Search

Charles L. Bowers Jr.

Examiner (ID: 18963)

Most Active Art Unit
1506
Art Unit(s)
2203, 2813, 1763, 1104, 1506
Total Applications
883
Issued Applications
647
Pending Applications
4
Abandoned Applications
232

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2625465 [patent_doc_number] => 04906549 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-03-06 [patent_title] => 'Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms' [patent_app_type] => 1 [patent_app_number] => 7/182848 [patent_app_country] => US [patent_app_date] => 1988-04-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 4164 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/906/04906549.pdf [firstpage_image] =>[orig_patent_app_number] => 182848 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/182848
Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms Apr 17, 1988 Issued
Array ( [id] => 2606642 [patent_doc_number] => 04902602 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-02-20 [patent_title] => 'Light-sensitive composition and presensitized plate with light-sensitive diazo resin, acidic binder and compound with pivaloyl group' [patent_app_type] => 1 [patent_app_number] => 7/182242 [patent_app_country] => US [patent_app_date] => 1988-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3776 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 134 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/902/04902602.pdf [firstpage_image] =>[orig_patent_app_number] => 182242 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/182242
Light-sensitive composition and presensitized plate with light-sensitive diazo resin, acidic binder and compound with pivaloyl group Apr 14, 1988 Issued
Array ( [id] => 2475091 [patent_doc_number] => 04889789 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-12-26 [patent_title] => 'Photosensitive composition and photosensitive copying material prepared therefrom wherein composition has a thermal crosslinking urethane formaldehyde condensate' [patent_app_type] => 1 [patent_app_number] => 7/177414 [patent_app_country] => US [patent_app_date] => 1988-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4213 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 137 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/889/04889789.pdf [firstpage_image] =>[orig_patent_app_number] => 177414 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/177414
Photosensitive composition and photosensitive copying material prepared therefrom wherein composition has a thermal crosslinking urethane formaldehyde condensate Apr 3, 1988 Issued
Array ( [id] => 2635523 [patent_doc_number] => 04914006 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-04-03 [patent_title] => 'Positive resist quaternary ammonium hydroxide containing developer with cationic and nonionic surfactant' [patent_app_type] => 1 [patent_app_number] => 7/178848 [patent_app_country] => US [patent_app_date] => 1988-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 2725 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 268 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/914/04914006.pdf [firstpage_image] =>[orig_patent_app_number] => 178848 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/178848
Positive resist quaternary ammonium hydroxide containing developer with cationic and nonionic surfactant Apr 3, 1988 Issued
07/177411 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE COPYING MATERIAL PREPARED FROM THIS COMPOSITION AND PROCESS FOR THE PRODUCTION OF PRINTING FORMS Apr 3, 1988 Abandoned
07/175473 MIXED ALDEHYDE NOVOLAK RESINS AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM Mar 30, 1988 Abandoned
Array ( [id] => 2623493 [patent_doc_number] => 04950582 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-08-21 [patent_title] => 'Light-sensitive composition' [patent_app_type] => 1 [patent_app_number] => 7/176196 [patent_app_country] => US [patent_app_date] => 1988-03-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8884 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 417 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/950/04950582.pdf [firstpage_image] =>[orig_patent_app_number] => 176196 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/176196
Light-sensitive composition Mar 30, 1988 Issued
07/175706 HIGH SENSITIVITY MID AND DEEP UV RESIST Mar 30, 1988 Abandoned
Array ( [id] => 2514745 [patent_doc_number] => 04863829 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-09-05 [patent_title] => 'Positive type high gamma-value photoresist composition with novolak resin possessing' [patent_app_type] => 1 [patent_app_number] => 7/175658 [patent_app_country] => US [patent_app_date] => 1988-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 6488 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 174 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/863/04863829.pdf [firstpage_image] =>[orig_patent_app_number] => 175658 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/175658
Positive type high gamma-value photoresist composition with novolak resin possessing Mar 28, 1988 Issued
Array ( [id] => 2622605 [patent_doc_number] => 04956251 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-09-11 [patent_title] => 'Multicolor heat-sensitive recording material' [patent_app_type] => 1 [patent_app_number] => 7/174306 [patent_app_country] => US [patent_app_date] => 1988-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 10953 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 216 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/956/04956251.pdf [firstpage_image] =>[orig_patent_app_number] => 174306 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/174306
