Search

Charles L. Bowers Jr.

Examiner (ID: 18963)

Most Active Art Unit
1506
Art Unit(s)
2203, 2813, 1763, 1104, 1506
Total Applications
883
Issued Applications
647
Pending Applications
4
Abandoned Applications
232

Applications

Application numberTitle of the applicationFiling DateStatus
06/596113 POSITIVE PHOTORESIST DEVELOPER CONTAINING DEVELOPMENT MODIFIERS Apr 1, 1984 Abandoned
06/594432 WATER-SOLUBLE PHOTOSENSITIVE MATERIALS Mar 28, 1984 Abandoned
Array ( [id] => 2221456 [patent_doc_number] => 04609615 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-09-02 [patent_title] => 'Process for forming pattern with negative resist using quinone diazide compound' [patent_app_type] => 1 [patent_app_number] => 6/594481 [patent_app_country] => US [patent_app_date] => 1984-03-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 7284 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/609/04609615.pdf [firstpage_image] =>[orig_patent_app_number] => 594481 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/594481
Process for forming pattern with negative resist using quinone diazide compound Mar 26, 1984 Issued
06/593091 LIGHT-SENSITIVE, DIAZONIUM GROUP-CONTAINING POLYCONDENSATION PRODUCT, PROCESS FOR ITS PRODUCTION, AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THIS POLYCONDENSATION PRODUCT Mar 25, 1984 Abandoned
Array ( [id] => 2241193 [patent_doc_number] => 04567132 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-01-28 [patent_title] => 'Multi-level resist image reversal lithography process' [patent_app_type] => 1 [patent_app_number] => 6/590092 [patent_app_country] => US [patent_app_date] => 1984-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 14 [patent_no_of_words] => 6185 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 267 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/567/04567132.pdf [firstpage_image] =>[orig_patent_app_number] => 590092 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/590092
Multi-level resist image reversal lithography process Mar 15, 1984 Issued
Array ( [id] => 2149895 [patent_doc_number] => 04539285 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-09-03 [patent_title] => 'Photosensitive negative diazo composition with two acrylic polymers for photolithography' [patent_app_type] => 1 [patent_app_number] => 6/589434 [patent_app_country] => US [patent_app_date] => 1984-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2530 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 288 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/539/04539285.pdf [firstpage_image] =>[orig_patent_app_number] => 589434 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/589434
Photosensitive negative diazo composition with two acrylic polymers for photolithography Mar 13, 1984 Issued
06/586539 POSITIVE TYPE PHOTORESIST COMPOSITION Mar 4, 1984 Abandoned
Array ( [id] => 2242356 [patent_doc_number] => 04622284 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-11-11 [patent_title] => 'Process of using metal azide recording media with laser' [patent_app_type] => 1 [patent_app_number] => 6/585175 [patent_app_country] => US [patent_app_date] => 1984-03-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 4832 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 134 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/622/04622284.pdf [firstpage_image] =>[orig_patent_app_number] => 585175 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/585175
Process of using metal azide recording media with laser Feb 29, 1984 Issued
06/584924 PHOTOSENSITIVE COMPOSITIONS Feb 28, 1984 Abandoned
Array ( [id] => 2203883 [patent_doc_number] => 04544619 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-10-01 [patent_title] => 'Photosensitive laminate' [patent_app_type] => 1 [patent_app_number] => 6/584775 [patent_app_country] => US [patent_app_date] => 1984-02-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 3786 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 186 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/544/04544619.pdf [firstpage_image] =>[orig_patent_app_number] => 584775 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/584775
Photosensitive laminate Feb 28, 1984 Issued
Array ( [id] => 2254123 [patent_doc_number] => 04590143 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-05-20 [patent_title] => 'Two-component diazotype material with diazonium salt with anion of benzene or toluene sulfonate' [patent_app_type] => 1 [patent_app_number] => 6/584546 [patent_app_country] => US [patent_app_date] => 1984-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4892 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 132 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/590/04590143.pdf [firstpage_image] =>[orig_patent_app_number] => 584546 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/584546
Two-component diazotype material with diazonium salt with anion of benzene or toluene sulfonate Feb 27, 1984 Issued
