| Application number | Title of the application | Filing Date | Status |
|---|
| 06/596113 | POSITIVE PHOTORESIST DEVELOPER CONTAINING DEVELOPMENT MODIFIERS | Apr 1, 1984 | Abandoned |
| 06/594432 | WATER-SOLUBLE PHOTOSENSITIVE MATERIALS | Mar 28, 1984 | Abandoned |
Array
(
[id] => 2221456
[patent_doc_number] => 04609615
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-09-02
[patent_title] => 'Process for forming pattern with negative resist using quinone diazide compound'
[patent_app_type] => 1
[patent_app_number] => 6/594481
[patent_app_country] => US
[patent_app_date] => 1984-03-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 7284
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/609/04609615.pdf
[firstpage_image] =>[orig_patent_app_number] => 594481
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/594481 | Process for forming pattern with negative resist using quinone diazide compound | Mar 26, 1984 | Issued |
| 06/593091 | LIGHT-SENSITIVE, DIAZONIUM GROUP-CONTAINING POLYCONDENSATION PRODUCT, PROCESS FOR ITS PRODUCTION, AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THIS POLYCONDENSATION PRODUCT | Mar 25, 1984 | Abandoned |
Array
(
[id] => 2241193
[patent_doc_number] => 04567132
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-01-28
[patent_title] => 'Multi-level resist image reversal lithography process'
[patent_app_type] => 1
[patent_app_number] => 6/590092
[patent_app_country] => US
[patent_app_date] => 1984-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 14
[patent_no_of_words] => 6185
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 267
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/567/04567132.pdf
[firstpage_image] =>[orig_patent_app_number] => 590092
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/590092 | Multi-level resist image reversal lithography process | Mar 15, 1984 | Issued |
Array
(
[id] => 2149895
[patent_doc_number] => 04539285
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1985-09-03
[patent_title] => 'Photosensitive negative diazo composition with two acrylic polymers for photolithography'
[patent_app_type] => 1
[patent_app_number] => 6/589434
[patent_app_country] => US
[patent_app_date] => 1984-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2530
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 288
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/539/04539285.pdf
[firstpage_image] =>[orig_patent_app_number] => 589434
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/589434 | Photosensitive negative diazo composition with two acrylic polymers for photolithography | Mar 13, 1984 | Issued |
| 06/586539 | POSITIVE TYPE PHOTORESIST COMPOSITION | Mar 4, 1984 | Abandoned |
Array
(
[id] => 2242356
[patent_doc_number] => 04622284
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-11-11
[patent_title] => 'Process of using metal azide recording media with laser'
[patent_app_type] => 1
[patent_app_number] => 6/585175
[patent_app_country] => US
[patent_app_date] => 1984-03-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 4832
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 134
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/622/04622284.pdf
[firstpage_image] =>[orig_patent_app_number] => 585175
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/585175 | Process of using metal azide recording media with laser | Feb 29, 1984 | Issued |
| 06/584924 | PHOTOSENSITIVE COMPOSITIONS | Feb 28, 1984 | Abandoned |
Array
(
[id] => 2203883
[patent_doc_number] => 04544619
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1985-10-01
[patent_title] => 'Photosensitive laminate'
[patent_app_type] => 1
[patent_app_number] => 6/584775
[patent_app_country] => US
[patent_app_date] => 1984-02-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 3786
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 186
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/544/04544619.pdf
[firstpage_image] =>[orig_patent_app_number] => 584775
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/584775 | Photosensitive laminate | Feb 28, 1984 | Issued |
Array
(
[id] => 2254123
[patent_doc_number] => 04590143
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-05-20
[patent_title] => 'Two-component diazotype material with diazonium salt with anion of benzene or toluene sulfonate'
[patent_app_type] => 1
[patent_app_number] => 6/584546
[patent_app_country] => US
[patent_app_date] => 1984-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4892
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/590/04590143.pdf
[firstpage_image] =>[orig_patent_app_number] => 584546
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/584546 | Two-component diazotype material with diazonium salt with anion of benzene or toluene sulfonate | Feb 27, 1984 | Issued |
Array
(
[id] => 2166917
[patent_doc_number] => 04540648
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1985-09-10
[patent_title] => 'Two-component diazotype material with ultraviolet light-absorbing dye salt of a benzothiazole'
[patent_app_type] => 1
[patent_app_number] => 6/584547
[patent_app_country] => US
[patent_app_date] => 1984-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 7176
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 139
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/540/04540648.pdf
[firstpage_image] =>[orig_patent_app_number] => 584547
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/584547 | Two-component diazotype material with ultraviolet light-absorbing dye salt of a benzothiazole | Feb 27, 1984 | Issued |
| 06/578500 | LIGHT-SENSITIVE COMPOSITION | Feb 8, 1984 | Abandoned |
Array
(
[id] => 2285746
[patent_doc_number] => 04587197
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-05-06
[patent_title] => 'Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150.degree. C.'
