask and an optical grayscale element'
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Array
(
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/099500 | Resist pattern formation method, patterned substrate manufacturing method, and resist pattern formation apparatus | Apr 5, 2005 | Abandoned |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/091905 | Lithographic apparatus and device manufacturing method | Mar 28, 2005 | Issued |