Search

Charles L. Bowers Jr.

Examiner (ID: 4507)

Most Active Art Unit
1506
Art Unit(s)
1506, 2203, 1763, 2813, 1104
Total Applications
883
Issued Applications
647
Pending Applications
4
Abandoned Applications
232

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2704182 [patent_doc_number] => 04992356 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-02-12 [patent_title] => 'Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group' [patent_app_type] => 1 [patent_app_number] => 7/534909 [patent_app_country] => US [patent_app_date] => 1990-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9783 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/992/04992356.pdf [firstpage_image] =>[orig_patent_app_number] => 534909 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/534909
Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group Jun 7, 1990 Issued
07/497790 PHOTOSENSITIVE AND HIGH ENERGY BEAM SENSITIVE RESIN COMPOSITION CONTAINING SUBSTITUTED POLYSILOXANE Mar 20, 1990 Abandoned
Array ( [id] => 2692788 [patent_doc_number] => 04996122 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-02-26 [patent_title] => 'Method of forming resist pattern and thermally stable and highly resolved resist pattern' [patent_app_type] => 1 [patent_app_number] => 7/496240 [patent_app_country] => US [patent_app_date] => 1990-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6179 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 257 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/996/04996122.pdf [firstpage_image] =>[orig_patent_app_number] => 496240 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/496240
Method of forming resist pattern and thermally stable and highly resolved resist pattern Mar 19, 1990 Issued
Array ( [id] => 2732931 [patent_doc_number] => 04997734 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate' [patent_app_type] => 1 [patent_app_number] => 7/454409 [patent_app_country] => US [patent_app_date] => 1989-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4997 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997734.pdf [firstpage_image] =>[orig_patent_app_number] => 454409 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/454409
Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate Dec 20, 1989 Issued
Array ( [id] => 2668194 [patent_doc_number] => 04999266 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-12 [patent_title] => 'Protected color image on substrate with thermal adhesive and antiblocking overlayers' [patent_app_type] => 1 [patent_app_number] => 7/449359 [patent_app_country] => US [patent_app_date] => 1989-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4929 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 213 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/999/04999266.pdf [firstpage_image] =>[orig_patent_app_number] => 449359 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/449359
Protected color image on substrate with thermal adhesive and antiblocking overlayers Dec 5, 1989 Issued
Array ( [id] => 2555486 [patent_doc_number] => 04960671 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-10-02 [patent_title] => 'Stabilized photosensitive screen printing dispersion composition with diazo condensate, polyvinyl alcohol, and copolymer of vinyl acetate and N-methyloc acrylamide' [patent_app_type] => 1 [patent_app_number] => 7/440311 [patent_app_country] => US [patent_app_date] => 1989-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3136 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 198 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/960/04960671.pdf [firstpage_image] =>[orig_patent_app_number] => 440311 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/440311
Stabilized photosensitive screen printing dispersion composition with diazo condensate, polyvinyl alcohol, and copolymer of vinyl acetate and N-methyloc acrylamide Nov 21, 1989 Issued
Array ( [id] => 2742687 [patent_doc_number] => 05002858 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-26 [patent_title] => 'Process for the formation of an image' [patent_app_type] => 1 [patent_app_number] => 7/434599 [patent_app_country] => US [patent_app_date] => 1989-11-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6197 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/002/05002858.pdf [firstpage_image] =>[orig_patent_app_number] => 434599 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/434599
Process for the formation of an image Nov 6, 1989 Issued
Array ( [id] => 2692704 [patent_doc_number] => 04990429 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-02-05 [patent_title] => 'Process for the production of negative relief copies utilizing reversal processing' [patent_app_type] => 1 [patent_app_number] => 7/423251 [patent_app_country] => US [patent_app_date] => 1989-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6347 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 227 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/990/04990429.pdf [firstpage_image] =>[orig_patent_app_number] => 423251 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/423251
Process for the production of negative relief copies utilizing reversal processing Oct 17, 1989 Issued
07/421328 RADIATION-SENSITIVE RESIN COMPOSITION Oct 12, 1989 Abandoned
Array ( [id] => 2769286 [patent_doc_number] => 04985344 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-15 [patent_title] => 'Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer' [patent_app_type] => 1 [patent_app_number] => 7/423554 [patent_app_country] => US [patent_app_date] => 1989-10-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 3103 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 259 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/985/04985344.pdf [firstpage_image] =>[orig_patent_app_number] => 423554 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/423554
Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer Oct 12, 1989 Issued
Array ( [id] => 2669203 [patent_doc_number] => 04983491 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-08 [patent_title] => 'Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain' [patent_app_type] => 1 [patent_app_number] => 7/412544 [patent_app_country] => US [patent_app_date] => 1989-09-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5417 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 189 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/983/04983491.pdf [firstpage_image] =>[orig_patent_app_number] => 412544 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/412544
Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain Sep 21, 1989 Issued
Array ( [id] => 2591740 [patent_doc_number] => 04933257 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-12 [patent_title] => 'Positive quinone diazide photo-resist composition with antistatic agent' [patent_app_type] => 1 [patent_app_number] => 7/408956 [patent_app_country] => US [patent_app_date] => 1989-09-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 2668 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 193 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/933/04933257.pdf [firstpage_image] =>[orig_patent_app_number] => 408956 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/408956
Positive quinone diazide photo-resist composition with antistatic agent Sep 17, 1989 Issued
Array ( [id] => 2557772 [patent_doc_number] => 04942108 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-07-17 [patent_title] => 'Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers' [patent_app_type] => 1 [patent_app_number] => 7/404700 [patent_app_country] => US [patent_app_date] => 1989-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3074 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 195 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/942/04942108.pdf [firstpage_image] =>[orig_patent_app_number] => 404700 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/404700
Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers Sep 7, 1989 Issued
Array ( [id] => 2622800 [patent_doc_number] => 04956261 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-11 [patent_title] => 'Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer' [patent_app_type] => 1 [patent_app_number] => 7/403007 [patent_app_country] => US [patent_app_date] => 1989-09-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9676 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/956/04956261.pdf [firstpage_image] =>[orig_patent_app_number] => 403007 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/403007
Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer Sep 5, 1989 Issued
07/403846 METHOD OF FORMING IMAGES Aug 31, 1989 Abandoned
07/395144 MULTI-COLOR TRANSFER IMAGE FORMING METHOD Aug 15, 1989 Abandoned
Array ( [id] => 2733140 [patent_doc_number] => 04997745 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Photosensitive composition and photopolymerizable composition employing the same' [patent_app_type] => 1 [patent_app_number] => 7/394383 [patent_app_country] => US [patent_app_date] => 1989-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7031 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997745.pdf [firstpage_image] =>[orig_patent_app_number] => 394383 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/394383
Photosensitive composition and photopolymerizable composition employing the same Aug 10, 1989 Issued
Array ( [id] => 2744116 [patent_doc_number] => 04987048 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-22 [patent_title] => 'Image forming material' [patent_app_type] => 1 [patent_app_number] => 7/393069 [patent_app_country] => US [patent_app_date] => 1989-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 4102 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 157 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/987/04987048.pdf [firstpage_image] =>[orig_patent_app_number] => 393069 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/393069
Image forming material Aug 6, 1989 Issued
Array ( [id] => 2742540 [patent_doc_number] => 05002850 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-26 [patent_title] => 'Photosensitive material with alkali-in soluble barrier layer' [patent_app_type] => 1 [patent_app_number] => 7/393103 [patent_app_country] => US [patent_app_date] => 1989-08-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5140 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/002/05002850.pdf [firstpage_image] =>[orig_patent_app_number] => 393103 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/393103
Photosensitive material with alkali-in soluble barrier layer Aug 2, 1989 Issued
Array ( [id] => 2892024 [patent_doc_number] => 05240807 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-31 [patent_title] => 'Photoresist article having a portable, conformable, built-on mask' [patent_app_type] => 1 [patent_app_number] => 7/388769 [patent_app_country] => US [patent_app_date] => 1989-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3893 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 316 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/240/05240807.pdf [firstpage_image] =>[orig_patent_app_number] => 388769 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/388769
Photoresist article having a portable, conformable, built-on mask Aug 1, 1989 Issued
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