[patent_app_type] => 1
[patent_app_number] => 6/578058
[patent_app_country] => US
[patent_app_date] => 1984-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5536
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 224
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/587/04587197.pdf
[firstpage_image] =>[orig_patent_app_number] => 578058
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/578058 | Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150.degree. C. | Feb 7, 1984 | Issued |
Array
(
[id] => 2261035
[patent_doc_number] => 04564575
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-01-14
[patent_title] => 'Tailoring of novolak and diazoquinone positive resists by acylation of novolak'
[patent_app_type] => 1
[patent_app_number] => 6/560781
[patent_app_country] => US
[patent_app_date] => 1984-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 3380
[patent_no_of_claims] => 39
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/564/04564575.pdf
[firstpage_image] =>[orig_patent_app_number] => 560781
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/560781 | Tailoring of novolak and diazoquinone positive resists by acylation of novolak | Jan 29, 1984 | Issued |
Array
(
[id] => 2233515
[patent_doc_number] => 04600684
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-07-15
[patent_title] => 'Process for forming a negative resist using high energy beam'
[patent_app_type] => 1
[patent_app_number] => 6/574363
[patent_app_country] => US
[patent_app_date] => 1984-01-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2967
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/600/04600684.pdf
[firstpage_image] =>[orig_patent_app_number] => 574363
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/574363 | Process for forming a negative resist using high energy beam | Jan 26, 1984 | Issued |
Array
(
[id] => 2262069
[patent_doc_number] => 04569897
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-02-11
[patent_title] => 'Negative photoresist compositions with polyglutarimide polymer'
[patent_app_type] => 1
[patent_app_number] => 6/571053
[patent_app_country] => US
[patent_app_date] => 1984-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5279
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 158
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/569/04569897.pdf
[firstpage_image] =>[orig_patent_app_number] => 571053
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/571053 | Negative photoresist compositions with polyglutarimide polymer | Jan 15, 1984 | Issued |
Array
(
[id] => 2261199
[patent_doc_number] => 04564584
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-01-14
[patent_title] => 'Photoresist lift-off process for fabricating semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 6/567034
[patent_app_country] => US
[patent_app_date] => 1983-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 17
[patent_no_of_words] => 5145
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 270
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/564/04564584.pdf
[firstpage_image] =>[orig_patent_app_number] => 567034
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/567034 | Photoresist lift-off process for fabricating semiconductor devices | Dec 29, 1983 | Issued |
Array
(
[id] => 2124122
[patent_doc_number] => 04477553
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1984-10-16
[patent_title] => 'Photosensitive compositions'
[patent_app_type] => 1
[patent_app_number] => 6/566778
[patent_app_country] => US
[patent_app_date] => 1983-12-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7619
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 230
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/477/04477553.pdf
[firstpage_image] =>[orig_patent_app_number] => 566778
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/566778 | Photosensitive compositions | Dec 28, 1983 | Issued |
Array
(
[id] => 2278313
[patent_doc_number] => 04606995
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1986-08-19
[patent_title] => 'Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound'
[patent_app_type] => 1
[patent_app_number] => 6/566454
[patent_app_country] => US
[patent_app_date] => 1983-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4535
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 220
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/606/04606995.pdf
[firstpage_image] =>[orig_patent_app_number] => 566454
[rel_patent_id] =>[rel_patent_doc_number] =>) 06/566454 | Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound | Dec 27, 1983 | Issued |