| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 5873990
[patent_doc_number] => 20020048834
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-04-25
[patent_title] => 'Method of increasing the conductivity of a transparent conductive layer'
[patent_app_type] => new
[patent_app_number] => 09/998031
[patent_app_country] => US
[patent_app_date] => 2001-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4215
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 17
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0048/20020048834.pdf
[firstpage_image] =>[orig_patent_app_number] => 09998031
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/998031 | Method of increasing the conductivity of a transparent conductive layer | Nov 28, 2001 | Issued |
Array
(
[id] => 6012276
[patent_doc_number] => 20020100906
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Metal coordination compound, luminescence device and display apparatus'
[patent_app_type] => new
[patent_app_number] => 09/995609
[patent_app_country] => US
[patent_app_date] => 2001-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 7716
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 11
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0100/20020100906.pdf
[firstpage_image] =>[orig_patent_app_number] => 09995609
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/995609 | Metal coordination compound, luminescence device and display apparatus | Nov 28, 2001 | Issued |
Array
(
[id] => 5986469
[patent_doc_number] => 20020098683
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-25
[patent_title] => 'Semiconductor device manufacturing method using metal silicide reaction after ion implantation\nin silicon wiring'
[patent_app_type] => new
[patent_app_number] => 09/995575
[patent_app_country] => US
[patent_app_date] => 2001-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2778
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0098/20020098683.pdf
[firstpage_image] =>[orig_patent_app_number] => 09995575
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/995575 | Semiconductor device manufacturing method using metal silicide reaction after ion implantationnin silicon wiring | Nov 28, 2001 | Abandoned |
Array
(
[id] => 1172179
[patent_doc_number] => 06753606
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-06-22
[patent_title] => 'Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy'
[patent_app_type] => B2
[patent_app_number] => 09/994954
[patent_app_country] => US
[patent_app_date] => 2001-11-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 11
[patent_no_of_words] => 4175
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/753/06753606.pdf
[firstpage_image] =>[orig_patent_app_number] => 09994954
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/994954 | Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy | Nov 26, 2001 | Issued |
Array
(
[id] => 1026227
[patent_doc_number] => 06885423
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-04-26
[patent_title] => 'Method for manufacturing homeotropic alignment liquid crystal film'
[patent_app_type] => utility
[patent_app_number] => 09/990075
[patent_app_country] => US
[patent_app_date] => 2001-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11112
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 147
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/885/06885423.pdf
[firstpage_image] =>[orig_patent_app_number] => 09990075
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/990075 | Method for manufacturing homeotropic alignment liquid crystal film | Nov 20, 2001 | Issued |
Array
(
[id] => 1277871
[patent_doc_number] => 06645836
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-11
[patent_title] => 'Method of forming a semiconductor wafer having a crystalline layer thereon containing silicon, germanium and carbon'
[patent_app_type] => B2
[patent_app_number] => 09/979305
[patent_app_country] => US
[patent_app_date] => 2001-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 10
[patent_no_of_words] => 5159
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/645/06645836.pdf
[firstpage_image] =>[orig_patent_app_number] => 09979305
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/979305 | Method of forming a semiconductor wafer having a crystalline layer thereon containing silicon, germanium and carbon | Nov 20, 2001 | Issued |
Array
(
[id] => 5963322
[patent_doc_number] => 20020088389
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-11
[patent_title] => 'High throughput epitaxial growth by chemical vapor deposition'
[patent_app_type] => new
[patent_app_number] => 10/001716
[patent_app_country] => US
[patent_app_date] => 2001-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3744
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0088/20020088389.pdf
[firstpage_image] =>[orig_patent_app_number] => 10001716
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/001716 | High throughput epitaxial growth by chemical vapor deposition | Nov 14, 2001 | Abandoned |
Array
(
[id] => 5963322
[patent_doc_number] => 20020088389
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-11
[patent_title] => 'High throughput epitaxial growth by chemical vapor deposition'
[patent_app_type] => new
[patent_app_number] => 10/001716
[patent_app_country] => US
[patent_app_date] => 2001-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3744
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0088/20020088389.pdf
[firstpage_image] =>[orig_patent_app_number] => 10001716
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/001716 | High throughput epitaxial growth by chemical vapor deposition | Nov 14, 2001 | Abandoned |
Array
(
[id] => 6860862
[patent_doc_number] => 20030091870
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-05-15
[patent_title] => 'Method of forming a liner for tungsten plugs'
[patent_app_type] => new
[patent_app_number] => 09/999285
[patent_app_country] => US
[patent_app_date] => 2001-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1819
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0091/20030091870.pdf
[firstpage_image] =>[orig_patent_app_number] => 09999285
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/999285 | Method of forming a liner for tungsten plugs | Nov 14, 2001 | Abandoned |
Array
(
[id] => 5919312
[patent_doc_number] => 20020113931
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-22
[patent_title] => 'Liquid crystal display having improved contrast ratio and color reproduction when viewed in the lateral direction'
[patent_app_type] => new
[patent_app_number] => 09/992474
[patent_app_country] => US
[patent_app_date] => 2001-11-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 23
[patent_no_of_words] => 4761
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0113/20020113931.pdf
[firstpage_image] =>[orig_patent_app_number] => 09992474
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/992474 | Liquid crystal display having improved contrast ratio and color reproduction when viewed in the lateral direction | Nov 13, 2001 | Issued |
Array
(
[id] => 6081278
[patent_doc_number] => 20020081861
