| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_doc_number] => 04992356
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[patent_issue_date] => 1991-02-12
[patent_title] => 'Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group'
[patent_app_type] => 1
[patent_app_number] => 7/534909
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| 07/497790 | PHOTOSENSITIVE AND HIGH ENERGY BEAM SENSITIVE RESIN COMPOSITION CONTAINING SUBSTITUTED POLYSILOXANE | Mar 20, 1990 | Abandoned |
Array
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[id] => 2692788
[patent_doc_number] => 04996122
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[patent_issue_date] => 1991-02-26
[patent_title] => 'Method of forming resist pattern and thermally stable and highly resolved resist pattern'
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[patent_app_number] => 7/496240
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[patent_app_date] => 1990-03-20
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[firstpage_image] =>[orig_patent_app_number] => 496240
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Array
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[patent_kind] => NA
[patent_issue_date] => 1991-03-05
[patent_title] => 'Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate'
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Array
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[patent_issue_date] => 1991-03-12
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Array
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Array
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Array
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[id] => 2692704
[patent_doc_number] => 04990429
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[patent_kind] => NA
[patent_issue_date] => 1991-02-05
[patent_title] => 'Process for the production of negative relief copies utilizing reversal processing'
[patent_app_type] => 1
[patent_app_number] => 7/423251
[patent_app_country] => US
[patent_app_date] => 1989-10-18
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[pdf_file] => patents/04/990/04990429.pdf
[firstpage_image] =>[orig_patent_app_number] => 423251
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/423251 | Process for the production of negative relief copies utilizing reversal processing | Oct 17, 1989 | Issued |
| 07/421328 | RADIATION-SENSITIVE RESIN COMPOSITION | Oct 12, 1989 | Abandoned |
Array
(
[id] => 2769286
[patent_doc_number] => 04985344
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-01-15
[patent_title] => 'Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer'
[patent_app_type] => 1
[patent_app_number] => 7/423554
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[patent_issue_date] => 1991-01-08
[patent_title] => 'Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/412544 | Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain | Sep 21, 1989 | Issued |
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[patent_issue_date] => 1990-06-12
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Array
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[patent_issue_date] => 1990-07-17
[patent_title] => 'Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers'
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Array
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[id] => 2622800
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| 07/403846 | METHOD OF FORMING IMAGES | Aug 31, 1989 | Abandoned |
| 07/395144 | MULTI-COLOR TRANSFER IMAGE FORMING METHOD | Aug 15, 1989 | Abandoned |
Array
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Array
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