Search

Charles L. Bowers Jr.

Examiner (ID: 18963)

Most Active Art Unit
1506
Art Unit(s)
2203, 2813, 1763, 1104, 1506
Total Applications
883
Issued Applications
647
Pending Applications
4
Abandoned Applications
232

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2317513 [patent_doc_number] => 04686280 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-08-11 [patent_title] => 'Positive type resist material with trimethylsilylnitrile' [patent_app_type] => 1 [patent_app_number] => 6/727395 [patent_app_country] => US [patent_app_date] => 1985-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 2177 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 39 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/686/04686280.pdf [firstpage_image] =>[orig_patent_app_number] => 727395 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/727395
Positive type resist material with trimethylsilylnitrile Apr 24, 1985 Issued
06/722996 RADIATION-SENSITIVE COATING AGENT Apr 14, 1985 Abandoned
Array ( [id] => 2224434 [patent_doc_number] => 04624908 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-11-25 [patent_title] => 'Deep ultra-violet lithographic resist composition and process of using' [patent_app_type] => 1 [patent_app_number] => 6/723273 [patent_app_country] => US [patent_app_date] => 1985-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2616 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 262 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/624/04624908.pdf [firstpage_image] =>[orig_patent_app_number] => 723273 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/723273
Deep ultra-violet lithographic resist composition and process of using Apr 14, 1985 Issued
Array ( [id] => 2343994 [patent_doc_number] => 04640884 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-02-03 [patent_title] => 'Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group' [patent_app_type] => 1 [patent_app_number] => 6/717988 [patent_app_country] => US [patent_app_date] => 1985-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2302 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/640/04640884.pdf [firstpage_image] =>[orig_patent_app_number] => 717988 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/717988
Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group Mar 28, 1985 Issued
Array ( [id] => 2281208 [patent_doc_number] => 04601969 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-07-22 [patent_title] => 'High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution' [patent_app_type] => 1 [patent_app_number] => 6/717254 [patent_app_country] => US [patent_app_date] => 1985-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 769 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/601/04601969.pdf [firstpage_image] =>[orig_patent_app_number] => 717254 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/717254
High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution Mar 27, 1985 Issued
Array ( [id] => 2301607 [patent_doc_number] => 04673626 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-06-16 [patent_title] => 'Optical recording card with optical recording layers' [patent_app_type] => 1 [patent_app_number] => 6/716484 [patent_app_country] => US [patent_app_date] => 1985-03-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 15926 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 175 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/673/04673626.pdf [firstpage_image] =>[orig_patent_app_number] => 716484 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/716484
Optical recording card with optical recording layers Mar 26, 1985 Issued
06/716140 PRINTING APPARATUS Mar 25, 1985 Abandoned
06/713806 GUMMING SOLUTION FOR USE IN THE BURNING-IN OF OFFSET-PRINTING PLATES AND PROCESS FOR THE PRODUCTION OF AN OFFSET-PRINTING PLATE Mar 19, 1985 Abandoned
Array ( [id] => 2324001 [patent_doc_number] => 04680244 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-07-14 [patent_title] => 'Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer' [patent_app_type] => 1 [patent_app_number] => 6/712660 [patent_app_country] => US [patent_app_date] => 1985-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 14 [patent_no_of_words] => 7668 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/680/04680244.pdf [firstpage_image] =>[orig_patent_app_number] => 712660 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/712660
Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer Mar 17, 1985 Issued
Array ( [id] => 2302387 [patent_doc_number] => 04642283 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-02-10 [patent_title] => 'Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution' [patent_app_type] => 1 [patent_app_number] => 6/711861 [patent_app_country] => US [patent_app_date] => 1985-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6117 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 363 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/642/04642283.pdf [firstpage_image] =>[orig_patent_app_number] => 711861 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/711861
Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution Mar 13, 1985 Issued
Array ( [id] => 2243073 [patent_doc_number] => 04576892 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-03-18 [patent_title] => 'Photosensitive materials' [patent_app_type] => 1 [patent_app_number] => 6/710827 [patent_app_country] => US [patent_app_date] => 1985-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2346 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/576/04576892.pdf [firstpage_image] =>[orig_patent_app_number] => 710827 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/710827
Photosensitive materials Mar 11, 1985 Issued
06/710561 HIGH TEMPERATURE POST EXPOSURE BAKING TREATMENT FOR POSITIVE PHOTORESIST COMPOSITIONS Mar 10, 1985 Abandoned
06/710746 METHOD AND COMPOSITION OF MATTER FOR IMPROVING CONDUCTOR RESOLUTION IN MICROELECTRONIC CIRCUITS Mar 10, 1985 Abandoned
Array ( [id] => 2244240 [patent_doc_number] => 04632900 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-12-30 [patent_title] => 'Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface' [patent_app_type] => 1 [patent_app_number] => 6/708998 [patent_app_country] => US [patent_app_date] => 1985-03-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9989 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/632/04632900.pdf [firstpage_image] =>[orig_patent_app_number] => 708998 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/708998
Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface Mar 6, 1985 Issued
Array ( [id] => 2298182 [patent_doc_number] => 04681833 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-07-21 [patent_title] => 'Light-sensitive negative working composition with diazonium condensate, epoxy resin, and combination of polymers with acrylic groups' [patent_app_type] => 1 [patent_app_number] => 6/709249 [patent_app_country] => US [patent_app_date] => 1985-03-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5959 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 240 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/681/04681833.pdf [firstpage_image] =>[orig_patent_app_number] => 709249 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/709249
Light-sensitive negative working composition with diazonium condensate, epoxy resin, and combination of polymers with acrylic groups Mar 6, 1985 Issued
Array ( [id] => 2349692 [patent_doc_number] => 04702992 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-10-27 [patent_title] => 'Method of preparing photoresist material with undercoating of photoextinction agent and condensation product' [patent_app_type] => 1 [patent_app_number] => 6/708940 [patent_app_country] => US [patent_app_date] => 1985-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7811 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 169 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/702/04702992.pdf [firstpage_image] =>[orig_patent_app_number] => 708940 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/708940
Method of preparing photoresist material with undercoating of photoextinction agent and condensation product Mar 5, 1985 Issued
Array ( [id] => 2256335 [patent_doc_number] => 04588670 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-05-13 [patent_title] => 'Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist' [patent_app_type] => 1 [patent_app_number] => 6/706817 [patent_app_country] => US [patent_app_date] => 1985-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3262 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/588/04588670.pdf [firstpage_image] =>[orig_patent_app_number] => 706817 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/706817
Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist Feb 27, 1985 Issued
06/707110 RADIATION-POLYMERIZABLE COMPOSITION Feb 27, 1985 Abandoned
Array ( [id] => 2333231 [patent_doc_number] => 04701399 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1987-10-20 [patent_title] => 'Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole' [patent_app_type] => 1 [patent_app_number] => 6/705265 [patent_app_country] => US [patent_app_date] => 1985-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7814 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 120 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/701/04701399.pdf [firstpage_image] =>[orig_patent_app_number] => 705265 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/705265
Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole Feb 24, 1985 Issued
Array ( [id] => 2275834 [patent_doc_number] => 04581316 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-04-08 [patent_title] => 'Method of forming resist patterns in negative photoresist layer using false pattern' [patent_app_type] => 1 [patent_app_number] => 6/701810 [patent_app_country] => US [patent_app_date] => 1985-02-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 11 [patent_no_of_words] => 2709 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 181 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/581/04581316.pdf [firstpage_image] =>[orig_patent_app_number] => 701810 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/701810
Method of forming resist patterns in negative photoresist layer using false pattern Feb 18, 1985 Issued
Menu