| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_doc_number] => 04906549
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-03-06
[patent_title] => 'Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms'
[patent_app_type] => 1
[patent_app_number] => 7/182848
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[patent_app_date] => 1988-04-18
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[firstpage_image] =>[orig_patent_app_number] => 182848
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Array
(
[id] => 2606642
[patent_doc_number] => 04902602
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-02-20
[patent_title] => 'Light-sensitive composition and presensitized plate with light-sensitive diazo resin, acidic binder and compound with pivaloyl group'
[patent_app_type] => 1
[patent_app_number] => 7/182242
[patent_app_country] => US
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[pdf_file] => patents/04/902/04902602.pdf
[firstpage_image] =>[orig_patent_app_number] => 182242
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/182242 | Light-sensitive composition and presensitized plate with light-sensitive diazo resin, acidic binder and compound with pivaloyl group | Apr 14, 1988 | Issued |
Array
(
[id] => 2475091
[patent_doc_number] => 04889789
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-12-26
[patent_title] => 'Photosensitive composition and photosensitive copying material prepared therefrom wherein composition has a thermal crosslinking urethane formaldehyde condensate'
[patent_app_type] => 1
[patent_app_number] => 7/177414
[patent_app_country] => US
[patent_app_date] => 1988-04-04
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[firstpage_image] =>[orig_patent_app_number] => 177414
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/177414 | Photosensitive composition and photosensitive copying material prepared therefrom wherein composition has a thermal crosslinking urethane formaldehyde condensate | Apr 3, 1988 | Issued |
Array
(
[id] => 2635523
[patent_doc_number] => 04914006
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-04-03
[patent_title] => 'Positive resist quaternary ammonium hydroxide containing developer with cationic and nonionic surfactant'
[patent_app_type] => 1
[patent_app_number] => 7/178848
[patent_app_country] => US
[patent_app_date] => 1988-04-04
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[firstpage_image] =>[orig_patent_app_number] => 178848
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/178848 | Positive resist quaternary ammonium hydroxide containing developer with cationic and nonionic surfactant | Apr 3, 1988 | Issued |
| 07/177411 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE COPYING MATERIAL PREPARED FROM THIS COMPOSITION AND PROCESS FOR THE PRODUCTION OF PRINTING FORMS | Apr 3, 1988 | Abandoned |
| 07/175473 | MIXED ALDEHYDE NOVOLAK RESINS AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM | Mar 30, 1988 | Abandoned |
Array
(
[id] => 2623493
[patent_doc_number] => 04950582
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-08-21
[patent_title] => 'Light-sensitive composition'
[patent_app_type] => 1
[patent_app_number] => 7/176196
[patent_app_country] => US
[patent_app_date] => 1988-03-31
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[firstpage_image] =>[orig_patent_app_number] => 176196
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/176196 | Light-sensitive composition | Mar 30, 1988 | Issued |
| 07/175706 | HIGH SENSITIVITY MID AND DEEP UV RESIST | Mar 30, 1988 | Abandoned |
Array
(
[id] => 2514745
[patent_doc_number] => 04863829
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[patent_kind] => NA
[patent_issue_date] => 1989-09-05
[patent_title] => 'Positive type high gamma-value photoresist composition with novolak resin possessing'
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[firstpage_image] =>[orig_patent_app_number] => 175658
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/175658 | Positive type high gamma-value photoresist composition with novolak resin possessing | Mar 28, 1988 | Issued |
Array
(
[id] => 2622605
[patent_doc_number] => 04956251
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-09-11
[patent_title] => 'Multicolor heat-sensitive recording material'
[patent_app_type] => 1
[patent_app_number] => 7/174306
[patent_app_country] => US
[patent_app_date] => 1988-03-28
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[pdf_file] => patents/04/956/04956251.pdf
[firstpage_image] =>[orig_patent_app_number] => 174306
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/174306 | Multicolor heat-sensitive recording material | Mar 27, 1988 | Issued |
| 07/173546 | PHOTOSENSITIVE COMPOSITION | Mar 24, 1988 | Abandoned |
Array
(
[id] => 2585518
[patent_doc_number] => 04891297
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-01-02
[patent_title] => 'Heat-sensitive diazo recording material with thiohydroquinone'
[patent_app_type] => 1
[patent_app_number] => 7/178834
[patent_app_country] => US
[patent_app_date] => 1988-03-25
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[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/04/891/04891297.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/178834 | Heat-sensitive diazo recording material with thiohydroquinone | Mar 24, 1988 | Issued |
Array
(
[id] => 2634075
[patent_doc_number] => 04892801
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-01-09
[patent_title] => 'Mixed ester O-quinone diazide photosensitizers and process of preparation'
[patent_app_type] => 1
[patent_app_number] => 7/170534
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[patent_app_date] => 1988-03-21
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[firstpage_image] =>[orig_patent_app_number] => 170534
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/170534 | Mixed ester O-quinone diazide photosensitizers and process of preparation | Mar 20, 1988 | Issued |
Array
(
[id] => 2551460
[patent_doc_number] => 04808512
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-02-28
[patent_title] => 'Process of deep ultra-violet imaging lithographic resist compositions'
[patent_app_type] => 1
[patent_app_number] => 7/170430
[patent_app_country] => US
[patent_app_date] => 1988-03-18
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[firstpage_image] =>[orig_patent_app_number] => 170430
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/170430 | Process of deep ultra-violet imaging lithographic resist compositions | Mar 17, 1988 | Issued |
| 07/167107 | POSITIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | Mar 10, 1988 | Abandoned |
| 07/166803 | PHOTOSENSITIVE PRINTING PLATES | Mar 2, 1988 | Abandoned |
Array
(
[id] => 2630191
[patent_doc_number] => 04937170
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-06-26
[patent_title] => 'Coupling agents for photographic elements'
[patent_app_type] => 1
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[patent_app_date] => 1988-03-01
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[firstpage_image] =>[orig_patent_app_number] => 162703
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/162703 | Coupling agents for photographic elements | Feb 29, 1988 | Issued |
Array
(
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[patent_issue_date] => 1989-12-26
[patent_title] => 'Process for forming photoresist pattern using contrast enhancement layer with abietic acid'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/159292 | Process for forming photoresist pattern using contrast enhancement layer with abietic acid | Feb 22, 1988 | Issued |
Array
(
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[patent_title] => 'Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/161213 | Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure | Feb 16, 1988 | Issued |
Array
(
[id] => 2590222
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