| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2243085
[patent_doc_number] => 04576893
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-03-18
[patent_title] => 'Presensitized lithographic printing plate precursor'
[patent_app_type] => 1
[patent_app_number] => 6/622597
[patent_app_country] => US
[patent_app_date] => 1984-06-20
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[firstpage_image] =>[orig_patent_app_number] => 622597
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/622597 | Presensitized lithographic printing plate precursor | Jun 19, 1984 | Issued |
Array
(
[id] => 2228981
[patent_doc_number] => 04571373
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-02-18
[patent_title] => 'Exposure latitude improvement in printing positive-acting color pre-press proofs'
[patent_app_type] => 1
[patent_app_number] => 6/619001
[patent_app_country] => US
[patent_app_date] => 1984-06-11
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[pdf_file] => patents/04/571/04571373.pdf
[firstpage_image] =>[orig_patent_app_number] => 619001
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/619001 | Exposure latitude improvement in printing positive-acting color pre-press proofs | Jun 10, 1984 | Issued |
Array
(
[id] => 2151383
[patent_doc_number] => 04550069
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1985-10-29
[patent_title] => 'Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate'
[patent_app_type] => 1
[patent_app_number] => 6/619468
[patent_app_country] => US
[patent_app_date] => 1984-06-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/04/550/04550069.pdf
[firstpage_image] =>[orig_patent_app_number] => 619468
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/619468 | Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate | Jun 10, 1984 | Issued |
| 06/619000 | PRESENSITIZED DIAZO COLOR-PROOFING SHEET WITH THERMAL LAMINABLE ADHESIVE LAYER OF ACRYLIC POLYMER OR COPOLYMER | Jun 10, 1984 | Abandoned |
| 06/618586 | LITHOGRAPHIC LIGHT TRAP AND PROCESS | Jun 7, 1984 | Abandoned |
Array
(
[id] => 2241348
[patent_doc_number] => 04617250
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-10-14
[patent_title] => 'Light-sensitive diazo composition with acidic compounds for use with lithographic printing plates'
[patent_app_type] => 1
[patent_app_number] => 6/616040
[patent_app_country] => US
[patent_app_date] => 1984-06-01
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[pdf_file] => patents/04/617/04617250.pdf
[firstpage_image] =>[orig_patent_app_number] => 616040
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/616040 | Light-sensitive diazo composition with acidic compounds for use with lithographic printing plates | May 31, 1984 | Issued |
Array
(
[id] => 2270524
[patent_doc_number] => 04565768
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-01-21
[patent_title] => 'Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern'
[patent_app_type] => 1
[patent_app_number] => 6/615749
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[patent_app_date] => 1984-05-31
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[firstpage_image] =>[orig_patent_app_number] => 615749
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/615749 | Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern | May 30, 1984 | Issued |
Array
(
[id] => 2277656
[patent_doc_number] => 04610953
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-09-09
[patent_title] => 'Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide'
[patent_app_type] => 1
[patent_app_number] => 6/614908
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[firstpage_image] =>[orig_patent_app_number] => 614908
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/614908 | Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide | May 28, 1984 | Issued |
Array
(
[id] => 2233452
[patent_doc_number] => 04600679
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-07-15
[patent_title] => 'Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer'
[patent_app_type] => 1
[patent_app_number] => 6/613823
[patent_app_country] => US
[patent_app_date] => 1984-05-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/04/600/04600679.pdf
[firstpage_image] =>[orig_patent_app_number] => 613823
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/613823 | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer | May 24, 1984 | Issued |
Array
(
[id] => 2229006
[patent_doc_number] => 04571375
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-02-18
[patent_title] => 'Ring-opened polynorbornene negative photoresist with bisazide'
[patent_app_type] => 1
[patent_app_number] => 6/613550
[patent_app_country] => US
[patent_app_date] => 1984-05-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/04/571/04571375.pdf
[firstpage_image] =>[orig_patent_app_number] => 613550
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/613550 | Ring-opened polynorbornene negative photoresist with bisazide | May 23, 1984 | Issued |
Array
(
[id] => 2256316
[patent_doc_number] => 04588669
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-05-13
[patent_title] => 'Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer'
[patent_app_type] => 1
[patent_app_number] => 6/608457
[patent_app_country] => US
[patent_app_date] => 1984-05-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/04/588/04588669.pdf
[firstpage_image] =>[orig_patent_app_number] => 608457
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/608457 | Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer | May 8, 1984 | Issued |
| 06/608165 | PROCESS FOR PRODUCING FINE PATTERNS | May 7, 1984 | Abandoned |
Array
(
[id] => 2216411
[patent_doc_number] => 04614706
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-09-30
[patent_title] => 'Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching'
[patent_app_type] => 1
[patent_app_number] => 6/606216
[patent_app_country] => US
[patent_app_date] => 1984-05-02
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[pdf_file] => patents/04/614/04614706.pdf
[firstpage_image] =>[orig_patent_app_number] => 606216
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/606216 | Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching | May 1, 1984 | Issued |
Array
(
[id] => 2243180
[patent_doc_number] => 04576899
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-03-18
[patent_title] => 'Method for enhancing apparent photospeed of diazonium plates by using thiocyanate to insolubilize diazonium compound after photolysis'
[patent_app_type] => 1
[patent_app_number] => 6/605796
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 605796
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/605796 | Method for enhancing apparent photospeed of diazonium plates by using thiocyanate to insolubilize diazonium compound after photolysis | Apr 30, 1984 | Issued |
Array
(
[id] => 2184367
[patent_doc_number] => 04555468
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[patent_kind] => NA
[patent_issue_date] => 1985-11-26
[patent_title] => 'Photosensitive diazonium material with precoat of graft polymer prepared by grafting cellulose derivation with radical polymerizable monomer'
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Array
(
[id] => 2236272
[patent_doc_number] => 04585687
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-04-29
[patent_title] => 'Copolyester primed polyester film'
[patent_app_type] => 1
[patent_app_number] => 6/605434
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[patent_app_date] => 1984-04-30
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[firstpage_image] =>[orig_patent_app_number] => 605434
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/605434 | Copolyester primed polyester film | Apr 29, 1984 | Issued |
Array
(
[id] => 2244046
[patent_doc_number] => 04568631
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-02-04
[patent_title] => 'Process for delineating photoresist lines at pattern edges only using image reversal composition with diazoquinone'
[patent_app_type] => 1
[patent_app_number] => 6/605088
[patent_app_country] => US
[patent_app_date] => 1984-04-30
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[rel_patent_id] =>[rel_patent_doc_number] =>) 06/605088 | Process for delineating photoresist lines at pattern edges only using image reversal composition with diazoquinone | Apr 29, 1984 | Issued |
Array
(
[id] => 2270499
[patent_doc_number] => 04565767
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-01-21
[patent_title] => 'Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound'
[patent_app_type] => 1
[patent_app_number] => 6/603451
[patent_app_country] => US
[patent_app_date] => 1984-04-24
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[rel_patent_id] =>[rel_patent_doc_number] =>) 06/603451 | Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound | Apr 23, 1984 | Issued |
| 06/601321 | 4'-AZIDOBENZAL-2-METHOXYACETOPHENONE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE COMPOSITION CONTAINING THE SAME | Apr 16, 1984 | Abandoned |
Array
(
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[patent_doc_number] => 04560636
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[patent_issue_date] => 1985-12-24
[patent_title] => 'Light-sensitive, positive-working copying material having a rough surface provided by pigments in light-sensitive layer'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 06/599816 | Light-sensitive, positive-working copying material having a rough surface provided by pigments in light-sensitive layer | Apr 12, 1984 | Issued |