Charles L. Bowers Jr.

Array ( [id] => 2456103 [patent_doc_number] => 04784936 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-11-15 [patent_title] => 'Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer' [patent_app_type] => 1 [patent_app_number] => 6/905077 [patent_app_country] => US [patent_app_date] => 1986-09-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 2212 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/784/04784936.pdf [firstpage_image] =>[orig_patent_app_number] => 905077 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2414894 [patent_doc_number] => 04746591 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-05-24 [patent_title] => 'Process for producing presensitized lithographic printing plate with liquid honed aluminum support surface' [patent_app_type] => 1 [patent_app_number] => 6/903907 [patent_app_country] => US [patent_app_date] => 1986-09-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4119 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 128 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/746/04746591.pdf [firstpage_image] =>[orig_patent_app_number] => 903907 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2336083 [patent_doc_number] => 04711836 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-12-08 [patent_title] => 'Development of positive-working photoresist compositions' [patent_app_type] => 1 [patent_app_number] => 6/895628 [patent_app_country] => US [patent_app_date] => 1986-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3010 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 136 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/711/04711836.pdf [firstpage_image] =>[orig_patent_app_number] => 895628 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2449757 [patent_doc_number] => 04722883 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-02-02 [patent_title] => 'Process for producing fine patterns' [patent_app_type] => 1 [patent_app_number] => 6/894122 [patent_app_country] => US [patent_app_date] => 1986-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4569 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 248 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/722/04722883.pdf [firstpage_image] =>[orig_patent_app_number] => 894122 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2296710 [patent_doc_number] => 04696891 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-09-29 [patent_title] => 'Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound' [patent_app_type] => 1 [patent_app_number] => 6/892893 [patent_app_country] => US [patent_app_date] => 1986-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3895 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/696/04696891.pdf [firstpage_image] =>[orig_patent_app_number] => 892893 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2412538 [patent_doc_number] => 04731319 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1988-03-15 [patent_title] => 'Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins' [patent_app_type] => 1 [patent_app_number] => 6/886839 [patent_app_country] => US [patent_app_date] => 1986-07-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 3914 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 175 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/731/04731319.pdf [firstpage_image] =>[orig_patent_app_number] => 886839 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2325647 [patent_doc_number] => 04698291 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-10-06 [patent_title] => 'Photosensitive composition with 4-azido-2\'-methoxychalcone' [patent_app_type] => 1 [patent_app_number] => 6/886353 [patent_app_country] => US [patent_app_date] => 1986-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 2360 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/698/04698291.pdf [firstpage_image] =>[orig_patent_app_number] => 886353 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2551389 [patent_doc_number] => 04808508 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-02-28 [patent_title] => 'Negative working color proofing process comprising diazo compound and polyvinyl acetal/polyvinyl alcohol/polyvinyl acetate resin' [patent_app_type] => 1 [patent_app_number] => 6/880770 [patent_app_country] => US [patent_app_date] => 1986-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4368 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 407 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/808/04808508.pdf [firstpage_image] =>[orig_patent_app_number] => 880770 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2554857 [patent_doc_number] => 04816380 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-03-28 [patent_title] => 'Water soluble contrast enhancement layer method of forming resist image on semiconductor chip' [patent_app_type] => 1 [patent_app_number] => 6/879653 [patent_app_country] => US [patent_app_date] => 1986-06-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 3695 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/816/04816380.pdf [firstpage_image] =>[orig_patent_app_number] => 879653 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2354645 [patent_doc_number] => 04650745 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-03-17 [patent_title] => 'Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development' [patent_app_type] => 1 [patent_app_number] => 6/878736 [patent_app_country] => US [patent_app_date] => 1986-06-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4529 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 367 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/650/04650745.pdf [firstpage_image] =>[orig_patent_app_number] => 878736 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2558773 [patent_doc_number] => 04837131 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-06 [patent_title] => 'Developing method for photosensitive material' [patent_app_type] => 1 [patent_app_number] => 6/875480 [patent_app_country] => US [patent_app_date] => 1986-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 4391 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 198 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/837/04837131.pdf [firstpage_image] =>[orig_patent_app_number] => 875480 [rel_patent_id] =>[rel_patent_doc_number] =>)