Multicolor heat-sensitive recording material Mar 27, 1988 Issued
07/173546 PHOTOSENSITIVE COMPOSITION Mar 24, 1988 Abandoned
Array ( [id] => 2585518 [patent_doc_number] => 04891297 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-01-02 [patent_title] => 'Heat-sensitive diazo recording material with thiohydroquinone' [patent_app_type] => 1 [patent_app_number] => 7/178834 [patent_app_country] => US [patent_app_date] => 1988-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7748 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 171 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/891/04891297.pdf [firstpage_image] =>[orig_patent_app_number] => 178834 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/178834
Heat-sensitive diazo recording material with thiohydroquinone Mar 24, 1988 Issued
Array ( [id] => 2634075 [patent_doc_number] => 04892801 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-01-09 [patent_title] => 'Mixed ester O-quinone diazide photosensitizers and process of preparation' [patent_app_type] => 1 [patent_app_number] => 7/170534 [patent_app_country] => US [patent_app_date] => 1988-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7669 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 139 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/892/04892801.pdf [firstpage_image] =>[orig_patent_app_number] => 170534 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/170534
Mixed ester O-quinone diazide photosensitizers and process of preparation Mar 20, 1988 Issued
Array ( [id] => 2551460 [patent_doc_number] => 04808512 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-02-28 [patent_title] => 'Process of deep ultra-violet imaging lithographic resist compositions' [patent_app_type] => 1 [patent_app_number] => 7/170430 [patent_app_country] => US [patent_app_date] => 1988-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3302 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 185 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/808/04808512.pdf [firstpage_image] =>[orig_patent_app_number] => 170430 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/170430
Process of deep ultra-violet imaging lithographic resist compositions Mar 17, 1988 Issued
07/167107 POSITIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE Mar 10, 1988 Abandoned
07/166803 PHOTOSENSITIVE PRINTING PLATES Mar 2, 1988 Abandoned
Array ( [id] => 2630191 [patent_doc_number] => 04937170 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-06-26 [patent_title] => 'Coupling agents for photographic elements' [patent_app_type] => 1 [patent_app_number] => 7/162703 [patent_app_country] => US [patent_app_date] => 1988-03-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3397 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 254 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/937/04937170.pdf [firstpage_image] =>[orig_patent_app_number] => 162703 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/162703
Coupling agents for photographic elements Feb 29, 1988 Issued
Array ( [id] => 2475203 [patent_doc_number] => 04889795 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-12-26 [patent_title] => 'Process for forming photoresist pattern using contrast enhancement layer with abietic acid' [patent_app_type] => 1 [patent_app_number] => 7/159292 [patent_app_country] => US [patent_app_date] => 1988-02-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 7580 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 260 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/889/04889795.pdf [firstpage_image] =>[orig_patent_app_number] => 159292 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/159292
Process for forming photoresist pattern using contrast enhancement layer with abietic acid Feb 22, 1988 Issued
Array ( [id] => 2525657 [patent_doc_number] => 04797348 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-01-10 [patent_title] => 'Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure' [patent_app_type] => 1 [patent_app_number] => 7/161213 [patent_app_country] => US [patent_app_date] => 1988-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 5420 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 318 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/797/04797348.pdf [firstpage_image] =>[orig_patent_app_number] => 161213 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/161213
Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure Feb 16, 1988 Issued
Array ( [id] => 2590222 [patent_doc_number] => 04917988 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-04-17 [patent_title] => 'Process for producing photosensitive negative working diazo resin lithographic plate using admixture of at least three solvents' [patent_app_type] => 1 [patent_app_number] => 7/156801 [patent_app_country] => US [patent_app_date] => 1988-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4221 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/917/04917988.pdf [firstpage_image] =>[orig_patent_app_number] => 156801 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/156801
Process for producing photosensitive negative working diazo resin lithographic plate using admixture of at least three solvents Feb 16, 1988 Issued
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