| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2486113
[patent_doc_number] => 04801518
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-01-31
[patent_title] => 'Method of forming a photoresist pattern'
[patent_app_type] => 1
[patent_app_number] => 7/129936
[patent_app_country] => US
[patent_app_date] => 1987-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 4959
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 131
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/801/04801518.pdf
[firstpage_image] =>[orig_patent_app_number] => 129936
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/129936 | Method of forming a photoresist pattern | Dec 2, 1987 | Issued |
Array
(
[id] => 2490254
[patent_doc_number] => 04842979
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-27
[patent_title] => 'Black color heat-sensitive diazo microcapsule recording material with benzoylacetic amide coupler'
[patent_app_type] => 1
[patent_app_number] => 7/129350
[patent_app_country] => US
[patent_app_date] => 1987-11-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5373
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 217
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/842/04842979.pdf
[firstpage_image] =>[orig_patent_app_number] => 129350
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/129350 | Black color heat-sensitive diazo microcapsule recording material with benzoylacetic amide coupler | Nov 29, 1987 | Issued |
Array
(
[id] => 2558581
[patent_doc_number] => 04837121
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-06
[patent_title] => 'Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin'
[patent_app_type] => 1
[patent_app_number] => 7/124227
[patent_app_country] => US
[patent_app_date] => 1987-11-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6829
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 103
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/837/04837121.pdf
[firstpage_image] =>[orig_patent_app_number] => 124227
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/124227 | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin | Nov 22, 1987 | Issued |
| 07/120546 | PHOTOSENSITIVE COMPOSITION | Nov 12, 1987 | Abandoned |
Array
(
[id] => 2634935
[patent_doc_number] => 04898803
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-02-06
[patent_title] => 'Light-sensitive o-quinone diazide composition with acidic polyurethane resin'
[patent_app_type] => 1
[patent_app_number] => 7/119578
[patent_app_country] => US
[patent_app_date] => 1987-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4328
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 233
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/898/04898803.pdf
[firstpage_image] =>[orig_patent_app_number] => 119578
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/119578 | Light-sensitive o-quinone diazide composition with acidic polyurethane resin | Nov 11, 1987 | Issued |
Array
(
[id] => 2480005
[patent_doc_number] => 04822722
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-04-18
[patent_title] => 'Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image'
[patent_app_type] => 1
[patent_app_number] => 7/119295
[patent_app_country] => US
[patent_app_date] => 1987-11-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6642
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 236
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/822/04822722.pdf
[firstpage_image] =>[orig_patent_app_number] => 119295
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/119295 | Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image | Nov 5, 1987 | Issued |
Array
(
[id] => 2619245
[patent_doc_number] => 04894311
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1990-01-16
[patent_title] => 'Positive-working photoresist composition'
[patent_app_type] => 1
[patent_app_number] => 7/113951
[patent_app_country] => US
[patent_app_date] => 1987-10-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5084
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 134
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/894/04894311.pdf
[firstpage_image] =>[orig_patent_app_number] => 113951
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/113951 | Positive-working photoresist composition | Oct 28, 1987 | Issued |
| 07/112480 | MATTED PHOTOGRAPHIC IMAGING MATERIALS | Oct 25, 1987 | Abandoned |
| 07/111141 | RADIATION SENSITIVE COMPOUNDS | Oct 15, 1987 | Abandoned |
| 07/108345 | METHOD OF FORMING IMAGES | Oct 13, 1987 | Abandoned |
Array
(
[id] => 2490330
[patent_doc_number] => 04842983
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-06-27
[patent_title] => 'Light-sensitive compositions and light-sensitive materials with phenolic resol having dibenzylic ether linkages'
[patent_app_type] => 1
[patent_app_number] => 7/108278
[patent_app_country] => US
[patent_app_date] => 1987-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10729
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 209
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/842/04842983.pdf
[firstpage_image] =>[orig_patent_app_number] => 108278
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/108278 | Light-sensitive compositions and light-sensitive materials with phenolic resol having dibenzylic ether linkages | Oct 13, 1987 | Issued |
| 07/108192 | PHOTORESIST PROCESSES, COMPOSITIONS AND COMPONENTS | Oct 12, 1987 | Abandoned |
| 07/106253 | ANTISTATIC PHOTO-RESIST | Oct 8, 1987 | Abandoned |
Array
(
[id] => 2521862
[patent_doc_number] => 04880722
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-11-14
[patent_title] => 'Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers'
[patent_app_type] => 1
[patent_app_number] => 7/107505
[patent_app_country] => US
[patent_app_date] => 1987-10-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3069
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 180
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/880/04880722.pdf
[firstpage_image] =>[orig_patent_app_number] => 107505
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/107505 | Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Oct 7, 1987 | Issued |
Array
(
[id] => 2560064
[patent_doc_number] => 04835085
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-05-30
[patent_title] => '1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound'
[patent_app_type] => 1
[patent_app_number] => 7/105379
[patent_app_country] => US
[patent_app_date] => 1987-10-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4091
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 60
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/835/04835085.pdf
[firstpage_image] =>[orig_patent_app_number] => 105379
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/105379 | 1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound | Oct 6, 1987 | Issued |
| 07/104930 | POSITIVE PHOTORESIST COMPOSITIONS | Oct 5, 1987 | Abandoned |
Array
(
[id] => 2475003
[patent_doc_number] => 04871644
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1989-10-03
[patent_title] => 'Photoresist compositions with a bis-benzotriazole'
[patent_app_type] => 1
[patent_app_number] => 7/099880
[patent_app_country] => US
[patent_app_date] => 1987-09-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3219
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/04/871/04871644.pdf
[firstpage_image] =>[orig_patent_app_number] => 099880
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/099880 | Photoresist compositions with a bis-benzotriazole | Sep 21, 1987 | Issued |
| 07/097257 | PHOTORESIST TREATING COMPOSITION CONTAINING A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GLYCOL ALKYL ETHER ACETATE | Sep 16, 1987 | Abandoned |
| 07/097252 | POSITIVE PHOTORESIST CONTAINING A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GLYCOL ETHER ACETATE | Sep 16, 1987 | Abandoned |
| 07/097810 | PREPARATION AND USE OF POLY (3,4 DISUBSTITUTED-4- HYDROXYSTYRENE/N-SUBSTITUTED MALEIMIDE) | Sep 15, 1987 | Abandoned |