| Application number | Title of the application | Filing Date | Status |
|---|
| 07/097361 | PERFLUOROALKYL GROUP-CONTAINING COMPOUNDS AND REPRODUCTION LAYERS PRODUCED THEREFROM | Sep 7, 1987 | Abandoned |
| 07/091966 | TRANSFER RECORDING MEDIUM AND METHOD OF TRANSFER RECORDING USING THE SAME | Aug 31, 1987 | Abandoned |
Array
(
[id] => 2527515
[patent_doc_number] => 04839253
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-13
[patent_title] => 'Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group'
[patent_app_type] => 1
[patent_app_number] => 7/091328
[patent_app_country] => US
[patent_app_date] => 1987-08-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8611
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 241
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/839/04839253.pdf
[firstpage_image] =>[orig_patent_app_number] => 091328
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/091328 | Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group | Aug 27, 1987 | Issued |
Array
(
[id] => 2523562
[patent_doc_number] => 04873176
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-10-10
[patent_title] => 'Reticulation resistant photoresist coating'
[patent_app_type] => 1
[patent_app_number] => 7/090753
[patent_app_country] => US
[patent_app_date] => 1987-08-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 4445
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 138
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/873/04873176.pdf
[firstpage_image] =>[orig_patent_app_number] => 090753
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/090753 | Reticulation resistant photoresist coating | Aug 27, 1987 | Issued |
| 07/089833 | LIGHT-SENSITIVE COMPOSITION | Aug 26, 1987 | Abandoned |
Array
(
[id] => 2548342
[patent_doc_number] => 04806458
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-02-21
[patent_title] => 'Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate'
[patent_app_type] => 1
[patent_app_number] => 7/064969
[patent_app_country] => US
[patent_app_date] => 1987-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2052
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/806/04806458.pdf
[firstpage_image] =>[orig_patent_app_number] => 064969
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/064969 | Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate | Aug 26, 1987 | Issued |
Array
(
[id] => 2527598
[patent_doc_number] => 04839256
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-13
[patent_title] => 'Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom'
[patent_app_type] => 1
[patent_app_number] => 7/088980
[patent_app_country] => US
[patent_app_date] => 1987-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5349
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 291
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/839/04839256.pdf
[firstpage_image] =>[orig_patent_app_number] => 088980
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/088980 | Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom | Aug 20, 1987 | Issued |
Array
(
[id] => 2490481
[patent_doc_number] => 04842990
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-27
[patent_title] => 'Presensitized negative working waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using'
[patent_app_type] => 1
[patent_app_number] => 7/087619
[patent_app_country] => US
[patent_app_date] => 1987-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4920
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/842/04842990.pdf
[firstpage_image] =>[orig_patent_app_number] => 087619
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/087619 | Presensitized negative working waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using | Aug 19, 1987 | Issued |
Array
(
[id] => 2523436
[patent_doc_number] => 04873169
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-10-10
[patent_title] => 'Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same'
[patent_app_type] => 1
[patent_app_number] => 7/087599
[patent_app_country] => US
[patent_app_date] => 1987-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3115
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/873/04873169.pdf
[firstpage_image] =>[orig_patent_app_number] => 087599
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/087599 | Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same | Aug 19, 1987 | Issued |
Array
(
[id] => 2490442
[patent_doc_number] => 04842988
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-27
[patent_title] => 'Presensitized waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using'
[patent_app_type] => 1
[patent_app_number] => 7/087677
[patent_app_country] => US
[patent_app_date] => 1987-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7812
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/842/04842988.pdf
[firstpage_image] =>[orig_patent_app_number] => 087677
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/087677 | Presensitized waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using | Aug 19, 1987 | Issued |
| 07/087379 | PHOTORESIST ARTICLE HAVING A PORTABLE, CONFORMABLE, BUILT-ON MASK | Aug 19, 1987 | Abandoned |
Array
(
[id] => 2381848
[patent_doc_number] => 04752552
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-06-21
[patent_title] => 'Photosolubilizable composition'
[patent_app_type] => 1
[patent_app_number] => 7/085230
[patent_app_country] => US
[patent_app_date] => 1987-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7285
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 326
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/752/04752552.pdf
[firstpage_image] =>[orig_patent_app_number] => 085230
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/085230 | Photosolubilizable composition | Aug 11, 1987 | Issued |
Array
(
[id] => 2509550
[patent_doc_number] => 04840869
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-20
[patent_title] => 'Light-sensitive composition'
[patent_app_type] => 1
[patent_app_number] => 7/083879
[patent_app_country] => US
[patent_app_date] => 1987-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7106
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/840/04840869.pdf
[firstpage_image] =>[orig_patent_app_number] => 083879
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/083879 | Light-sensitive composition | Aug 9, 1987 | Issued |
Array
(
[id] => 2560997
[patent_doc_number] => 04849323
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-07-18
[patent_title] => 'Pattern forming method using contrast enhanced material'
[patent_app_type] => 1
[patent_app_number] => 7/083199
[patent_app_country] => US
[patent_app_date] => 1987-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 7
[patent_no_of_words] => 3289
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 163
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/849/04849323.pdf
[firstpage_image] =>[orig_patent_app_number] => 083199
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/083199 | Pattern forming method using contrast enhanced material | Aug 9, 1987 | Issued |
Array
(
[id] => 2481067
[patent_doc_number] => 04865945
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-09-12
[patent_title] => 'Positive photoresist material with o-quinone diazide and polymer containing silicon atoms'
[patent_app_type] => 1
[patent_app_number] => 7/083640
[patent_app_country] => US
[patent_app_date] => 1987-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2213
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 221
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/865/04865945.pdf
[firstpage_image] =>[orig_patent_app_number] => 083640
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/083640 | Positive photoresist material with o-quinone diazide and polymer containing silicon atoms | Aug 9, 1987 | Issued |
Array
(
[id] => 2706551
[patent_doc_number] => 05041359
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-08-20
[patent_title] => 'Method for forming a patterned photopolymer coating on a printing roller'
[patent_app_type] => 1
[patent_app_number] => 7/081606
[patent_app_country] => US
[patent_app_date] => 1987-08-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 9
[patent_no_of_words] => 2446
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 266
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/041/05041359.pdf
[firstpage_image] =>[orig_patent_app_number] => 081606
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/081606 | Method for forming a patterned photopolymer coating on a printing roller | Aug 2, 1987 | Issued |
Array
(
[id] => 2559647
[patent_doc_number] => 04853448
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-08-01
[patent_title] => 'Perfluoroalkyl group-containing copolymers'
[patent_app_type] => 1
[patent_app_number] => 7/079404
[patent_app_country] => US
[patent_app_date] => 1987-07-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6446
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 221
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/853/04853448.pdf
[firstpage_image] =>[orig_patent_app_number] => 079404
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/079404 | Perfluoroalkyl group-containing copolymers | Jul 29, 1987 | Issued |
| 07/072120 | OPTICALLY ORIENTED PHOTORESIST AND PATTERN FORMING METHOD USING THE SAME | Jul 9, 1987 | Abandoned |
| 07/069175 | PROCESS FOR FORMING PATTERN | Jul 1, 1987 | Abandoned |
Array
(
[id] => 2525604
[patent_doc_number] => 04797345
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-01-10
[patent_title] => 'Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures'
[patent_app_type] => 1
[patent_app_number] => 7/068397
[patent_app_country] => US
[patent_app_date] => 1987-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3941
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 37
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/797/04797345.pdf
[firstpage_image] =>[orig_patent_app_number] => 068397
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/068397 | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures | Jun 30, 1987 | Issued |