Charles L. Bowers Jr.

Array ( [id] => 2631560 [patent_doc_number] => 04957846 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-18 [patent_title] => 'Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group' [patent_app_type] => 1 [patent_app_number] => 7/290009 [patent_app_country] => US [patent_app_date] => 1988-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9776 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/957/04957846.pdf [firstpage_image] =>[orig_patent_app_number] => 290009 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2733084 [patent_doc_number] => 04997742 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol' [patent_app_type] => 1 [patent_app_number] => 7/267151 [patent_app_country] => US [patent_app_date] => 1988-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 5 [patent_no_of_words] => 3690 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997742.pdf [firstpage_image] =>[orig_patent_app_number] => 267151 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2631577 [patent_doc_number] => 04957847 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-18 [patent_title] => 'Heat-sensitive cyclic diazo compound containing recording material with benzotriazine compound and coupling component' [patent_app_type] => 1 [patent_app_number] => 7/278989 [patent_app_country] => US [patent_app_date] => 1988-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2246 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 247 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/957/04957847.pdf [firstpage_image] =>[orig_patent_app_number] => 278989 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2697299 [patent_doc_number] => 04988601 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-01-29 [patent_title] => 'Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol' [patent_app_type] => 1 [patent_app_number] => 7/275967 [patent_app_country] => US [patent_app_date] => 1988-11-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8232 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/988/04988601.pdf [firstpage_image] =>[orig_patent_app_number] => 275967 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2733159 [patent_doc_number] => 04997746 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-03-05 [patent_title] => 'Method of forming conductive lines and studs' [patent_app_type] => 1 [patent_app_number] => 7/274895 [patent_app_country] => US [patent_app_date] => 1988-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 20 [patent_no_of_words] => 5177 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/997/04997746.pdf [firstpage_image] =>[orig_patent_app_number] => 274895 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2600340 [patent_doc_number] => 04931380 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-05 [patent_title] => 'Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist' [patent_app_type] => 1 [patent_app_number] => 7/274648 [patent_app_country] => US [patent_app_date] => 1988-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2701 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 264 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/931/04931380.pdf [firstpage_image] =>[orig_patent_app_number] => 274648 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2622819 [patent_doc_number] => 04956262 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-11 [patent_title] => 'Photosensitive printing plate for waterless offset printing with photosensitive layer of diazonium salt polycondensation product and photopolymerizable composition and overlying silicone rubber layer' [patent_app_type] => 1 [patent_app_number] => 7/270343 [patent_app_country] => US [patent_app_date] => 1988-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4032 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 210 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/956/04956262.pdf [firstpage_image] =>[orig_patent_app_number] => 270343 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2595293 [patent_doc_number] => 04965167 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-10-23 [patent_title] => 'Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent' [patent_app_type] => 1 [patent_app_number] => 7/269521 [patent_app_country] => US [patent_app_date] => 1988-11-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5380 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/965/04965167.pdf [firstpage_image] =>[orig_patent_app_number] => 269521 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2654656 [patent_doc_number] => 04929536 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-05-29 [patent_title] => 'Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing' [patent_app_type] => 1 [patent_app_number] => 7/268639 [patent_app_country] => US [patent_app_date] => 1988-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9409 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 473 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/929/04929536.pdf [firstpage_image] =>[orig_patent_app_number] => 268639 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2600360 [patent_doc_number] => 04931381 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-05 [patent_title] => 'Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment' [patent_app_type] => 1 [patent_app_number] => 7/268640 [patent_app_country] => US [patent_app_date] => 1988-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7445 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 373 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/931/04931381.pdf [firstpage_image] =>[orig_patent_app_number] => 268640 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2600136 [patent_doc_number] => 04912013 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-03-27 [patent_title] => 'Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent' [patent_app_type] => 1 [patent_app_number] => 7/268632 [patent_app_country] => US [patent_app_date] => 1988-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6066 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 269 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/912/04912013.pdf [firstpage_image] =>[orig_patent_app_number] => 268632 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2595334 [patent_doc_number] => 04975351 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-12-04 [patent_title] => 'Positive-type photosensitive electrodeposition coating composition with o-quinone diazide sulfonyl amide polymer' [patent_app_type] => 1 [patent_app_number] => 7/268547 [patent_app_country] => US [patent_app_date] => 1988-11-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7335 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/975/04975351.pdf [firstpage_image] =>[orig_patent_app_number] => 268547 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2721919 [patent_doc_number] => 05024922 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-06-18 [patent_title] => 'Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake' [patent_app_type] => 1 [patent_app_number] => 7/268023 [patent_app_country] => US [patent_app_date] => 1988-11-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 5484 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/024/05024922.pdf [firstpage_image] =>[orig_patent_app_number] => 268023 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2600313 [patent_doc_number] => 04931379 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-05 [patent_title] => 'High sensitivity resists having autodecomposition temperatures greater than about 160.degree. C.' [patent_app_type] => 1 [patent_app_number] => 7/267738 [patent_app_country] => US [patent_app_date] => 1988-11-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 4768 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/931/04931379.pdf [firstpage_image] =>[orig_patent_app_number] => 267738 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2588493 [patent_doc_number] => 04959293 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-25 [patent_title] => 'Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents' [patent_app_type] => 1 [patent_app_number] => 7/264335 [patent_app_country] => US [patent_app_date] => 1988-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5385 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/959/04959293.pdf [firstpage_image] =>[orig_patent_app_number] => 264335 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 2660739 [patent_doc_number] => 04946757 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-08-07 [patent_title] => 'Positive type 1,2 quinone diazide containing photosensitive resinous composition with acrylic copolymer resin' [patent_app_type] => 1 [patent_app_number] => 7/255191 [patent_app_country] => US [patent_app_date] => 1988-10-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5502 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 347 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/946/04946757.pdf [firstpage_image] =>[orig_patent_app_number] => 255191 [rel_patent_id] =>[rel_patent_doc_number] =>)