Search

Charles L. Bowers Jr.

Examiner (ID: 18963)

Most Active Art Unit
1506
Art Unit(s)
2203, 2813, 1763, 1104, 1506
Total Applications
883
Issued Applications
647
Pending Applications
4
Abandoned Applications
232

Applications

Application numberTitle of the applicationFiling DateStatus
07/097361 PERFLUOROALKYL GROUP-CONTAINING COMPOUNDS AND REPRODUCTION LAYERS PRODUCED THEREFROM Sep 7, 1987 Abandoned
07/091966 TRANSFER RECORDING MEDIUM AND METHOD OF TRANSFER RECORDING USING THE SAME Aug 31, 1987 Abandoned
Array ( [id] => 2527515 [patent_doc_number] => 04839253 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-13 [patent_title] => 'Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group' [patent_app_type] => 1 [patent_app_number] => 7/091328 [patent_app_country] => US [patent_app_date] => 1987-08-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8611 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 241 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/839/04839253.pdf [firstpage_image] =>[orig_patent_app_number] => 091328 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/091328
Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group Aug 27, 1987 Issued
Array ( [id] => 2523562 [patent_doc_number] => 04873176 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-10-10 [patent_title] => 'Reticulation resistant photoresist coating' [patent_app_type] => 1 [patent_app_number] => 7/090753 [patent_app_country] => US [patent_app_date] => 1987-08-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 4445 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/873/04873176.pdf [firstpage_image] =>[orig_patent_app_number] => 090753 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/090753
Reticulation resistant photoresist coating Aug 27, 1987 Issued
07/089833 LIGHT-SENSITIVE COMPOSITION Aug 26, 1987 Abandoned
Array ( [id] => 2548342 [patent_doc_number] => 04806458 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-02-21 [patent_title] => 'Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate' [patent_app_type] => 1 [patent_app_number] => 7/064969 [patent_app_country] => US [patent_app_date] => 1987-08-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2052 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/806/04806458.pdf [firstpage_image] =>[orig_patent_app_number] => 064969 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/064969
Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate Aug 26, 1987 Issued
Array ( [id] => 2527598 [patent_doc_number] => 04839256 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-13 [patent_title] => 'Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom' [patent_app_type] => 1 [patent_app_number] => 7/088980 [patent_app_country] => US [patent_app_date] => 1987-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5349 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 291 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/839/04839256.pdf [firstpage_image] =>[orig_patent_app_number] => 088980 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/088980
Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom Aug 20, 1987 Issued
Array ( [id] => 2490481 [patent_doc_number] => 04842990 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-27 [patent_title] => 'Presensitized negative working waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using' [patent_app_type] => 1 [patent_app_number] => 7/087619 [patent_app_country] => US [patent_app_date] => 1987-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4920 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/842/04842990.pdf [firstpage_image] =>[orig_patent_app_number] => 087619 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/087619
Presensitized negative working waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using Aug 19, 1987 Issued
Array ( [id] => 2523436 [patent_doc_number] => 04873169 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-10-10 [patent_title] => 'Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same' [patent_app_type] => 1 [patent_app_number] => 7/087599 [patent_app_country] => US [patent_app_date] => 1987-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3115 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/873/04873169.pdf [firstpage_image] =>[orig_patent_app_number] => 087599 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/087599
Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same Aug 19, 1987 Issued
Array ( [id] => 2490442 [patent_doc_number] => 04842988 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-27 [patent_title] => 'Presensitized waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using' [patent_app_type] => 1 [patent_app_number] => 7/087677 [patent_app_country] => US [patent_app_date] => 1987-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7812 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/842/04842988.pdf [firstpage_image] =>[orig_patent_app_number] => 087677 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/087677
Presensitized waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using Aug 19, 1987 Issued
07/087379 PHOTORESIST ARTICLE HAVING A PORTABLE, CONFORMABLE, BUILT-ON MASK Aug 19, 1987 Abandoned
Array ( [id] => 2381848 [patent_doc_number] => 04752552 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-06-21 [patent_title] => 'Photosolubilizable composition' [patent_app_type] => 1 [patent_app_number] => 7/085230 [patent_app_country] => US [patent_app_date] => 1987-08-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7285 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 326 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/752/04752552.pdf [firstpage_image] =>[orig_patent_app_number] => 085230 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/085230
Photosolubilizable composition Aug 11, 1987 Issued
Array ( [id] => 2509550 [patent_doc_number] => 04840869 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-20 [patent_title] => 'Light-sensitive composition' [patent_app_type] => 1 [patent_app_number] => 7/083879 [patent_app_country] => US [patent_app_date] => 1987-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7106 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/840/04840869.pdf [firstpage_image] =>[orig_patent_app_number] => 083879 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/083879
Light-sensitive composition Aug 9, 1987 Issued
Array ( [id] => 2560997 [patent_doc_number] => 04849323 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-07-18 [patent_title] => 'Pattern forming method using contrast enhanced material' [patent_app_type] => 1 [patent_app_number] => 7/083199 [patent_app_country] => US [patent_app_date] => 1987-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 3289 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/849/04849323.pdf [firstpage_image] =>[orig_patent_app_number] => 083199 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/083199
Pattern forming method using contrast enhanced material Aug 9, 1987 Issued
Array ( [id] => 2481067 [patent_doc_number] => 04865945 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-09-12 [patent_title] => 'Positive photoresist material with o-quinone diazide and polymer containing silicon atoms' [patent_app_type] => 1 [patent_app_number] => 7/083640 [patent_app_country] => US [patent_app_date] => 1987-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2213 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 221 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/865/04865945.pdf [firstpage_image] =>[orig_patent_app_number] => 083640 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/083640
Positive photoresist material with o-quinone diazide and polymer containing silicon atoms Aug 9, 1987 Issued
Array ( [id] => 2706551 [patent_doc_number] => 05041359 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-08-20 [patent_title] => 'Method for forming a patterned photopolymer coating on a printing roller' [patent_app_type] => 1 [patent_app_number] => 7/081606 [patent_app_country] => US [patent_app_date] => 1987-08-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 9 [patent_no_of_words] => 2446 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 266 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/041/05041359.pdf [firstpage_image] =>[orig_patent_app_number] => 081606 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/081606
Method for forming a patterned photopolymer coating on a printing roller Aug 2, 1987 Issued
Array ( [id] => 2559647 [patent_doc_number] => 04853448 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-08-01 [patent_title] => 'Perfluoroalkyl group-containing copolymers' [patent_app_type] => 1 [patent_app_number] => 7/079404 [patent_app_country] => US [patent_app_date] => 1987-07-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6446 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 221 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/853/04853448.pdf [firstpage_image] =>[orig_patent_app_number] => 079404 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/079404
Perfluoroalkyl group-containing copolymers Jul 29, 1987 Issued
07/072120 OPTICALLY ORIENTED PHOTORESIST AND PATTERN FORMING METHOD USING THE SAME Jul 9, 1987 Abandoned
07/069175 PROCESS FOR FORMING PATTERN Jul 1, 1987 Abandoned
Array ( [id] => 2525604 [patent_doc_number] => 04797345 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-01-10 [patent_title] => 'Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures' [patent_app_type] => 1 [patent_app_number] => 7/068397 [patent_app_country] => US [patent_app_date] => 1987-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3941 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/797/04797345.pdf [firstpage_image] =>[orig_patent_app_number] => 068397 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/068397
Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures Jun 30, 1987 Issued
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