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-27
[patent_title] => 'Silicon-germanium-carbon compositions and processes thereof'
[patent_app_type] => new
[patent_app_number] => 10/010704
[patent_app_country] => US
[patent_app_date] => 2001-11-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 9175
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0081/20020081861.pdf
[firstpage_image] =>[orig_patent_app_number] => 10010704
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/010704 | Silicon-germanium-carbon compositions and processes thereof | Nov 12, 2001 | Abandoned |
Array
(
[id] => 6530617
[patent_doc_number] => 20020192930
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-19
[patent_title] => 'Method of forming a single crystalline silicon pattern utilizing a structural selective epitaxial growth technique and a selective silicon etching technique'
[patent_app_type] => new
[patent_app_number] => 09/985616
[patent_app_country] => US
[patent_app_date] => 2001-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 2547
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0192/20020192930.pdf
[firstpage_image] =>[orig_patent_app_number] => 09985616
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/985616 | Method of forming a single crystalline silicon pattern utilizing a structural selective epitaxial growth technique and a selective silicon etching technique | Nov 4, 2001 | Abandoned |
Array
(
[id] => 6682861
[patent_doc_number] => 20030118725
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-26
[patent_title] => 'Precursor compounds for metal oxide film deposition and methods of film deposition using the same'
[patent_app_type] => new
[patent_app_number] => 10/002275
[patent_app_country] => US
[patent_app_date] => 2001-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 6409
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0118/20030118725.pdf
[firstpage_image] =>[orig_patent_app_number] => 10002275
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/002275 | Precursor compounds for metal oxide film deposition and methods of film deposition using the same | Nov 1, 2001 | Abandoned |
Array
(
[id] => 5968614
[patent_doc_number] => 20020090834
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-11
[patent_title] => 'Method for depositing silicon dioxide on a substrate surface using hexamethyldisiloxane (HMDSO) as a precursor gas'
[patent_app_type] => new
[patent_app_number] => 09/999015
[patent_app_country] => US
[patent_app_date] => 2001-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1483
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0090/20020090834.pdf
[firstpage_image] =>[orig_patent_app_number] => 09999015
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/999015 | Method for depositing silicon dioxide on a substrate surface using hexamethyldisiloxane (HMDSO) as a precursor gas | Oct 24, 2001 | Abandoned |
Array
(
[id] => 6548613
[patent_doc_number] => 20020111040
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-15
[patent_title] => 'Method and apparatus for manufacturing a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/037865
[patent_app_country] => US
[patent_app_date] => 2001-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 18477
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0111/20020111040.pdf
[firstpage_image] =>[orig_patent_app_number] => 10037865
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/037865 | APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical | Oct 23, 2001 | Issued |
Array
(
[id] => 1196720
[patent_doc_number] => 06727177
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-04-27
[patent_title] => 'Multi-step process for forming a barrier film for use in copper layer formation'
[patent_app_type] => B1
[patent_app_number] => 10/035704
[patent_app_country] => US
[patent_app_date] => 2001-10-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 19
[patent_no_of_words] => 5454
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/727/06727177.pdf
[firstpage_image] =>[orig_patent_app_number] => 10035704
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/035704 | Multi-step process for forming a barrier film for use in copper layer formation | Oct 17, 2001 | Issued |
Array
(
[id] => 6033023
[patent_doc_number] => 20020019125
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-14
[patent_title] => 'Methods of forming materials between conductive electrical components, and insulating materials'
[patent_app_type] => new
[patent_app_number] => 09/976624
[patent_app_country] => US
[patent_app_date] => 2001-10-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4754
[patent_no_of_claims] => 96
[patent_no_of_ind_claims] => 14
[patent_words_short_claim] => 31
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0019/20020019125.pdf
[firstpage_image] =>[orig_patent_app_number] => 09976624
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/976624 | Methods of forming materials between conductive electrical components, and insulating materials | Oct 11, 2001 | Issued |
Array
(
[id] => 6269722
[patent_doc_number] => 20020105081
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-08
[patent_title] => 'Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization'
[patent_app_type] => new
[patent_app_number] => 09/977069
[patent_app_country] => US
[patent_app_date] => 2001-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 2680
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 17
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0105/20020105081.pdf
[firstpage_image] =>[orig_patent_app_number] => 09977069
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/977069 | Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization | Oct 10, 2001 | Abandoned |
Array
(
[id] => 6075844
[patent_doc_number] => 20020079487
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-27
[patent_title] => 'Diffusion barriers comprising a self-assembled monolayer'
[patent_app_type] => new
[patent_app_number] => 09/976927
[patent_app_country] => US
[patent_app_date] => 2001-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2440
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 18
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0079/20020079487.pdf
[firstpage_image] =>[orig_patent_app_number] => 09976927
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/976927 | Diffusion barriers comprising a self-assembled monolayer | Oct 10, 2001 | Abandoned |
Array
(
[id] => 5986472
[patent_doc_number] => 20020098685
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-07-25
[patent_title] => 'In situ reduction of copper oxide prior to silicon carbide deposition'
[patent_app_type] => new
[patent_app_number] => 09/975466
[patent_app_country] => US
[patent_app_date] => 2001-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 6077
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 28
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0098/20020098685.pdf
[firstpage_image] =>[orig_patent_app_number] => 09975466
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/975466 | In situ reduction of copper oxide prior to silicon carbide deposition | Oct 8, 2001 | Issued |