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Charles L. Bowers Jr.

Examiner (ID: 18963)

Most Active Art Unit
1506
Art Unit(s)
2203, 2813, 1763, 1104, 1506
Total Applications
883
Issued Applications
647
Pending Applications
4
Abandoned Applications
232

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2486113 [patent_doc_number] => 04801518 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-01-31 [patent_title] => 'Method of forming a photoresist pattern' [patent_app_type] => 1 [patent_app_number] => 7/129936 [patent_app_country] => US [patent_app_date] => 1987-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 4959 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/801/04801518.pdf [firstpage_image] =>[orig_patent_app_number] => 129936 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/129936
Method of forming a photoresist pattern Dec 2, 1987 Issued
Array ( [id] => 2490254 [patent_doc_number] => 04842979 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-27 [patent_title] => 'Black color heat-sensitive diazo microcapsule recording material with benzoylacetic amide coupler' [patent_app_type] => 1 [patent_app_number] => 7/129350 [patent_app_country] => US [patent_app_date] => 1987-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5373 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/842/04842979.pdf [firstpage_image] =>[orig_patent_app_number] => 129350 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/129350
Black color heat-sensitive diazo microcapsule recording material with benzoylacetic amide coupler Nov 29, 1987 Issued
Array ( [id] => 2558581 [patent_doc_number] => 04837121 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-06 [patent_title] => 'Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin' [patent_app_type] => 1 [patent_app_number] => 7/124227 [patent_app_country] => US [patent_app_date] => 1987-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6829 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/837/04837121.pdf [firstpage_image] =>[orig_patent_app_number] => 124227 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/124227
Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin Nov 22, 1987 Issued
07/120546 PHOTOSENSITIVE COMPOSITION Nov 12, 1987 Abandoned
Array ( [id] => 2634935 [patent_doc_number] => 04898803 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-02-06 [patent_title] => 'Light-sensitive o-quinone diazide composition with acidic polyurethane resin' [patent_app_type] => 1 [patent_app_number] => 7/119578 [patent_app_country] => US [patent_app_date] => 1987-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4328 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 233 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/898/04898803.pdf [firstpage_image] =>[orig_patent_app_number] => 119578 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/119578
Light-sensitive o-quinone diazide composition with acidic polyurethane resin Nov 11, 1987 Issued
Array ( [id] => 2480005 [patent_doc_number] => 04822722 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-04-18 [patent_title] => 'Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image' [patent_app_type] => 1 [patent_app_number] => 7/119295 [patent_app_country] => US [patent_app_date] => 1987-11-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6642 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 236 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/822/04822722.pdf [firstpage_image] =>[orig_patent_app_number] => 119295 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/119295
Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image Nov 5, 1987 Issued
Array ( [id] => 2619245 [patent_doc_number] => 04894311 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1990-01-16 [patent_title] => 'Positive-working photoresist composition' [patent_app_type] => 1 [patent_app_number] => 7/113951 [patent_app_country] => US [patent_app_date] => 1987-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5084 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 134 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/894/04894311.pdf [firstpage_image] =>[orig_patent_app_number] => 113951 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/113951
Positive-working photoresist composition Oct 28, 1987 Issued
07/112480 MATTED PHOTOGRAPHIC IMAGING MATERIALS Oct 25, 1987 Abandoned
07/111141 RADIATION SENSITIVE COMPOUNDS Oct 15, 1987 Abandoned
07/108345 METHOD OF FORMING IMAGES Oct 13, 1987 Abandoned
Array ( [id] => 2490330 [patent_doc_number] => 04842983 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-06-27 [patent_title] => 'Light-sensitive compositions and light-sensitive materials with phenolic resol having dibenzylic ether linkages' [patent_app_type] => 1 [patent_app_number] => 7/108278 [patent_app_country] => US [patent_app_date] => 1987-10-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10729 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/842/04842983.pdf [firstpage_image] =>[orig_patent_app_number] => 108278 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/108278
Light-sensitive compositions and light-sensitive materials with phenolic resol having dibenzylic ether linkages Oct 13, 1987 Issued
07/108192 PHOTORESIST PROCESSES, COMPOSITIONS AND COMPONENTS Oct 12, 1987 Abandoned
07/106253 ANTISTATIC PHOTO-RESIST Oct 8, 1987 Abandoned
Array ( [id] => 2521862 [patent_doc_number] => 04880722 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-11-14 [patent_title] => 'Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers' [patent_app_type] => 1 [patent_app_number] => 7/107505 [patent_app_country] => US [patent_app_date] => 1987-10-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3069 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 180 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/880/04880722.pdf [firstpage_image] =>[orig_patent_app_number] => 107505 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/107505
Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers Oct 7, 1987 Issued
Array ( [id] => 2560064 [patent_doc_number] => 04835085 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-05-30 [patent_title] => '1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound' [patent_app_type] => 1 [patent_app_number] => 7/105379 [patent_app_country] => US [patent_app_date] => 1987-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4091 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/835/04835085.pdf [firstpage_image] =>[orig_patent_app_number] => 105379 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/105379
1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound Oct 6, 1987 Issued
07/104930 POSITIVE PHOTORESIST COMPOSITIONS Oct 5, 1987 Abandoned
Array ( [id] => 2475003 [patent_doc_number] => 04871644 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1989-10-03 [patent_title] => 'Photoresist compositions with a bis-benzotriazole' [patent_app_type] => 1 [patent_app_number] => 7/099880 [patent_app_country] => US [patent_app_date] => 1987-09-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3219 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/04/871/04871644.pdf [firstpage_image] =>[orig_patent_app_number] => 099880 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/099880
Photoresist compositions with a bis-benzotriazole Sep 21, 1987 Issued
07/097257 PHOTORESIST TREATING COMPOSITION CONTAINING A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GLYCOL ALKYL ETHER ACETATE Sep 16, 1987 Abandoned
07/097252 POSITIVE PHOTORESIST CONTAINING A MIXTURE OF PROPYLENE GLYCOL ALKYL ETHER AND PROPYLENE GLYCOL ETHER ACETATE Sep 16, 1987 Abandoned
07/097810 PREPARATION AND USE OF POLY (3,4 DISUBSTITUTED-4- HYDROXYSTYRENE/N-SUBSTITUTED MALEIMIDE) Sep 15, 1987 Abandoned
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