Array ( [id] => 2166917 [patent_doc_number] => 04540648 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1985-09-10 [patent_title] => 'Two-component diazotype material with ultraviolet light-absorbing dye salt of a benzothiazole' [patent_app_type] => 1 [patent_app_number] => 6/584547 [patent_app_country] => US [patent_app_date] => 1984-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 7176 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 139 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/540/04540648.pdf [firstpage_image] =>[orig_patent_app_number] => 584547 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/584547
Two-component diazotype material with ultraviolet light-absorbing dye salt of a benzothiazole Feb 27, 1984 Issued
06/578500 LIGHT-SENSITIVE COMPOSITION Feb 8, 1984 Abandoned
Array ( [id] => 2285746 [patent_doc_number] => 04587197 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-05-06 [patent_title] => 'Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150.degree. C.' [patent_app_type] => 1 [patent_app_number] => 6/578058 [patent_app_country] => US [patent_app_date] => 1984-02-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5536 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 224 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/587/04587197.pdf [firstpage_image] =>[orig_patent_app_number] => 578058 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/578058
Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150.degree. C. Feb 7, 1984 Issued
Array ( [id] => 2261035 [patent_doc_number] => 04564575 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-01-14 [patent_title] => 'Tailoring of novolak and diazoquinone positive resists by acylation of novolak' [patent_app_type] => 1 [patent_app_number] => 6/560781 [patent_app_country] => US [patent_app_date] => 1984-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3380 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/564/04564575.pdf [firstpage_image] =>[orig_patent_app_number] => 560781 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/560781
Tailoring of novolak and diazoquinone positive resists by acylation of novolak Jan 29, 1984 Issued
Array ( [id] => 2233515 [patent_doc_number] => 04600684 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-07-15 [patent_title] => 'Process for forming a negative resist using high energy beam' [patent_app_type] => 1 [patent_app_number] => 6/574363 [patent_app_country] => US [patent_app_date] => 1984-01-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2967 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/600/04600684.pdf [firstpage_image] =>[orig_patent_app_number] => 574363 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/574363
Process for forming a negative resist using high energy beam Jan 26, 1984 Issued
Array ( [id] => 2262069 [patent_doc_number] => 04569897 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-02-11 [patent_title] => 'Negative photoresist compositions with polyglutarimide polymer' [patent_app_type] => 1 [patent_app_number] => 6/571053 [patent_app_country] => US [patent_app_date] => 1984-01-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5279 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/569/04569897.pdf [firstpage_image] =>[orig_patent_app_number] => 571053 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/571053
Negative photoresist compositions with polyglutarimide polymer Jan 15, 1984 Issued
Array ( [id] => 2261199 [patent_doc_number] => 04564584 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-01-14 [patent_title] => 'Photoresist lift-off process for fabricating semiconductor devices' [patent_app_type] => 1 [patent_app_number] => 6/567034 [patent_app_country] => US [patent_app_date] => 1983-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 17 [patent_no_of_words] => 5145 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 270 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/564/04564584.pdf [firstpage_image] =>[orig_patent_app_number] => 567034 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/567034
Photoresist lift-off process for fabricating semiconductor devices Dec 29, 1983 Issued
Array ( [id] => 2124122 [patent_doc_number] => 04477553 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1984-10-16 [patent_title] => 'Photosensitive compositions' [patent_app_type] => 1 [patent_app_number] => 6/566778 [patent_app_country] => US [patent_app_date] => 1983-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7619 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 230 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/477/04477553.pdf [firstpage_image] =>[orig_patent_app_number] => 566778 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/566778
Photosensitive compositions Dec 28, 1983 Issued
Array ( [id] => 2278313 [patent_doc_number] => 04606995 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1986-08-19 [patent_title] => 'Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound' [patent_app_type] => 1 [patent_app_number] => 6/566454 [patent_app_country] => US [patent_app_date] => 1983-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4535 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 220 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/606/04606995.pdf [firstpage_image] =>[orig_patent_app_number] => 566454 [rel_patent_id] =>[rel_patent_doc_number] =>)
06/566454
Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound Dec 27, 1983 Issued
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