| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2317513
[patent_doc_number] => 04686280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-08-11
[patent_title] => 'Positive type resist material with trimethylsilylnitrile'
[patent_app_type] => 1
[patent_app_number] => 6/727395
[patent_app_country] => US
[patent_app_date] => 1985-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 2177
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/686/04686280.pdf
[firstpage_image] =>[orig_patent_app_number] => 727395
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/727395 | Positive type resist material with trimethylsilylnitrile | Apr 24, 1985 | Issued |
| 06/722996 | RADIATION-SENSITIVE COATING AGENT | Apr 14, 1985 | Abandoned |
Array
(
[id] => 2224434
[patent_doc_number] => 04624908
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-11-25
[patent_title] => 'Deep ultra-violet lithographic resist composition and process of using'
[patent_app_type] => 1
[patent_app_number] => 6/723273
[patent_app_country] => US
[patent_app_date] => 1985-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2616
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 262
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/624/04624908.pdf
[firstpage_image] =>[orig_patent_app_number] => 723273
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/723273 | Deep ultra-violet lithographic resist composition and process of using | Apr 14, 1985 | Issued |
Array
(
[id] => 2343994
[patent_doc_number] => 04640884
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-02-03
[patent_title] => 'Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group'
[patent_app_type] => 1
[patent_app_number] => 6/717988
[patent_app_country] => US
[patent_app_date] => 1985-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2302
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 91
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/640/04640884.pdf
[firstpage_image] =>[orig_patent_app_number] => 717988
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/717988 | Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group | Mar 28, 1985 | Issued |
Array
(
[id] => 2281208
[patent_doc_number] => 04601969
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-07-22
[patent_title] => 'High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution'
[patent_app_type] => 1
[patent_app_number] => 6/717254
[patent_app_country] => US
[patent_app_date] => 1985-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 769
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/601/04601969.pdf
[firstpage_image] =>[orig_patent_app_number] => 717254
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/717254 | High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution | Mar 27, 1985 | Issued |
Array
(
[id] => 2301607
[patent_doc_number] => 04673626
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-06-16
[patent_title] => 'Optical recording card with optical recording layers'
[patent_app_type] => 1
[patent_app_number] => 6/716484
[patent_app_country] => US
[patent_app_date] => 1985-03-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 9
[patent_no_of_words] => 15926
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 175
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/673/04673626.pdf
[firstpage_image] =>[orig_patent_app_number] => 716484
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/716484 | Optical recording card with optical recording layers | Mar 26, 1985 | Issued |
| 06/716140 | PRINTING APPARATUS | Mar 25, 1985 | Abandoned |
| 06/713806 | GUMMING SOLUTION FOR USE IN THE BURNING-IN OF OFFSET-PRINTING PLATES AND PROCESS FOR THE PRODUCTION OF AN OFFSET-PRINTING PLATE | Mar 19, 1985 | Abandoned |
Array
(
[id] => 2324001
[patent_doc_number] => 04680244
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-07-14
[patent_title] => 'Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer'
[patent_app_type] => 1
[patent_app_number] => 6/712660
[patent_app_country] => US
[patent_app_date] => 1985-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 14
[patent_no_of_words] => 7668
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/680/04680244.pdf
[firstpage_image] =>[orig_patent_app_number] => 712660
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/712660 | Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer | Mar 17, 1985 | Issued |
Array
(
[id] => 2302387
[patent_doc_number] => 04642283
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-02-10
[patent_title] => 'Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution'
[patent_app_type] => 1
[patent_app_number] => 6/711861
[patent_app_country] => US
[patent_app_date] => 1985-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6117
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 363
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/642/04642283.pdf
[firstpage_image] =>[orig_patent_app_number] => 711861
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/711861 | Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution | Mar 13, 1985 | Issued |
Array
(
[id] => 2243073
[patent_doc_number] => 04576892
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-03-18
