| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_title] => 'Deep ultra-violet lithographic resist composition and process of using'
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Array
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[patent_issue_date] => 1986-12-02
[patent_title] => 'Deep ultra-violet lithographic resist composition and process of using'
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Array
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-08-18
[patent_title] => 'Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition'
[patent_app_type] => 1
[patent_app_number] => 6/774165
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| 06/772927 | METHOD FOR MANUFACTURING A PHOSPHOR SCREEN | Sep 4, 1985 | Abandoned |
| 06/772704 | RADIATION-SENSITIVE RECORDING MATERIAL AND PROCESS FOR THE PRODUCTION THEREOF | Sep 4, 1985 | Abandoned |
| 06/768261 | PHOTOSENSITIVE COMPOUNDS FOR THE FABRICATION OF LITHOGRAPHIC PLATES | Aug 21, 1985 | Abandoned |
Array
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[patent_doc_number] => 04661436
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[patent_kind] => NA
[patent_issue_date] => 1987-04-28
[patent_title] => 'Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant'
[patent_app_type] => 1
[patent_app_number] => 6/767318
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[patent_app_date] => 1985-08-19
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Array
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[patent_doc_number] => 04725526
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1988-02-16
[patent_title] => 'Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates'
[patent_app_type] => 1
[patent_app_number] => 6/766691
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 06/766691 | Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates | Aug 18, 1985 | Issued |
| 06/764700 | IMAGE REVERSAL NEGATIVE WORKING PHOTORESIST | Aug 11, 1985 | Abandoned |
Array
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[patent_kind] => NA
[patent_issue_date] => 1987-04-07
[patent_title] => 'Presensitized color-proofing diazo resin sheet with acrylic thermal adhesive layer'
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Array
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[id] => 2644178
[patent_doc_number] => 04980271
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-12-25
[patent_title] => 'Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate'
[patent_app_type] => 1
[patent_app_number] => 6/762602
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[firstpage_image] =>[orig_patent_app_number] => 762602
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/762602 | Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate | Aug 4, 1985 | Issued |
Array
(
[id] => 2346991
[patent_doc_number] => 04649101
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-03-10
[patent_title] => 'Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure'
[patent_app_type] => 1
[patent_app_number] => 6/759572
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Array
(
[id] => 2328395
[patent_doc_number] => 04634652
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[patent_kind] => NA
[patent_issue_date] => 1987-01-06
[patent_title] => 'Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein'
[patent_app_type] => 1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 06/758894 | Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein | Jul 24, 1985 | Issued |
| 06/756579 | METHOD AND APPARATUS FOR AMENDING A PHOTOMASK | Jul 18, 1985 | Abandoned |
| 06/756206 | HIGH CONTRAST PHOTORESIST DEVELOPER WITH ENHANCED SENSITIVITY | Jul 17, 1985 | Abandoned |
| 06/756205 | PRE-EXPOSURE METHOD FOR INCREASED SENSITIVITY IN HIGH CONTRAST RESIST DEVELOPMENT | Jul 17, 1985 | Abandoned |
Array
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[patent_issue_date] => 1987-06-09
[patent_title] => 'Radiation-sensitive printing plates with base which consists of an aluminum alloy having iron and manganese'
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Array
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 06/749665 | Mono-sulfonyl azide composition used to photolytically develop a colored image on a cellulosic material | Jun 27, 1985 | Issued |