[patent_title] => 'Photosensitive materials'
[patent_app_type] => 1
[patent_app_number] => 6/710827
[patent_app_country] => US
[patent_app_date] => 1985-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2346
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/576/04576892.pdf
[firstpage_image] =>[orig_patent_app_number] => 710827
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/710827 | Photosensitive materials | Mar 11, 1985 | Issued |
| 06/710561 | HIGH TEMPERATURE POST EXPOSURE BAKING TREATMENT FOR POSITIVE PHOTORESIST COMPOSITIONS | Mar 10, 1985 | Abandoned |
| 06/710746 | METHOD AND COMPOSITION OF MATTER FOR IMPROVING CONDUCTOR RESOLUTION IN MICROELECTRONIC CIRCUITS | Mar 10, 1985 | Abandoned |
Array
(
[id] => 2244240
[patent_doc_number] => 04632900
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-12-30
[patent_title] => 'Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface'
[patent_app_type] => 1
[patent_app_number] => 6/708998
[patent_app_country] => US
[patent_app_date] => 1985-03-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9989
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 96
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/632/04632900.pdf
[firstpage_image] =>[orig_patent_app_number] => 708998
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/708998 | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface | Mar 6, 1985 | Issued |
Array
(
[id] => 2298182
[patent_doc_number] => 04681833
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-07-21
[patent_title] => 'Light-sensitive negative working composition with diazonium condensate, epoxy resin, and combination of polymers with acrylic groups'
[patent_app_type] => 1
[patent_app_number] => 6/709249
[patent_app_country] => US
[patent_app_date] => 1985-03-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5959
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 240
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/681/04681833.pdf
[firstpage_image] =>[orig_patent_app_number] => 709249
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/709249 | Light-sensitive negative working composition with diazonium condensate, epoxy resin, and combination of polymers with acrylic groups | Mar 6, 1985 | Issued |
Array
(
[id] => 2349692
[patent_doc_number] => 04702992
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-10-27
[patent_title] => 'Method of preparing photoresist material with undercoating of photoextinction agent and condensation product'
[patent_app_type] => 1
[patent_app_number] => 6/708940
[patent_app_country] => US
[patent_app_date] => 1985-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7811
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 169
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/702/04702992.pdf
[firstpage_image] =>[orig_patent_app_number] => 708940
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/708940 | Method of preparing photoresist material with undercoating of photoextinction agent and condensation product | Mar 5, 1985 | Issued |
Array
(
[id] => 2256335
[patent_doc_number] => 04588670
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-05-13
[patent_title] => 'Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist'
[patent_app_type] => 1
[patent_app_number] => 6/706817
[patent_app_country] => US
[patent_app_date] => 1985-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3262
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/588/04588670.pdf
[firstpage_image] =>[orig_patent_app_number] => 706817
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/706817 | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist | Feb 27, 1985 | Issued |
| 06/707110 | RADIATION-POLYMERIZABLE COMPOSITION | Feb 27, 1985 | Abandoned |
Array
(
[id] => 2333231
[patent_doc_number] => 04701399
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1987-10-20
[patent_title] => 'Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole'
[patent_app_type] => 1
[patent_app_number] => 6/705265
[patent_app_country] => US
[patent_app_date] => 1985-02-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7814
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/701/04701399.pdf
[firstpage_image] =>[orig_patent_app_number] => 705265
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/705265 | Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole | Feb 24, 1985 | Issued |
Array
(
[id] => 2275834
[patent_doc_number] => 04581316
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-04-08
[patent_title] => 'Method of forming resist patterns in negative photoresist layer using false pattern'
[patent_app_type] => 1
[patent_app_number] => 6/701810
[patent_app_country] => US
[patent_app_date] => 1985-02-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 11
[patent_no_of_words] => 2709
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 181
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/581/04581316.pdf
[firstpage_image] =>[orig_patent_app_number] => 701810
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/701810 | Method of forming resist patterns in negative photoresist layer using false pattern | Feb 18, 1985 | Issued |